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CVD SiC Graphite Cylinder
  • CVD SiC Graphite CylinderCVD SiC Graphite Cylinder

CVD SiC Graphite Cylinder

Vetek Semiconductor’s CVD SiC Graphite Cylinder is pivotal in semiconductor equipment, serving as a protective shield within reactors to safeguard internal components in high temperature and pressure settings. It effectively shields against chemicals and extreme heat, preserving equipment integrity. With exceptional wear and corrosion resistance, it ensures longevity and stability in challenging environments. Utilizing these covers enhances semiconductor device performance, prolongs lifespan, and mitigates maintenance requirements and damage risks.Welcome to inquiry us.

Vetek Semiconductor's CVD SiC Graphite Cylinder plays an important role in semiconductor equipment. It is usually used as a protective cover inside the reactor to provide protection for the internal components of the reactor in high temperature and high pressure environments. This protective cover can effectively isolate the chemicals and high temperatures in the reactor, preventing them from causing damage to the equipment. At the same time, CVD SiC Graphite Cylinder also has excellent wear and corrosion resistance, making it able to maintain stability and long-term durability in harsh working environments. By using protective covers made of this material, the performance and reliability of semiconductor devices can be improved, extending the service life of the device while reducing maintenance needs and the risk of damage.


CVD SiC Graphite Cylinder is widely used in semiconductor equipment, covering the following key areas:


Heat treatment equipment

It serves as a protective cover or heat shield in heat treatment equipment. This not only safeguards internal components from high temperature damage but also boasts excellent high temperature resistance.


Chemical Vapor Deposition (CVD) reactors

In CVD reactors, it acts as a protective cover for the chemical reaction chamber. It effectively isolates reaction substances and offers good corrosion resistance.


Corrosive environments

Thanks to its outstanding corrosion resistance, CVD SiC Graphite Cylinder can be utilized in chemically corrosive settings during semiconductor manufacturing, such as environments with corrosive gases or liquids.


Semiconductor growth equipment

It functions as protective covers or other components in semiconductor growth equipment. By protecting the equipment from high temperatures, chemical corrosion, and wear, it ensures the equipment's stability and long - term reliability.


Characterized by high - temperature stability, corrosion resistance, excellent mechanical properties, and good thermal conductivity, CVD SiC Graphite Cylinder facilitates more efficient heat dissipation in semiconductor devices, thus maintaining device stability and performance.




Basic physical properties of CVD SiC coating:

CVD SIC COATING FILM CRYSTAL STRUCTURE

Basic physical properties of CVD SiC coating
Property Typical Value
Crystal Structure FCC β phase polycrystalline, mainly (111) oriented
Density 3.21 g/cm³
Hardness 2500 Vickers hardness(500g load)
Grain Size 2~10μm
Chemical Purity 99.99995%
Heat Capacity 640 J·kg-1·K-1
Sublimation Temperature 2700℃
Flexural Strength 415 MPa RT 4-point
Young's Modulus 430 Gpa 4pt bend, 1300℃
Thermal Conductivity 300W·m-1·K-1
Thermal Expansion(CTE) 4.5×10-6K-1


Production shops:

VeTek Semiconductor Production Shop


Overview of the semiconductor chip epitaxy industry chain:

Overview of the semiconductor chip epitaxy industry chain


Hot Tags: CVD SiC Graphite Cylinder
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