China ceramic mig nozzle Manufacturer, Supplier, Factory

VeTek semiconductor is a leading semiconductor quartz tank manufacturer and factory in China. In fact, quartz tank is particularly important in the wet processing used in wafer manufacturing. Welcome your further inquiries.

VeTek Semiconductor is a leading quartz crucible supplier and manufacturer in China. the quartz crucibles we produce are mainly used in the semiconductor and photovoltaic fields. They have the properties of cleanliness and high temperature resistance. And our quartz crucible for semiconductor support the production processes of silicon rod pulling, loading and unloading of polysilicon raw materials in the semiconductor silicon wafer production process, and are key consumables for silicon wafer production. VeTek Semiconductor looks forward to becoming your long-term partner in China.

The silicon carbide ceramic coating heater is mainly designed for the high temperature and harsh environment of semiconductor manufacturing. Its ultra-high melting point, excellent corrosion resistance and outstanding thermal conductivity determine the indispensability of this product in the semiconductor production process.

At Vetek Semiconductor, graphite thermal fields are meticulously designed to meet the stringent standards of the photovoltaic industry, ensuring optimal performance and efficiency across various applications. We are dedicated to manufacturing high-performance graphite thermal fields that offer exceptional quality and cost-effectiveness.Pls no hesitate to contact us for any technical question or price.

Veteksemi’s Semiconductor MAX phase nanopowder offers exceptional thermal and electrical properties, ideal for advanced electronics and materials science applications. With superior oxidation resistance and high-temperature stability, Veteksemi's nanopowder is the perfect solution for innovative semiconductor technologies.

Veteksemicon’s CVD SiC coated wafer susceptor is a cutting-edge solution for semiconductor epitaxial processes, offering ultra-high purity (≤100ppb, ICP-E10 certified) and exceptional thermal/chemical stability for contamination-resistant growth of GaN, SiC, and silicon-based epi-layers. Engineered with precision CVD technology, it supports 6”/8”/12” wafers, ensures minimal thermal stress, and withstands extreme temperatures up to 1600°C.