Quartz Furnace Tube for Diffusion Furnace

1. Key Features & Advantages

• Ultra-high purity dehydroxylated fused quartz (SiO₂ ≥ 99.999%) with metal impurities controlled at ppb levels and extremely low hydroxyl content

• Long-term operating temperature up to 1100 °C; short-term peak resistance to 1200 °C

• Excellent thermal shock resistance after full stress-relief annealing—resistant to cracking under rapid temperature changes

• Outstanding chemical inertness against oxidizing, reducing, and halogen-containing process gases; suitable for plasma and corrosive atmospheres

• Very low vacuum outgassing; smooth inner wall minimizes byproduct buildup and supports process repeatability

• One-piece forming with uniform wall thickness, high coaxiality, and precision-finished ends for reliable sealing

• Customizable structures: straight tubes, reducer tubes, flanged tubes, extended lengths, and special end configurations for vertical or horizontal furnaces

2. Typical Applications

VeTek quartz furnace tubes are widely used as the core reaction chamber in:

• Thermal oxidation furnaces (dry/wet oxidation)

• Diffusion furnaces for dopant introduction (B, P, As, etc.)

• LPCVD systems for thin-film deposition

• Vacuum annealing and other high-temperature heat-treatment processes

• Compatible with 4-inch, 6-inch, 8-inch, and 12-inch wafer platforms (Si, SiC, GaN, sapphire substrates)

They support logic, memory, power device, MCU, LED, MEMS, and wide-bandgap semiconductor manufacturing lines that require stable temperature uniformity, gas-flow control, and ultra-clean process environments.

3. Key Technical Parameters

• Material: Semiconductor-grade dehydroxylated fused quartz (SiO₂ ≥ 99.999%), low hydroxyl, low metallic impurities

• Wafer compatibility: 4 / 6 / 8 / 12 inch

• Long-term working temperature: −20 °C to 1100 °C; short-term peak up to 1200 °C

• Process: One-piece thermal forming, wall homogenization, end finishing, stress-relief annealing, helium leak test, ultra-clean cleaning

• Available structures: Straight tube, reducer tube, flanged tube, extended / custom-length tube, special-end configurations

• Customization: Inner/outer diameter, length, wall thickness, flange specs, and special geometries per customer drawings

4. Why Choose VeTek Quartz Furnace Tubes?

As a professional manufacturer of semiconductor quartz components, VeTek Semiconductor offers:

• High-purity quartz furnace tubes engineered for oxidation, diffusion, LPCVD, and annealing equipment

• Strict purity control, dimensional accuracy, and cleanliness suitable for Class 10 / Class 100 cleanroom production

• Full customization and OEM-compatible designs for vertical and horizontal tube furnaces

• Complementary semiconductor quartz products including wafer boats, crucibles, liners, and other process components

Our quartz furnace tubes help maintain stable thermal and gas-flow conditions, minimize particle and metal contamination, and extend service life under continuous high-temperature cycling—supporting higher yield and lower cost of ownership in semiconductor thermal processing.