Products
Semiconductor Quartz Crucible
  • Semiconductor Quartz CrucibleSemiconductor Quartz Crucible
  • Semiconductor Quartz CrucibleSemiconductor Quartz Crucible

Semiconductor Quartz Crucible

Veteksemicon semiconductor-grade quartz crucibles are key consumables in the Czochralski single crystal growth process. With extreme purity and superior thermal stability as our core focus, we are committed to providing customers with high-quality products that exhibit stable performance and excellent resistance to crystallization under high temperature and high pressure environments. This ensures the quality of the crystal rods from the source, helping semiconductor silicon wafer manufacturing achieve higher yields and better cost-effectiveness.

General product information

Place of Origin:
China
Brand Name:
Veteksemicon
Model Number:
Semiconductor Quartz Crucible-001
Certification:
ISO9001


Product business terms

Minimum Order Quantity:
Subject to negotiation
Price:
Contact for Customized Quotation
Packaging Details:
Standard export package
Delivery Time:
Delivery Time: 30-45 Days After Order Confirmation
Payment Terms:
T/T
Supply Ability:
500units/Month


    ● Application: Semiconductor Quartz Crucible is designed specifically for semiconductor-grade single-crystal silicon growth processes. It is a core consumable for Czochralski (CZ) and Magnetic Czochralski (MCZ) processes and is widely used in the manufacture of silicon wafers for advanced logic, memory chips, and power devices ranging from 6 inches to 12 inches.

   ● Services that can be provided: customer application scenario analysis, matching materials, technical problem solving. 

   ● Company profile:Veteksemicon has 2 laboratories, a team of experts with 20 years of material experience, with R&D and production, testing and verification capabilities.


Veteksemicon Semiconductor Quartz Crucible core advantages


1. Ultimate purity, guaranteed from the source

In semiconductor-grade single crystal growth, even the slightest impurity is fatal. Veteksemicon quartz crucibles adhere to stringent standards from the raw material stage, selecting ultra-high purity quartz sand and utilizing advanced arc melting technology to ensure that the silica purity of the finished crucibles remains consistently above 99.99%. We place particular emphasis on controlling critical impurity ions such as alkali metals and heavy metals, reducing their content to below the ppm level. This extreme purity from the source effectively avoids lattice defects caused by impurity precipitation at high temperatures, laying a solid foundation for you to pull perfect single-crystal silicon rods with low defects and high integrity.


2. Excellent resistance to crystallization

Illustration of Semiconductor Quartz Crucible in single silicon crystal pulling processQuartz crucibles gradually devitrify and crystallize at high temperatures. This crystallized layer can lead to cracking or detachment, contaminating the silicon melt. Veteksemicon utilizes unique surface treatment technology and precise process control to form a dense protective layer on the inner surface of the crucible, significantly delaying crystallization. This means our crucibles maintain their "youthful" state for longer periods of high-temperature operation, resulting in a longer single-use lifespan and supporting more stable continuous crystal pulling operations. This directly helps reduce the risk of downtime and product scrap due to crucible performance degradation, improving production efficiency and economic benefits.



3. Excellent thermal stability and low thermal deformation

From room temperature to over 1700°C, near the melting point of silicon, quartz crucibles undergo severe thermal shock testing. Veteksemicon crucibles, made from high-quality materials with extremely low coefficients of thermal expansion, can easily withstand drastic temperature changes and exhibit excellent thermal shock resistance. Simultaneously, through computer-aided design, we precisely calculated the crucible's wall thickness and curvature to ensure minimal deformation and a more uniform thermal field distribution at operating temperatures. This stable thermal environment is a crucial prerequisite for growing high-quality single crystals with precisely controllable oxygen content and uniform resistivity.


4. Strict quality consistency

For high-end manufacturing, performance fluctuations are unacceptable. Veteksemicon understands this well, and we have established a comprehensive quality control system that spans the entire process from raw materials, production, post-processing, to finished products. Every crucible leaving the factory must undergo multiple non-destructive tests, including dimensional accuracy, internal bubbles, impurity spots, and hydroxyl content, to ensure it meets stringent pre-set standards. We deliver not just a single excellent product, but a batch of predictable, reliable, and stable performance. Choosing Veteksemicon means choosing certainty and repeatable success for your production line.


5. Ecological chain verification endorsement

Veteksemicon Semiconductor Quartz Crucible' ecological chain verification covers raw materials to production, has passed international standard certification, and has a number of patented technologies to ensure its reliability and sustainability in the semiconductor and new energy fields.


For detailed technical specifications, white papers, or sample testing arrangements, please contact our Technical Support Team to explore how Veteksemicon can enhance your process efficiency.


Technical Parameters

project
parameter
raw material
High-purity natural quartz sand / synthetic quartz material
purity
≥99.99% (SiO2)
Temperature resistance
The softening point can reach 1700℃
Anti-crystallization
It performs excellently in environments ranging from 1050℃ to 1300℃
Hydroxyl content
Customization is available to meet customer process requirements (<10ppm or >150ppm)
Appearance
The surface is smooth and free of visible bubbles and impurities

Main application fields

Application direction
Typical scenario
Czochralski (CZ) Method for growing single-crystal silicon
Suitable for the production of large-diameter single-crystal silicon rods ranging from 6 inches to 12 inches and above.
Magnetic Czochralski (MCZ) Method
To meet the demand for low-oxygen silicon wafers for high-end devices.
Preparation of special semiconductor materials
Such as compound semiconductors.

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