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China Silicon Carbide (SiC) Manufacturer, Supplier, Factory

It is a great way to further improve our items and repair. Our mission would be to develop resourceful items to clients with a superior encounter for Silicon Carbide (SiC), SiC Coating, MOCVD Epitaxial Growth Process, Planetary Susceptor Manufacturer, TaC Coating Planetary Susceptor, Our hugely specialized process eliminates the component failure and offers our customers unvarying high quality, allowing us to control cost, plan capacity and maintain consistent on time delivery.
Silicon Carbide (SiC), We'll supply much better products and solutions with diversified designs and expert services. At the same time, welcome OEM, ODM orders, invite friends at home and abroad together common development and achieve win-win, integrity innovation, and expand business opportunities! If you have any question or need more information be sure to feel free to contact us. We are looking forward to receiving your enquiries soon.

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  • High-purity Quartz Bath

    High-purity Quartz Bath

    In the critical steps of wafer cleaning, etching, and wet etching, high-purity quartz bath is more than just a container; it's the first line of defense for process success. Metal ion contamination, thermal shock cracking, chemical attack, and particle residue are hidden causes of yield fluctuations. Veteksemi is deeply rooted in semiconductor-grade quartz. Every quartz bath we manufacture is designed to provide uncompromising reliability and cleanliness for your cutting-edge processes.
  • Porous Graphite with TaC Coated

    Porous Graphite with TaC Coated

    Porous Graphite with TaC Coated is an advanced semiconductor processing material provided by VeTek Semiconductor. Porous Graphite with TaC Coated combines the advantages of porous graphite and tantalum carbide (TaC) coating, with good thermal conductivity and gas permeability. VeTek Semiconductor is committed to providing quality products at competitive prices.
  • Graphite Thermal Field

    Graphite Thermal Field

    At Vetek Semiconductor, graphite thermal fields are meticulously designed to meet the stringent standards of the photovoltaic industry, ensuring optimal performance and efficiency across various applications. We are dedicated to manufacturing high-performance graphite thermal fields that offer exceptional quality and cost-effectiveness.Pls no hesitate to contact us for any technical question or price.
  • Electric Fused Quartz

    Electric Fused Quartz

    Electric fused quartz is made of high-purity SiCl4 and melted by hydrogen-oxygen flame. The product is bubble-free. VeTek Semiconductor has mature electric fused quartz production capabilities and strong production capacity, and can provide corresponding electric fused quartz products according to customer needs. VeTek Semiconductor looks forward to your inquiry.
  • CVD SiC Coated Graphite Shower Head

    CVD SiC Coated Graphite Shower Head

    The CVD SiC Coated Graphite Shower Head from Veteksemicon is a high-performance component specifically designed for semiconductor chemical vapor deposition (CVD) processes. Manufactured from high-purity graphite and protected with a chemical vapor deposition (CVD) silicon carbide (SiC) coating, this shower head delivers outstanding durability, thermal stability, and resistance to corrosive process gases. Looking forward to your further consultation.
  • Crucible for Monocrystalline Silicon

    Crucible for Monocrystalline Silicon

    The thermal field of the monocrystal silicon furnace uses graphite as the crucible, and uses the heater, guide ring, bracket and pot holder made of isostatic pressed graphite to ensure the strength and purity of the graphite crucible. Vetek semiconductor produces crucible for Monocrystalline Silicon, long life, high purity, welcome to consult us.

  • ALD Atomic Layer Deposition Recipe

    Spatial ALD, spatially isolated atomic layer deposition. The wafer moves between different positions and is exposed to different precursors at each position. The figure below is a comparison between traditional ALD and spatially isolated ALD.

  • GaN-based low-temperature epitaxy technology

    This article mainly describes GaN-based low-temperature epitaxial technology, including the crystal structure of GaN-based materials, 3. epitaxial technology requirements and implementation solutions, the advantages of low-temperature epitaxial technology based on PVD principles, and the development prospects of low-temperature epitaxial technology.

  • Why is SiC coating a key core material for SiC epitaxial growth?

    This article analyzes the reasons why SiC coating a key core material for SiC epitaxial growth and focuses on the specific advantages of SiC coating in the semiconductor industry.

  • Why is CO₂ Introduced During the Wafer Dicing Process?

    Introducing CO₂ into the dicing water during wafer cutting is an effective process measure to suppress static charge buildup and lower contamination risk, thereby improving dicing yield and long-term chip reliability.

  • What is the epitaxial process?

    This blog takes "What is the epitaxial process?" as its theme, and provides a detailed analysis from the dimensions of Overview of Epitaxial Processes, Types of Epitaxy, Factors Influencing the Epi Process, Epitaxial Growth Techniques, EPI Growth Modes, and Epitaxy Growth’s Importance.

  • What Exactly is the Third Generation Semiconductor?

    When you see the third-generation semiconductors, you will surely wonder what the first and second generations were. The "generation" here is classified based on the materials used in semiconductor manufacturing.

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