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7N High-Purity CVD SiC raw material
  • 7N High-Purity CVD SiC raw material7N High-Purity CVD SiC raw material

7N High-Purity CVD SiC raw material

The quality of the initial source material is the primary factor limiting wafer yield in the production of SiC single crystals. VETEK's 7N High-Purity CVD SiC Bulk offers a high-density polycrystalline alternative to traditional powders, specifically engineered for Physical Vapor Transport (PVT). By utilizing a bulk CVD form, we eliminate common growth defects and significantly improve furnace throughput. Looking forward to your inquiry.

1. Core Performance Factors



  • 7N Grade Purity: We maintain a consistent purity of 99.99999% (7N), keeping metallic impurities at ppb levels. This is essential for growing high-resistivity semi-insulating (HPSI) crystals and ensuring zero contamination in power or RF applications.
  • Structural Stability vs. C-Dust: Unlike traditional powders that tend to collapse or release fines during sublimation, our large-grain CVD bulk remains structurally stable. This prevents carbon dust (C-dust) migration into the growth zone—the leading cause of crystal inclusions and micro-pipe defects..
  • Optimized Growth Kinetics: Designed for industrial-scale manufacturing, this source supports growth rates up to 1.46 mm/h. This represents a 2x to 3x improvement over the 0.3–0.8 mm/h typically achieved with conventional powder-based methods.
  • Thermal Gradient Management: The high bulk density and specific geometry of our blocks create a more aggressive temperature gradient within the crucible. This promotes a balanced release of Silicon and Carbon vapors, mitigating the "Si-rich early / C-rich late" fluctuations that plague standard processes.
  • Crucible Loading Optimization: Our material allows for a 2kg+ increase in loading capacity for 8-inch crucibles compared to powder methods. This enables the growth of longer ingots per cycle, directly improving the post-production yield rate toward 100%.



Vetek CVD SiC Raw Material


1. Technical Specifications

Parameter
Data
Material Base
High-Purity Polycrystalline CVD SiC
Purity Standard
7N (≥ 99.99999%)
Nitrogen (N) Concentration
≤ 5 × 10¹⁵ cm⁻³
Morphology
High-density large-grain blocks
Process Application
PVT-based 4H and 6H-SiC Crystal Growth
Growth Benchmark
1.46 mm/h with high crystal quality

Comparison: Traditional Powder vs. VETEK CVD Bulk

Comparison Item
Traditional SiC Powder
VETEK CVD-SiC Bulk
Physical Form
Fine/Irregular Powder
Dense, Large-Grain Blocks
Inclusion Risk
High (due to C-dust migration)
Minimal (structural stability)
Growth Rate
0.3 – 0.8 mm/h
Up to 1.46 mm/h
Phase Stability
Drifts during long growth cycles
Stable stoichiometric release
Furnace Capacity
Standard
+2kg per 8-inch crucible


CVD SiC Raw Material for SiC Crystal Growth

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