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China Porous Graphite Material Manufacturer, Supplier, Factory

We pursue the administration tenet of "Quality is top-quality, Company is supreme, Track record is first", and will sincerely create and share success with all purchasers for Porous Graphite Material, Isostatic Graphite, Porous Graphite, Porous Carbon, SiC Crystal Growth Porous Graphite, In case you are looking for a high quality, quickly delivery, best just after assistance and good value supplier in China for long-term organization connection, we're going to be your most effective choice.
Porous Graphite Material, Our aim is to help customers realize their goals. We have been making great efforts to achieve this win-win situation and sincerely welcome you to join us. In a word, when you choose us, you choose a perfect life. Welcome to visit our factory and welcome your order! For further inquiries, remember to do not hesitate to contact us.

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  • Porous SiC Ceramic Plate

    Porous SiC Ceramic Plate

    Our porous SiC ceramic plates are porous ceramic materials made of silicon carbide as the main component and processed by special processes. They are indispensable materials in semiconductor manufacturing, chemical vapor deposition (CVD) and other processes.
  • SiC Process Tube

    SiC Process Tube

    VeTek Semiconductor provides high-performance SiC Process Tubes for semiconductor manufacturing. Our SiC Process Tubes excel in oxidation, diffusion processes. With superior quality and craftsmanship, these tubes offer high-temperature stability and thermal conductivity for efficient semiconductor processing. We offer competitive pricing and seek to be your long-term partner in China.
  • High Purity Quartz Wafer Boat

    High Purity Quartz Wafer Boat

    VeTek Semiconductor provides high-performance High Purity Quartz Wafer Boat, designed for the most demanding applications in semiconductor and photovoltaic manufacturing. Made of high-quality quartz material, it has ultra-low contamination characteristics, ensuring the excellent performance of High Purity Quartz Wafer Boat in high temperature environments, and can effectively prevent wafer contamination. Choose VeTek Semiconductor to improve your manufacturing process. Looking forward to your inquiry at any time.
  • TaC Coating Susceptor

    TaC Coating Susceptor

    VeTek Semiconductor presents the TaC Coating Susceptor, With its exceptional TaC coating, this susceptor offers a multitude of advantages that set it apart from conventional solutions.Integrating seamlessly into existing systems, the TaC Coating Susceptor from VeTek Semiconductor guarantees compatibility and efficient operation. Its reliable performance and high-quality TaC coating consistently deliver exceptional results in SiC epitaxy processes.We are committed to providing quality products at competitive prices and look forward to being your long-term partner in China.
  • Vertical furnace SiC coated ring

    Vertical furnace SiC coated ring

    Vertical furnace SiC coated ring is a component specially designed for Vertical furnace. VeTek Semiconductor can do the best for you in terms of both materials and manufacturing processes. As a leading manufacturer and supplier of Vertical furnace SiC coated ring in China, VeTek Semiconductor is confident that we can provide you with the best products and services.
  • TaC Coating Plate

    TaC Coating Plate

    Designed with precision and engineered to perfection, Vetek Semiconductor's TaC Coating Plate is specifically tailored for various applications in silicon carbide (SiC) single crystal growth processes.The TaC Coating Plate's precise dimensions and robust construction make it easy to integrate into existing systems, ensuring seamless compatibility and efficient operation. Its reliable performance and high-quality coating contribute to consistent and uniform results in SiC crystal growth applications.We are committed to providing quality products at competitive prices and look forward to being your long-term partner in China.

  • The top 3 quartz material suppliers in the world

    Quartz material is one of the essential materials for high-tech industries such as semiconductors and photovoltaics. This blog introduces the world's top three quartz material suppliers Sibelco, TQC and Momentive and their products.

  • Characteristics of silicon epitaxy

    High purity: The silicon epitaxial layer grown by chemical vapor deposition (CVD) has extremely high purity, better surface flatness and lower defect density than traditional wafers.

  • Quartz devices in solar cell manufacturing

    Quartz devices play a critical role in solar cell manufacturing, offering exceptional thermal resistance, chemical purity, and structural stability required in high-temperature processes. From quartz diffusion tubes and crucibles to quartz boats and furnace components, these high-purity materials are essential for achieving optimal efficiency in diffusion, CVD, and wet etching steps.

  • How does SiC coating improve the oxidation resistance of carbon felt？

    The article describes the excellent physical properties of Carbon felt, the specific reasons for choosing SiC coating, and the method and principle of SiC coating on carbon felt. It also specifically analyzes the use of D8 ADVANCE X-ray diffractometer (XRD) to analyze the phase composition of SiC coating carbon felt.

  • Thermal Field Design for SiC Single Crystal Growth

    With the growing demand for SiC materials in power electronics, optoelectronics and other fields, the development of SiC single crystal growth technology will become a key area of ​​scientific and technological innovation. As the core of SiC single crystal growth equipment, thermal field design will continue to receive extensive attention and in-depth research.

  • What is an EPI Epitaxial Furnace? - VeTek Semiconductor

    The working principle of the epitaxial furnace is to deposit semiconductor materials on a substrate under high temperature and high pressure. Silicon epitaxial growth is to grow a layer of crystal with the same crystal orientation as the substrate and different thickness on a silicon single crystal substrate with a certain crystal orientation. This article mainly introduces the silicon epitaxial growth methods: vapor phase epitaxy and liquid phase epitaxy.

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