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China Quartz Crucible for Semiconductor Manufacturer, Supplier, Factory

We have been proud from the higher consumer gratification and wide acceptance due to our persistent pursuit of high quality both on product or service and service for Quartz Crucible for Semiconductor, Semiconductor Quartz Crucible, CZ Quartz Crucible, Silicon Pulling Quartz Crucible, High Purity Quartz Crucible, With the eternal goal of "continuous quality improvement, customer satisfaction", we are sure that our product quality is stable and reliable and our products are best-selling at home and abroad.
Quartz Crucible for Semiconductor, We put the product quality and customer's benefits to the first place. Our experienced salesmen supply prompt and efficient service. Quality control group make sure the best quality. We believe quality comes from detail. If you have demand, let us work together to get success.

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  • TaC Coated Graphite Guide Ring

    TaC Coated Graphite Guide Ring

    Our TaC-coated graphite guide rings are precision core components for semiconductor wafer manufacturing. They feature a high-purity graphite substrate coated with a wear-resistant and chemically inert tantalum carbide (TaC) coating. Designed for demanding processes such as epitaxial deposition and plasma etching, they ensure precise wafer alignment and stability, effectively control contamination, and significantly extend component life. Veteksemicon offers customization services to perfectly match your equipment and process requirements.
  • SiC coated Wafer Holder

    SiC coated Wafer Holder

    VeTek Semiconductor is a professional manufacturer and leader of SiC coated wafer holder products in China. SiC coated wafer holder is a wafer holder for the epitaxy process in semiconductor processing. It is an irreplaceable device that stabilizes the wafer and ensures the uniform growth of the epitaxial layer. Welcome your further consultation.
  • SiC coating halfmoon graphite parts

    SiC coating halfmoon graphite parts

    As a professional semiconductor manufacturer and supplier, VeTek Semiconductor can provide a variety of graphite components required for SiC epitaxial growth systems. These SiC coating halfmoon graphite parts are designed for the gas inlet section of the epitaxial reactor and play a vital role in optimizing the semiconductor manufacturing process. VeTek Semiconductor always strives to provide customers with the best quality products at the most competitive prices. VeTek Semiconductor looks forward to becoming your long-term partner in China.
  • CVD SiC Graphite Cylinder

    CVD SiC Graphite Cylinder

    Vetek Semiconductor’s CVD SiC Graphite Cylinder is pivotal in semiconductor equipment, serving as a protective shield within reactors to safeguard internal components in high temperature and pressure settings. It effectively shields against chemicals and extreme heat, preserving equipment integrity. With exceptional wear and corrosion resistance, it ensures longevity and stability in challenging environments. Utilizing these covers enhances semiconductor device performance, prolongs lifespan, and mitigates maintenance requirements and damage risks.Welcome to inquiry us.
  • Glassy Carbon Crucible

    Glassy Carbon Crucible

    As a leading Chinese manufacturer of Glassy Carbon products, Veteksemicon's Glassy Carbon Crucibles are widely used in the semiconductor manufacturing field due to their excellent ultra-high purity, zero porosity, anti-permeation and excellent chemical corrosion resistance, and have won high praise from European and American customers. Welcome to your inquiry.
  • TaC Coating Pedestal Support Plate

    TaC Coating Pedestal Support Plate

    TaC coating can withstand high temperature of 2200℃. Vetek semiconductor provides high purity TaC coating with impurities below 5ppm in China. TaC coating Pedestal support plate is able to withstand ammonia hydrogen, argonin in the epitaxial device reaction chamber.It improves the service life of the product. You provide the requirements, we provide customization.

  • What is the difference between epitaxy and ALD?

    The main difference between epitaxy and atomic layer deposition (ALD) lies in their film growth mechanisms and operating conditions. Epitaxy refers to the process of growing a crystalline thin film on a crystalline substrate with a specific orientation relationship, maintaining the same or similar crystal structure. In contrast, ALD is a deposition technique that involves exposing a substrate to different chemical precursors in sequence to form a thin film one atomic layer at a time.

  • VETEK to Participate in SEMICON Europa 2025 in Munich, Germany

    In 2025, the European semiconductor industry will once again meet at the largest semiconductor trade fair SEMICON Europa in Munich from November 18-21

  • Why Silicon carbide(SiC) PVT Crystal Growth Cannot Do Without Tantalum Carbide Coatings(TaC)?

    In the process of growing silicon carbide (SiC) crystals via the Physical Vapor Transport (PVT) method, the extreme high temperature of 2000–2500 °C is a “double-edged sword” — while it drives the sublimation and transport of source materials, it also dramatically intensifies impurity release from all materials within the thermal field system, especially trace metallic elements contained in conventional graphite hot-zone components. Once these impurities enter the growth interface, they will directly damage the core quality of the crystal. This is the fundamental reason why tantalum carbide (TaC) coatings have become a “mandatory option” rather than an “optional choice” for PVT crystal growth.

  • Chinese companies are reportedly developing 5nm chips with Broadcom!

    According to overseas news, two sources revealed on June 24 that ByteDance is working with US chip design company Broadcom to develop an advanced artificial intelligence (AI) computing processor, which will help ByteDance ensure an adequate supply of high-end chips amid tensions between China and the United States.

  • What is Silicon Wafer CMP Polishing Slurry?

    Silicon wafer CMP (Chemical Mechanical Planarization) polishing slurry is a critical component in the semiconductor manufacturing process. It plays a pivotal role in ensuring that silicon wafers—used to create integrated circuits (ICs) and microchips—are polished to the exact level of smoothness required for the next stages of production

  • What’s the difference between Silicon Carbide and Tantalum Carbide Coatings?

    This article analyzes the product characteristics and application scenarios of tantalum carbide coating and silicon carbide coating from multiple perspectives.

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