Web Menu

Product Search

Language

Products

China Silicon carbide single crystal substrate Manufacturer, Supplier, Factory

"Control the standard by the details, show the power by quality". Our firm has strived to establish a extremely efficient and stable employees crew and explored an effective excellent command method for Silicon carbide single crystal substrate, CVD TaC coating, three-petal guide ring, TaC coated guide ring, Tantalum Carbide Coating, We will do our best to meet your requirements and are sincerely looking forward to developing mutual beneficial business relationship with you!
Silicon carbide single crystal substrate, Our solutions are widely recognized and trusted by users and can meet continuously changing of economic and social needs. We welcome new and old customers from all walks of life to contact us for future business relationships and mutual success!

Related Products

Hot Products

  • TaC Coated Guide Ring

    TaC Coated Guide Ring

    TaC Coated Guide Ring is made of high-quality graphite and TaC coating. In the preparation of SiC crystals by PVT method, VeTek Semiconductor's TaC coated guide ring is mainly used to guide and control the airflow, optimize the single crystal growth process, and improve the single crystal yield. With excellent TaC coating technology, our products have excellent high temperature resistance, corrosion resistance and good mechanical properties.
  • TaC Coating Rotation Susceptor

    TaC Coating Rotation Susceptor

    As a professional manufacturer, innovator and leader of TaC Coating Rotation Susceptor products in China. VeTek Semiconductor TaC Coating Rotation Susceptor is usually installed in chemical vapor deposition (CVD) and molecular beam epitaxy (MBE) equipment to support and rotate wafers to ensure uniform material deposition and efficient reaction. It is a key component in semiconductor processing. Welcome your further consultation.
  • Wafer Handling End Effector

    Wafer Handling End Effector

    Wafer Handling End Effector is an important part in the semiconductor processing, transporting wafers and protecting their surfaces from damage. VeTek Semiconductor, as a leading manufacturer and supplier of Wafer Handling End Effector, is always committed to providing customers with excellent Wafer Handling Robotic Arm products and the best services. we look forward to becoming your long-term partner in wafer handling tools products.
  • SiC Coated Support Ring

    SiC Coated Support Ring

    VeTek Semiconductor is a professional China manufacturer and supplier, mainly producing SiC coated support rings, CVD silicon carbide (SiC) coatings, tantalum carbide (TaC) coatings. We are committed to providing perfect technical support and ultimate product solutions for the semiconductor industry, welcome to contact us.
  • SiC Coated Barrel Susceptor for LPE PE2061S

    SiC Coated Barrel Susceptor for LPE PE2061S

    As one of the leading wafer susceptor manufacturing plants in China, VeTek Semiconductor has made continuous progress in wafer susceptor products and has become the first choice for many epitaxial wafer manufacturers. The SiC Coated Barrel Susceptor for LPE PE2061S provided by VeTek Semiconductor is designed for LPE PE2061S 4'' wafers. The susceptor has a durable silicon carbide coating that improves performance and durability during the LPE (liquid phase epitaxy) process. Welcome your inquiry, we look forward to becoming your long-term partner.
  • Silicon Carbide (SiC) Cantilever Paddle

    Silicon Carbide (SiC) Cantilever Paddle

    The role of Silicon Carbide (SiC) Cantilever Paddle in the semiconductor industry is to support and transport wafers. In high-temperature processes such as diffusion and oxidation, SiC cantilever paddle can stably carry wafer boats and wafers without deformation or damage due to high temperature, ensuring the smooth progress of the process. Making diffusion, oxidation and other processes more uniform is crucial to improving the consistency and yield of wafer processing. VeTek Semiconductor uses advanced technology to build SiC cantilever paddle with high-purity silicon carbide to ensure that wafers will not be contaminated. VeTek Semiconductor looks forward to long-term cooperation with you on Silicon Carbide (SiC) Cantilever Paddle products.

  • What is an EPI Epitaxial Furnace? - VeTek Semiconductor

    The working principle of the epitaxial furnace is to deposit semiconductor materials on a substrate under high temperature and high pressure. Silicon epitaxial growth is to grow a layer of crystal with the same crystal orientation as the substrate and different thickness on a silicon single crystal substrate with a certain crystal orientation. This article mainly introduces the silicon epitaxial growth methods: vapor phase epitaxy and liquid phase epitaxy.

  • Characteristics of silicon epitaxy

    High purity: The silicon epitaxial layer grown by chemical vapor deposition (CVD) has extremely high purity, better surface flatness and lower defect density than traditional wafers.

  • 8-inch SiC epitaxial furnace and homoepitaxial process research

    8-inch SiC epitaxial furnace and homoepitaxial process research

  • Why does 3C-SiC stand out among many SiC polymorphs? - VeTek Semiconductor

    Silicon carbide (SiC) is a high-precision semiconductor material known for its excellent properties like high temperature resistance, corrosion resistance, and high mechanical strength. It has over 200 crystal structures, with 3C-SiC being the only cubic type, offering superior natural sphericity and densification compared to other types. 3C-SiC stands out for its high electron mobility, making it ideal for MOSFETs in power electronics. Additionally, it shows great potential in nanoelectronics, blue LEDs, and sensors.

  • Application of carbon-based thermal field materials in silicon carbide crystal growth

    Silicon carbide (SiC)'s Key growth methods include PVT, TSSG, and HTCVD, each with distinct advantages and challenges. Carbon-based thermal field materials like insulation systems, crucibles, TaC coatings, and porous graphite enhance crystal growth by providing stability, thermal conductivity, and purity, essential for SiC's precise fabrication and application.

  • What measurement equipment are there in the Fab factory? - VeTek semiconductor

    There are many types of measurement equipment in the Fab factory. Common equipment includes lithography process measurement equipment, etching process measurement equipment, thin film deposition process measurement equipment, doping process measurement equipment, CMP process measurement equipment, wafer particle detection equipment and other measurement equipment.

Send Inquiry

X
We use cookies to offer you a better browsing experience, analyze site traffic and personalize content. By using this site, you agree to our use of cookies. Privacy Policy
Reject Accept