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China silicon carbide susceptor Manufacturer, Supplier, Factory

Our solutions are greatly recognized and reliable by customers and will fulfill continuously altering financial and social requirements for silicon carbide susceptor, GaN on SiC epi susceptor, SiC epi susceptor, MOCVD SUSCEPTOR, CVD SIC COATING, Our enterprise warmly welcome close friends from everywhere in the environment to go to, examine and negotiate organization.
silicon carbide susceptor, We strongly believe that technology and service is our base today and quality will create our reliable walls of future. Only we've better and better quality , could we achieve our customers and ourselves, too. Welcome customers all over the word to contact us for getting further business and reliable relationships. We have been always here working for your demands whenever you want.

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  • CVD TaC Coating Carrier

    CVD TaC Coating Carrier

    CVD TaC Coating carrier is mainly designed for the epitaxial process of semiconductor manufacturing. CVD TaC Coating carrier’s Ultra-high melting point, excellent corrosion resistance, and outstanding thermal stability determine the indispensability of this product in semiconductor epitaxial process. Welcome your further inquiry.
  • SiC Coating Collector Bottom

    SiC Coating Collector Bottom

    With our expertise in CVD SiC coating manufacturing, VeTek Semiconductor proudly presents Aixtron SiC Coating Collector Bottom,center and top. These SiC Coating Collector Bottom is constructed using high purity graphite and are coated with CVD SiC, ensuring impurity below 5ppm. Feel free to reach out to us for further information and inquiries.
  • TaC Coating Heater

    TaC Coating Heater

    VeTek Semiconductor TaC Coating Heater has an extremely high melting point (about 3880°C). The high melting point enables it to operate at extremely high temperatures, especially in the growth of gallium nitride (GaN) epitaxial layers in the metal organic chemical vapor deposition (MOCVD) process. VeTek Semiconductor is committed to providing customers with customized product solutions. We look forward to hearing from you.
  • High purity SiC wafer boat carrier

    High purity SiC wafer boat carrier

    VeTek Semiconductor offers customized High purity SiC wafer boat carrier. Made of high purity silicon carbide, it features slots to hold the wafer in place, preventing it from sliding during processing. CVD SiC coating is also available if required. As a professional and strong semiconductor manufacturer and supplier, VeTek Semiconductor's High purity SiC wafer boat carrier is price competitive and high quality. VeTek Semiconductor looks forward to being your long-term partner in China.
  • TaC coated wafer susceptor

    TaC coated wafer susceptor

    VeTek Semiconductor TaC Coated Wafer Susceptor is a graphite tray coated with tantalum carbide for silicon carbide epitaxial growth to improve wafer quality and performance. VeTek is selected because of its advanced coating technology and durable solutions to ensure excellent SiC epitaxy results and extended susceptor life, welcome your further inquiries.
  • Semiconductor thermal spraying technology

    Semiconductor thermal spraying technology

    Vetek Semiconductor Semiconductor thermal spraying technology is an advanced process that sprays materials in a molten or semi-molten state onto the surface of a substrate to form a coating. This technology is widely used in the field of semiconductor manufacturing, mainly used to create coatings with specific functions on the surface of the substrate, such as conductivity, insulation, corrosion resistance, and oxidation resistance. The main advantages of thermal spraying technology include high efficiency, controllable coating thickness, and good coating adhesion, making it particularly important in the semiconductor manufacturing process that requires high precision and reliability. Looking forward to your inquiry.

  • Different technical routes of SiC epitaxial growth furnace

    Silicon carbide substrates have many defects and cannot be processed directly. A specific single crystal thin film needs to be grown on them through an epitaxial process to make chip wafers. This thin film is the epitaxial layer. Almost all silicon carbide devices are realized on epitaxial materials. High-quality silicon carbide homogeneous epitaxial materials are the basis for the development of silicon carbide devices. The performance of epitaxial materials directly determines the realization of the performance of silicon carbide devices.

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  • Chip Manufacturing: Atomic Layer Deposition (ALD)

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  • What is the difference between silicon carbide (SiC) and gallium nitride (GaN) applications? - VeTek Semiconductor

    SiC and GaN are wide bandgap semiconductors with advantages over silicon, such as higher breakdown voltages, faster switching speeds, and superior efficiency. SiC is better for high-voltage, high-power applications due to its higher thermal conductivity, while GaN excels in high-frequency applications thanks to its superior electron mobility.

  • What is Tantalum Carbide TaC Coating? - Veteksemicon

    This article introduces the product characteristics of TaC coating, the specific process of preparing TaC coating products using CVD technology, introduces Veteksemicon's most popular TaC coating, and briefly analyzes the reasons for choosing Veteksemicon.

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