SiC Coating Collector Bottom

VeTek Semiconductor is manufacturer committed to providing high quality CVD TaC Coating and CVD SiC Coating Collector Bottom and work closely with Aixtron equipment to meet the needs of our customers. Whether in process optimization or new product development, we are ready to provide you with technical support and answer any questions you may have.

Product core function

Process stability guarantee

Temperature gradient control: ±1.5℃/cm@1200℃

Flow field optimization: The special channel design makes the reaction gas distribution uniformity up to 92.6%

Equipment protection mechanism

Dual protection:

Thermal shock buffer: withstand 10℃/s rapid temperature change

Particle interception: Trapping > 0.3μm sediment particles

In the field of cutting-edge technology

Whole process quality control

Production traceability system

Source of raw materials: Tokai/Toyo Graphite from Japan,SGL  graphite from Germany

Digital twin monitoring: Each component is matched to an independent process parameter database

Application scenario:

Third generation semiconductor manufacturing

Scenario: 6-inch SiC epitaxial growth (100-150μm thickness control)

Compatible model: Aixtron G5 WW/CRIUS II

By using Aixtron SiC coated Collector Top, Collector Center and SiC Coated Collector, thermal management and chemical protection in semiconductor manufacturing processes can be achieved, the film growth environment can be optimized, and the quality and consistency of the film can be improved. The combination of these components in Aixtron equipment ensures stable process conditions and efficient semiconductor production.

SEM DATA OF CVD SIC FILM