Web Menu

Product Search

Language

Products

China Wafer Handling Boat Manufacturer, Supplier, Factory

We have state-of-the-art equipment. Our products are exported for the USA, the UK and so on, enjoying a fantastic status among the clients for Wafer Handling Boat, Semiconductor Wafer Cassettes, Wafer Cassette Holder, Wafer Carrier Boat, Silicon Carbide Tray, If you're searching for a top quality, fast delivery, greatest following company and superior value supplier in China for long-term business partnership, we're going to be your best choice.
Wafer Handling Boat, We have now established long-term, stable and good business relationships with many manufacturers and wholesalers around the world. Currently, we are looking forward to even greater cooperation with overseas customers based on mutual benefits. Make sure you feel free to contact us for more details.

Related Products

Hot Products

  • SiC Coating Wafer Carrier

    SiC Coating Wafer Carrier

    As a professional SiC coating wafer carrier manufacturer and supplier, Vetek Semiconductor's SiC coating wafer carriers are mainly used to improve the growth uniformity of epitaxial layer, ensuring their stability and integrity in high temperature and corrosive environments.
  • PyC Coating Rigid Felt Ring

    PyC Coating Rigid Felt Ring

    Pyrolytic carbon coatings are widely applied to rigid felt. VeTek Semiconductor is a leading manufacturer of customized PyC Coating Rigid Felt Ring in China, specializing in advanced materials for many years. Our PyC Coating Rigid Felt Ring have dense surface and high purity. With 2 laboratories and 12 production lines, thousand-grade and hundred-grade production workshops in our factory, welcome to visit us.
  • VEECO MOCVD Susceptor

    VEECO MOCVD Susceptor

    As a leading manufacturer and supplier of VEECO MOCVD Susceptor products in China, VeTek Semiconductor's MOCVD Susceptor represents the pinnacle of innovation and engineering excellence, specially customized to meet the complex requirements of contemporary semiconductor manufacturing processes. Welcome your further inquiries.
  • CVD Silicon Carbide (SiC) Coated Graphite RTP RTA Carrier

    CVD Silicon Carbide (SiC) Coated Graphite RTP RTA Carrier

    The VETEK CVD Silicon Carbide (SiC) Coated Graphite RTP RTA Carrier is designed for rapid thermal processing (RTP) and rapid thermal annealing (RTA) systems used in semiconductor manufacturing. Manufactured from high-purity isostatic graphite with a dense CVD SiC coating, it provides outstanding thermal stability, excellent temperature uniformity, superior chemical resistance, and ultra-low particle generation. Engineered to withstand repeated rapid heating and cooling cycles, the carrier ensures reliable wafer support and stable process performance for silicon wafer annealing and other high-temperature semiconductor applications.
  • SiC Coating Cover Segments

    SiC Coating Cover Segments

    Vtech Semiconductor is committed to the development and commercialization of CVD SiC coated parts for Aixtron reactors. As an example, our SiC Coating Cover Segments have been carefully processed to produce a dense CVD SiC coating with excellent corrosion resistance, chemical stability, welcome to discuss application scenarios with us.
  • Tantalum Carbide Coated Halfmoon Part for LPE

    Tantalum Carbide Coated Halfmoon Part for LPE

    VeTek Semiconductor is a leading supplier of Tantalum Carbide Coated Halfmoon Part for LPE in China, focusing on TaC coating technology for many years. Our Tantalum Carbide Coated Halfmoon Part for LPE is designed for liquid phase epitaxy process and can withstand high temperature of over 2000 degrees Celsius. With excellent material performance and process innovation, our product life is at the leading level in the industry. VeTek Semiconductor looks forward to being your long-term partner in China.

  • Why Does Graphite Boat for PECVD Matter So Much to Film Quality and Production Stability?

    In PECVD production, many coating and deposition problems do not start with plasma power or gas chemistry. They start with the carrier that holds the wafers.

  • The Problems in the Etching Process

    Etching technology in semiconductor manufacturing often encounters problems such as loading effect, micro-groove effect and charging effect, which affect product quality. Improvement solutions include optimizing plasma density, adjusting reaction gas composition, improving vacuum system efficiency, designing reasonable lithography layout, and selecting appropriate etching mask materials and process conditions.

  • What is hot pressed SiC ceramics?

    Hot pressing sintering is the main method for preparing high-performance SiC ceramics. The process of hot pressing sintering includes: selecting high-purity SiC powder, pressing and molding under high temperature and high pressure, and then sintering. SiC ceramics prepared by this method have the advantages of high purity and high density, and are widely used in grinding discs and heat treatment equipment for wafer processing.

  • ​Inside the Manufacturing of Solid CVD SiC Focus Rings: From Graphite to High-Precision Parts

    In the high-stakes world of semiconductor manufacturing, where precision and extreme environments coexist, Silicon Carbide (SiC) focus rings are indispensable. Known for their exceptional thermal resistance, chemical stability, and mechanical strength, these components are critical to advanced plasma etching processes. The secret behind their high performance lies in Solid CVD (Chemical Vapor Deposition) technology. Today, we take you behind the scenes to explore the rigorous manufacturing journey—from a raw graphite substrate to a high-precision "invisible hero" of the fab.

  • VETEK Celebrates Topping-Out Ceremony of New Semiconductor Manufacturing Base

    VETEK celebrates the topping-out ceremony of its new semiconductor manufacturing base, expanding production capacity for advanced SiC, TaC and PyC coating technologies, Solid SiC components, high-purity graphite parts and semiconductor thermal field materials.

  • Semiconductor process: Chemical Vapor Deposition (CVD)

    Chemical vapor deposition (CVD) in semiconductor manufacturing is used to deposit thin film materials in the chamber, including SiO2, SiN, etc., and commonly used types include PECVD and LPCVD. By adjusting the temperature, pressure and reaction gas type, CVD achieves high purity, uniformity and good film coverage to meet different process requirements.

Send Inquiry

X
We use cookies to offer you a better browsing experience, analyze site traffic and personalize content. By using this site, you agree to our use of cookies.Privacy Policy
RejectAccept