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China Oxidation diffusion furnace quartz Manufacturer, Supplier, Factory

We follow our enterprise spirit of "Quality, Efficiency, Innovation and Integrity". We aim to create much more worth for our buyers with our abundant resources, highly developed machinery, experienced workers and great providers for Oxidation diffusion furnace quartz, High purity quartz crucible, Semiconductor quartz crucible, Fused silica crucible, SiC epitaxy crucible, We will continue to keep operating hard and as we consider our best to supply the most effective high-quality products, most competitive selling price and exceptional company to each customer. Your gratification, our glory!!!
Oxidation diffusion furnace quartz, In order to meet the increasing requirement of customers both home and aboard, we'll keep carrying forward the enterprise spirit of "Quality, Creativity, Efficiency and Credit" and strive to top the current trend and lead fashion. We warmly welcome you to visit our company and make cooperation.

Hot Products

  • Monocrystalline pulling Crucible

    Monocrystalline pulling Crucible

    Graphite crucible is an important part of Monocrystalline Pulling Crucibles in the process of achieving monocrystalline silicon ingot growth.Vetek semiconductor's crucibles are intricately engineered to meet the rigorous requirements set by the semiconductor industry.We are committed to producing and supplying crystal growth graphite crucibles that excel in performance, quality, and cost-effectiveness to meet the evolving needs of the industry.Welcome to inquiry us.
  • Epi wafer holder

    Epi wafer holder

    VeTek Semiconductor is a professional Epi Wafer Holder manufacturer and factory in China. Epi Wafer Holder is a wafer holder for the epitaxy process in semiconductor processing. It is a key tool to stabilize the wafer and ensure uniform growth of the epitaxial layer. It is widely used in epitaxy equipment such as MOCVD and LPCVD. It is an irreplaceable device in the epitaxy process. Welcome your further consultation.
  • SiC coated deep UV LED susceptor

    SiC coated deep UV LED susceptor

    SiC coated deep UV LED susceptor is designed for MOCVD process to support efficient and stable deep UV LED epitaxial layer growth. VeTek Semiconductor is a leading manufacturer and supplier of SiC coated deep UV LED susceptor in China. We have rich experience and have established long-term cooperative relationships with many LED epitaxial manufacturers.We are the top domestic manufacturer of susceptor products for LEDs. After years of verification, our product life span is on par with that of top international manufacturers. Looking forward to your inquiry.
  • Tantalum Carbide Ring

    Tantalum Carbide Ring

    As an advanced manufacturer and producer of Tantalum Carbide Ring products in China, VeTek Semiconductor Tantalum Carbide Ring has extremely high hardness, wear resistance, high temperature resistance and chemical stability, and is widely used in the semiconductor manufacturing field. Especially in CVD, PVD, ion implantation process, etching process, and wafer processing and transportation, it is an indispensable product for semiconductor processing and manufacturing. Looking forward to your further consultation.
  • TaC coated ring for PVT growth of SiC single crystal

    TaC coated ring for PVT growth of SiC single crystal

    As one of the leading TaC coating product suppliers in China, VeTek Semiconductor is able to provide customers with high-quality TaC coating customized parts. TaC coated ring for PVT growth of SiC single crystal is one of VeTek Semiconductor's most outstanding and mature products. It plays an important role in the PVT growth of SiC crystal process and can help customers grow high-quality SiC crystals. Looking forward to your inquiry.
  • CVD SiC coated wafer susceptor

    CVD SiC coated wafer susceptor

    Veteksemicon’s CVD SiC coated wafer susceptor is a cutting-edge solution for semiconductor epitaxial processes, offering ultra-high purity (≤100ppb, ICP-E10 certified) and exceptional thermal/chemical stability for contamination-resistant growth of GaN, SiC, and silicon-based epi-layers. Engineered with precision CVD technology, it supports 6”/8”/12” wafers, ensures minimal thermal stress, and withstands extreme temperatures up to 1600°C.

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