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Each individual member from our large performance revenue crew values customers' requirements and organization communication for Aixtron equipment, Aixtron SiC Coating Collector Bottom, Aixtron SiC coated Collector Top, CVD SIC FILM, CVD SIC COATING, Trust us and you will gain a lot more. You should truly feel totally free to make contact with us for additional data, we assure you of our greatest notice at all times.
Aixtron equipment, We give good quality but unbeatable low price and the best service. Welcome to post your samples and color ring to us .We are going to produce the items according to your request. If you are interested in any solutions we provide, remember to feel free to contact us directly by mail, fax, telephone or internet. We have been here to answer your questions from Monday to Saturday and looking forward to cooperating with you.

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  • Customized Graphite Heater For Hot Zone

    Customized Graphite Heater For Hot Zone

    In semiconductor manufacturing and advanced material processing, the stability and purity of the thermal field directly dictate the core competitiveness of the final product. VETEK is dedicated to the R&D and manufacturing of high-performance graphite heating systems, providing reliable solutions for MOCVD, SiC epitaxy, and various high-temperature vacuum furnaces.
  • Ultra Pure Silicon Carbide Powder for Crystal Growth

    Ultra Pure Silicon Carbide Powder for Crystal Growth

    VeTek Semiconductor is a professional manufacturer and supplier, dedicated to providing high-quality Ultra Pure Silicon Carbide Powder for Crystal Growth. With a purity of up to 99.999% wt and extremely low impurity levels of nitrogen, boron, aluminum, and other contaminants, it is specifically designed to enhance the semi-insulating properties of high-purity silicon carbide. Welcome to inquire and cooperate with us!
  • Quartz Wafer Boats

    Quartz Wafer Boats

    Our Quartz Wafer Boats are high-purity wafer carrier solution tailored for semiconductor, LED, solar cell, and battery manufacturing processes. Engineered to endure high temperatures and chemically aggressive environments, this quartz boat features low thermal expansion, excellent electrical insulation, and long-term dimensional stability. Ideal for diffusion, oxidation, and LPCVD processes, it supports precise wafer alignment and is available in various sizes to meet different equipment requirements.
  • SiC Process Tube

    SiC Process Tube

    VeTek Semiconductor provides high-performance SiC Process Tubes for semiconductor manufacturing. Our SiC Process Tubes excel in oxidation, diffusion processes. With superior quality and craftsmanship, these tubes offer high-temperature stability and thermal conductivity for efficient semiconductor processing. We offer competitive pricing and seek to be your long-term partner in China.
  • CVD TaC Coating Carrier

    CVD TaC Coating Carrier

    CVD TaC Coating carrier is mainly designed for the epitaxial process of semiconductor manufacturing. CVD TaC Coating carrier’s Ultra-high melting point, excellent corrosion resistance, and outstanding thermal stability determine the indispensability of this product in semiconductor epitaxial process. Welcome your further inquiry.
  • Silicon Carbide Carrier Plate For LED Etching

    Silicon Carbide Carrier Plate For LED Etching

    Veteksemicon Silicon Carbide Carrier Plate For LED Etching, specifically designed for LED chip manufacturing, is a core consumable in the etching process. Made from precision-sintered high-purity silicon carbide, it offers exceptional chemical resistance and high-temperature dimensional stability, effectively resisting corrosion from strong acids, bases, and plasma. Its low contamination properties ensure high yields for LED epitaxial wafers, while its durability, far exceeding that of traditional materials, helps customers reduce overall operating costs, making it a reliable choice for improving etching process efficiency and consistency.
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  • Is SiC Diffusion Furnace Tube the Ultimate Solution for High-Temperature Semiconductor Processing

    The SiC Diffusion Furnace Tube has become a critical component in modern semiconductor manufacturing due to its exceptional thermal stability, chemical resistance, and long service life. This article explores how VeTek delivers advanced SiC solutions that enhance diffusion furnace performance, improve wafer quality, and reduce overall production costs. You will learn its structure, advantages, applications, technical specifications, and why it is increasingly replacing traditional quartz and alumina tubes.

  • Chinese companies are reportedly developing 5nm chips with Broadcom!

    According to overseas news, two sources revealed on June 24 that ByteDance is working with US chip design company Broadcom to develop an advanced artificial intelligence (AI) computing processor, which will help ByteDance ensure an adequate supply of high-end chips amid tensions between China and the United States.

  • What Is a Halfmoon in an LPE Reaction Chamber?

    Learn what a Halfmoon component is in an LPE reaction chamber and how it supports thermal stability, gas flow management, and reactor structure in SiC epitaxy systems. Explore graphite materials, CVD SiC coating, TaC coating, and modern semiconductor reactor technologies.

  • How does SiC coating improve the oxidation resistance of carbon felt？

    The article describes the excellent physical properties of Carbon felt, the specific reasons for choosing SiC coating, and the method and principle of SiC coating on carbon felt. It also specifically analyzes the use of D8 ADVANCE X-ray diffractometer (XRD) to analyze the phase composition of SiC coating carbon felt.

  • What is the difference between epitaxy and ALD?

    The main difference between epitaxy and atomic layer deposition (ALD) lies in their film growth mechanisms and operating conditions. Epitaxy refers to the process of growing a crystalline thin film on a crystalline substrate with a specific orientation relationship, maintaining the same or similar crystal structure. In contrast, ALD is a deposition technique that involves exposing a substrate to different chemical precursors in sequence to form a thin film one atomic layer at a time.

  • Principles and Technology of Physical Vapor Deposition Coating (1/2) - VeTek Semiconductor

    Vacuum coating includes film material vaporization, vacuum transportation and thin film growth. According to the different film material vaporization methods and transportation processes, vacuum coating can be divided into two categories: PVD and CVD.

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