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China Silicon carbide Vacumm-chuck Manufacturer, Supplier, Factory

We've been committed to offering easy,time-saving and money-saving one-stop purchasing service of consumer for Silicon carbide Vacumm-chuck, GaN wafer etching process, Gallium nitride (GaN), Plasma etching (ICP/RIE) process, Etching process, We can do your customized order to meet your own satisfactory! Our company sets up several departments, including production department, sales department, quality control department and sevice center, etc.
Silicon carbide Vacumm-chuck, We take measure at any price to attain essentially the most up-to-date gear and procedures. The packing of nominated brand is our a further distinguishing feature. The solutions to assure years of trouble-free service has attracted a great deal customers. The items are obtainable in improved designs and richer variety, they're produced scientifically of purely raw sup+C7plies. It accessible in a variety of designs and specs for the selection. The newest forms are much far better than the previous one and they're extremely popular with several clients.

Hot Products

  • Solid SiC Gas Shower Head

    Solid SiC Gas Shower Head

    Solid SiC Gas Shower Head plays a major role in making the gas uniform in the CVD process, thereby ensuring uniform heating of the substrate. VeTek Semiconductor has been deeply involved in the field of solid SiC devices for many years and is able to provide customers with customized Solid SiC Gas Shower Heads. No matter what your requirements are, we look forward to your inquiry.
  • TaC Coated Chuck

    TaC Coated Chuck

    With its high temperature resistance, chemical inertness and excellent performance, VeTek Semiconductor's TaC coated chucks are designed for semiconductor furnaces. We believe that our products can bring you advanced technology and quality product solutions.
  • SiC Coating Collector Top

    SiC Coating Collector Top

    Welcome to VeTek Semiconductor, your trusted manufacturer of CVD SiC coatings. We take pride in offering Aixtron SiC Coating Collector Top, which are expertly engineered using high purity graphite and feature a state-of-the-art CVD SiC coating with impurity below 5ppm. Please don't hesitate to reach out to us with any questions or inquiries
  • Graphite paper

    Graphite paper

    Vetek Semiconductor's High Purity Graphite Paper, a premium product designed to meet rigorous purity and performance standards. With an exceptional purity level of up to 99.9%, our graphite paper stands as a trusted option for diverse applications such as battery systems, fuel cells, thermal management solutions, semiconductor thermal fields, and beyond. Crafted through a proprietary manufacturing process, this graphite paper guarantees uniformity and consistency, delivering unparalleled electrical conductivity and thermal stability. Trust Vetek Semiconductor's High Purity Graphite Paper for reliability and excellence in your specialized projects.
  • CVD TaC Coated Graphite Ring

    CVD TaC Coated Graphite Ring

    The CVD TaC Coated Graphite Ring by Veteksemicon is engineered to meet the extreme demands of semiconductor wafer processing. Utilizing Chemical Vapor Deposition (CVD) technology, a dense and uniform Tantalum Carbide (TaC) coating is applied to high-purity graphite substrates, achieving exceptional hardness, wear resistance, and chemical inertness. In semiconductor fabrication, the CVD TaC Coated Graphite Ring is widely used in MOCVD, etching, diffusion, and epitaxial growth chambers, serving as a key structural or sealing component for wafer carriers, susceptors, and shielding assemblies. Looking forward to your further consultation.
  • Quartz Wafer Boats

    Quartz Wafer Boats

    Our Quartz Wafer Boats are high-purity wafer carrier solution tailored for semiconductor, LED, solar cell, and battery manufacturing processes. Engineered to endure high temperatures and chemically aggressive environments, this quartz boat features low thermal expansion, excellent electrical insulation, and long-term dimensional stability. Ideal for diffusion, oxidation, and LPCVD processes, it supports precise wafer alignment and is available in various sizes to meet different equipment requirements.

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