High Purity Quartz Crucible

The high purity quartz crucible provided by the Veteksemicon platform are made of ultra-high purity synthetic fused quartz. The SiO2 content in the selected quartz raw materials can usually reach 99.998% or even higher (4N8). Through advanced melting and molding processes, the impurity content is minimized, especially the metal ions (such as Na, K, Li, Fe, Al, Ca, etc.) and hydroxyl content that are harmful to semiconductor processes.

This quartz crucible is designed for operation in high temperature environments to ensure low contamination, high strength and good compatibility with crystal growth and wafer processing.

Ⅰ. Main Applications in semiconductor manufacturing processes

High-purity quartz crucibles play a vital role in many key semiconductor manufacturing processes with their unique physical properties:

1. Single crystal silicon growth (Czochralski Process - CZ)

Use: In the process of single crystal silicon growth by the Czochralski method, high-purity quartz crucibles are the main containers for molten silicon. The quality and purity of silicon rods are directly affected by the crucible material.

Excellent physical properties:

● Ultra-high purity: Made of high-purity quartz material, it ensures extremely low impurity precipitation and avoids contamination of single crystal silicon, which is crucial for the manufacture of highly integrated and high-performance semiconductor devices. Impurities such as alkali metals and heavy metals can become carrier traps or scattering centers, seriously affecting the electrical properties of the device.

● Excellent high temperature resistance: Quartz material has a high melting point (about 1700 ∘C), can withstand the extremely high temperature of molten silicon (about 1420 ∘C), and work stably for a long time without deformation or softening.

● Good thermal stability: At high temperatures, the thermal expansion coefficient is extremely low, which can effectively resist thermal stress and avoid cracking during heating and cooling, thereby ensuring the stability and safety of the process.

● Chemical inertness: It has good chemical inertness to molten silicon, is not easy to react with silicon, reduces the introduction of impurities and carbonization of silicon, and ensures the purity of silicon crystals.

2. Polycrystalline Silicon Ingot Casting

Application: In the polycrystalline silicon ingot casting process, high-purity quartz crucibles are used as containers for molten polycrystalline silicon to cast photovoltaic or electronic grade polycrystalline silicon ingots.

Excellent physical properties:

●Thermal shock resistance: It can maintain structural integrity even in rapid heating and cooling cycles to avoid cracking caused by sudden temperature changes.

●Dimensional stability: Accurate dimensional control and shape stability are essential for casting polycrystalline silicon ingots that meet specification requirements.

3. Other high-temperature applications

Uses: In semiconductor manufacturing, many high-temperature furnace tube processes, such as diffusion, oxidation, annealing, etc., often use quartz containers as linings or carriers to keep the process environment clean and stable.

Ⅱ. Advantages of Veteksemicon's high purity quartz crucible

Veteksemicon is committed to providing high-quality, high-performance products for the semiconductor industry. Our high-purity quartz crucibles have the following advantages:

● Ultra-high purity guarantee: Strict control of raw materials and production processes to ensure that the product reaches semiconductor-grade ultra-high purity and minimize the risk of process contamination.

● Excellent durability: Excellent thermal stability and mechanical strength, extending product life and reducing production costs.

● Customized service: Customized crucible solutions of different sizes, shapes and specifications can be provided according to your specific process needs.

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