Semiconductor Quartz Bath

Vetek Semiconductor's quartz bath is designed for cleaning and processing silicon wafers and is widely used in semiconductors, photovoltaics and other fields. The quartz bath for semiconductor is made of high-purity quartz material, has excellent high temperature resistance and chemical stability, and can work stably in high temperature and high corrosion environments. Whether it is cleaning large wafers with a diameter of 300mm or customized requirements of other specifications, the semiconductor quartz bath can provide efficient and reliable solutions to empower your production line.

Semiconductor quartz bath Product Features

1. Large capacity design to meet batch cleaning needs

●  Accommodate 50 wafers: The standard design of the semiconductor quartz bath supports the cleaning of up to 50 wafers at the same time, greatly improving the cleaning efficiency.

●  Compatible with multiple sizes: Supports wafers with a maximum diameter of 300mm, and can also be customized according to needs. Other sizes, such as 150mm or 200mm, can meet the needs of different process flows.

●  Modular design: Suitable for silicon wafers of different specifications, supports fast switching, and flexibly responds to various cleaning tasks.

2. High-purity quartz material, excellent performance guarantee

●  High temperature resistance: Quartz material can withstand the temperature range of 0°C to 1200°C, suitable for a variety of thermal cleaning and heat treatment processes.

●  Corrosion resistance: Quartz tank can resist the corrosion of strong acids (such as HF, HCl) and strong alkalis for a long time, and is particularly suitable for the circulation treatment of chemical etching solutions or cleaning solutions.

●  High cleanliness: The inner wall surface of semiconductor quartz tank is smooth and has no pores, and will not adsorb particles or chemical residues, effectively avoiding chip contamination.

3. Flexible customization to meet different process requirements

●  Size customization: Adjust the size, depth and capacity of the bath according to user needs to support the cleaning needs of special chip specifications.

●  Support for automated integration: Compatible with industrial automation equipment to achieve fully automated operation of chip cleaning.

4. High-precision process to ensure product quality

●  Precise welding and processing: Use advanced processing technology to ensure the stability and sealing of the equipment under high temperature and high pressure environments.

●  Durable design: After multiple durability tests, ensure that the equipment performs as before under long-term high-frequency use.

●  High reliability: Avoid scratches, breakage or cross contamination of wafers during cleaning, and improve yield rate.

Semiconductor Quartz bath Technical parameters

Applicable scenarios of Quartz bath for semiconductor

1. Semiconductor industry

●  Silicon wafer cleaning: used to remove particles, oxide layers and organic residues on the surface of the wafer.

●  Etching liquid treatment: cooperate with chemical etching process to accurately remove materials in specific areas.

2. Photovoltaic industry

●  Solar cell cleaning: remove pollutants generated during the production process and improve the conversion efficiency of the cell.

3. Scientific research experiments

●  Material science: suitable for cleaning high-purity experimental samples.

●  Micro-nano processing: supports a variety of experimental equipment and process flows.

Vetek Semiconductor quartz bath production shops