CVD SiC Coating Protector

Product positioning and core functions：

CVD SiC Coating Protector is a key component in LPE silicon carbide epitaxial equipment, mainly used to protect the internal structure of the reaction chamber and improve process stability. Its core functions include:

Corrosion protection: The silicon carbide coating formed by the chemical vapor deposition (CVD) process can resist the chemical corrosion of chlorine/fluorine plasma and is suitable for harsh environments such as etching equipment;

Thermal management: The high thermal conductivity of silicon carbide material can optimize the temperature uniformity in the reaction chamber and improve the quality of the epitaxial layer;

Reducing pollution: As a lining component, it can prevent the reaction by-products from directly contacting the chamber and extend the equipment maintenance cycle.

Technical characteristics and design：

Structural design:

Usually divided into upper and lower half-moon parts, symmetrically installed around the tray to form a ring-shaped protective structure;

Cooperating with components such as trays and gas shower heads to optimize airflow distribution and plasma focusing effects.

Coating process:

The CVD method is used to deposit high-purity SiC coatings, with a uniformity of film thickness within ±5% and a surface roughness as low as Ra≤0.5μm;

The typical coating thickness is 100-300μm, and it can withstand a high temperature environment of 1600℃.

Application scenarios and performance advantages：

Applicable equipment:

Mainly used for LPE's 6-inch 8-inch silicon carbide epitaxial furnace, supporting SiC homoepitaxial growth;

Suitable for etching equipment, MOCVD equipment and other scenarios that require high corrosion resistance.

Key indicators:

Thermal expansion coefficient: 4.5×10⁻⁶/K (matching with graphite substrate to reduce thermal stress);

Resistivity: 0.1-10Ω·cm (meeting conductivity requirements);

Service life: 3-5 times longer than traditional quartz/silicon materials.

Technical barriers and challenges

This product needs to overcome process difficulties such as coating uniformity control (such as edge thickness compensation) and substrate-coating interface bonding optimization (≥30MPa), and at the same time needs to match the high-speed rotation (1000rpm) and temperature gradient requirements of the LPE equipment.