Web Menu

Product Search

Language

Products

China CVD SIC FILM Manufacturer, Supplier, Factory

We emphasize development and introduce new products into the market every year for CVD SIC FILM, SiC Coated Plate Carriers for MOCVD, Aixtron SiC Coating Collector Top, SiC(silicon carbide) coating, Aixtron reactor, Living by quality, development by credit is our eternal pursuit, We firmly believe that after your visit we will become long-term partners.
CVD SIC FILM, now we have 8 years experience of production and 5 years experience in trading with the customers all over the world. our clients mainly distributed in the North America, Africa and Eastern Europe. we can supply high quality items with the very competitive price.

Related Products

Hot Products

  • MOCVD SiC Coated Susceptor

    MOCVD SiC Coated Susceptor

    VETEK MOCVD SiC Coated Susceptor is a precision-engineered carrier solution specifically developed for LED and compound semiconductor epitaxial growth. It demonstrates exceptional thermal uniformity and chemical inertness within complex MOCVD environments. Leveraging VETEK’s rigorous CVD deposition process, we are committed to enhancing wafer growth consistency and extending the service life of core components, providing stable and reliable performance assurance for every batch of your semiconductor production.
  • Physical Vapor Deposition

    Physical Vapor Deposition

    Vetek semiconductor Physical Vapor Deposition (PVD) is an advanced process technology widely used in surface treatment and thin film preparation. PVD technology uses physical methods to directly transform materials from solid or liquid to gas and form a thin film on the surface of the target substrate. This technology has the advantages of high precision, high uniformity and strong adhesion, and is widely used in semiconductors, optical devices, tool coatings and decorative coatings. Welcome to discuss with us!
  • PZT Piezoelectric Wafers (PZT on Si/SOI)

    PZT Piezoelectric Wafers (PZT on Si/SOI)

    As the demand for high-sensitivity and low-power MEMS transducers grows with the expansion of 5G communications, precision medical devices, and smart wearables, our PZT on Si/SOI wafers provide a critical material solution. Utilizing advanced thin-film deposition processes such as Sol-gel or sputtering, we achieve exceptional consistency and superior piezoelectric performance on silicon substrates. These wafers serve as the fundamental core for electromechanical energy conversion.
  • SiC Coated Epi Susceptor

    SiC Coated Epi Susceptor

    As the top domestic manufacturer of silicon carbide and tantalum carbide coatings, VeTek Semiconductor is able to provide precision machining and uniform coating of SiC Coated Epi Susceptor, effectively controlling the purity of coating and product below 5ppm. The product life is comparable to that of SGL. Welcome to inquire us.
  • High purity SiC wafer boat carrier

    High purity SiC wafer boat carrier

    VeTek Semiconductor offers customized High purity SiC wafer boat carrier. Made of high purity silicon carbide, it features slots to hold the wafer in place, preventing it from sliding during processing. CVD SiC coating is also available if required. As a professional and strong semiconductor manufacturer and supplier, VeTek Semiconductor's High purity SiC wafer boat carrier is price competitive and high quality. VeTek Semiconductor looks forward to being your long-term partner in China.
  • Focus ring for Etching

    Focus ring for Etching

    Focus ring for Etching is the key component to ensure process accuracy and stability. These components are precisely assembled in a vacuum chamber to achieve uniform machining of nanoscale structures on the wafer surface through precise control of plasma distribution, edge temperature and electric field uniformity.

  • Porous Silicon Carbide (SiC) Ceramic Plates: High-Performance Materials in Semiconductor Manufacturing

    Porous SiC Ceramic Plate is one of the core materials in the field of semiconductor manufacturing. With its unique structure and excellent physical properties, Porous SiC Ceramic Disc has become an irreplaceable key component in high temperature and corrosive environments. In this article, we will deeply analyze its physical properties, application scenarios and selection advantages.

  • 8-inch SiC epitaxial furnace and homoepitaxial process research

    8-inch SiC epitaxial furnace and homoepitaxial process research

  • What are silicon carbide ceramics?

    In semiconductor manufacturing, various types of semiconductor ceramic components products are needed. These products are used in different production scenarios due to their different characteristics, so as to play their corresponding functions. They are indispensable products in the semiconductor processing industry.

  • How does TaC coating improve the service life of graphite components? - VeTek Semiconductor

    Tantalum carbide (TaC) coating can significantly extend the life of graphite parts by improving high temperature resistance, corrosion resistance, mechanical properties and thermal management capabilities. Its high purity characteristics reduce impurity contamination, improve crystal growth quality, and enhance energy efficiency. It is suitable for semiconductor manufacturing and crystal growth applications in high-temperature, highly corrosive environments.

  • What Is Silicon Carbide (SiC) Coating? Properties, CVD Process & Applications

    Silicon carbide coating is a dense CVD SiC layer applied to high-purity graphite components used in semiconductor processing. This article explains why graphite is coated with SiC, how CVD SiC is formed, which coating properties and interface factors control performance, and how SiC-coated graphite supports silicon epitaxy, SiC epitaxy and MOCVD. It also examines coating thickness, CTE mismatch, delamination risk and the engineering information required when specifying susceptors, wafer carriers and other coated components.

  • Why Is Porous Tantalum Carbide (TaC) Coated Graphite Ring Critical for Reliable SiC Crystal Growth

    The Porous Tantalum Carbide (TaC) Coated Graphite Ring is a specialized thermal-field component designed for Physical Vapor Transport (PVT) SiC single-crystal growth. By combining high-purity porous graphite with a dense CVD tantalum carbide coating, it provides high-temperature stability, corrosion protection, controlled heat distribution, and low contamination. This article explains its structure, technical advantages, applications, specifications, and selection considerations for semiconductor and SiC crystal-growth equipment.

Send Inquiry

X
We use cookies to offer you a better browsing experience, analyze site traffic and personalize content. By using this site, you agree to our use of cookies. Privacy Policy
RejectAccept