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China High-purity Porous Graphite Material Manufacturer, Supplier, Factory

High quality Initial,and Buyer Supreme is our guideline to offer the ideal assistance to our shoppers.At present, we are striving our best to become amongst the ideal exporters inside our industry to satisfy shoppers more want for High-purity Porous Graphite Material, Porous Graphite Materials for Single Crystal SiC Growth, Porous Graphite, Semiconductor, Third Generation Semiconductor, We have been prepared to offer you the top suggestions on the designs of one's orders in a professional way if you need. During the meantime, we retain on developing new technologies and building new designs so as for making you ahead within the line of this business.
High-purity Porous Graphite Material, Our goods have been obtained more and more recognition from foreign clients, and established long term and cooperative relationship with them. We`ll offer the best service for every customer and sincerely welcome friends to work with us and establish the mutual benefit together.

Hot Products

  • Three-petal Graphite Crucible

    Three-petal Graphite Crucible

    VeTek Semiconductor's Three-petal Graphite Crucible is made of high purity graphite material processed by surface pyrolytic carbon coating, which is used to pull single crystal thermal field. Compared with traditional crucible, the structure of three-lobe design is more convenient to install and disassemble, improve work efficiency, and the impurities below 5ppm can meet the application of semiconductor and photovoltaic industry.
  • SiC Coated MOCVD Susceptor

    SiC Coated MOCVD Susceptor

    Veteksemicon's SiC Coated MOCVD Susceptor is a device with excellent process, durability and reliability. They can withstand high temperature and chemical environments, maintain stable performance and long life, thereby reducing the frequency of replacement and maintenance and improving production efficiency. Our MOCVD Epitaxial Susceptor is renowned for its high density, excellent flatness and excellent thermal control, making it the preferred equipment in harsh manufacturing environments. Looking forward to cooperating with you.Welcome to consult at any time.
  • SiC Coated Barrel Susceptor

    SiC Coated Barrel Susceptor

    Epitaxy is a technique used in semiconductor device manufacturing to grow new crystals on an existing chip to make a new semiconductor layer.VeTek Semiconductor offers a comprehensive set of component solutions for LPE silicon epitaxy reaction chambers, delivering long lifespan, stable quality, and improved epitaxial layer yield. Our product such as SiC Coated Barrel Susceptor received position feedback from customers. We also provide technical support for Si Epi, SiC Epi, MOCVD, UV-LED Epitaxy, and more. Feel free to inquire for pricing information.
  • 8 Inch Halfmoon Part for LPE Reactor

    8 Inch Halfmoon Part for LPE Reactor

    VeTek Semiconductor is a leading semiconductor equipment manufacturer in China, focusing on the R&D and production of 8 Inch Halfmoon Part for LPE Reactor. We have accumulated rich experience over the years, especially in SiC coating materials, and are committed to providing efficient solutions tailored for LPE epitaxial reactors. Our 8 Inch Halfmoon Part for LPE Reactor has excellent performance and compatibility, and is an indispensable key component in epitaxial manufacturing. Welcome your inquiry to learn more about our products.
  • SiC Coated Support Ring

    SiC Coated Support Ring

    VeTek Semiconductor is a professional China manufacturer and supplier, mainly producing SiC coated support rings, CVD silicon carbide (SiC) coatings, tantalum carbide (TaC) coatings. We are committed to providing perfect technical support and ultimate product solutions for the semiconductor industry, welcome to contact us.
  • High purity graphite power

    High purity graphite power

    Vetek Semiconductor offers High purity graphite power that is a high quality product with a purity of up to 5ppm and meets the highest industry standards. Customizable particle form, mainly used for silicon carbide powder and diamond synthesis, suitable for semiconductor, electronics and high-tech industries. Welcome to inquiry us!

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