Web Menu

Product Search

Language

Products

China Wafer Process Manufacturer, Supplier, Factory

We are also specializing in improving the things management and QC method in order that we could retain terrific edge inside the fiercely-competitive small business for Wafer Process, Silicon Carbide Paddle, SiC Wafer Paddle, SiC Diffusion Paddle, High Purity SiC Paddle, We are now looking forward to even greater cooperation with overseas customers based on mutual benefits. If you are interested in any of our products, please feel free to contact us for more details.
Wafer Process, Thus far, our item associated with may be shown in most foreign nations as well as urban centers, which are sought after simply by targeted traffic. We all highly imagine that now we have the full capacity to present you with contented merchandise. Desire to collect requests of your stuff and produce the long-term co-operation partnership. We very seriously promise:Csame top quality, better price; exact same selling price, higher quality.

Related Products

Hot Products

  • Semiconductor Susceptor Block SiC Coated

    Semiconductor Susceptor Block SiC Coated

    VeTek Semiconductor's Semiconductor susceptor block SiC coated is a highly reliable and durable device. It is designed to withstand high temperatures and harsh chemical environments while maintaining stable performance and a long lifespan. With its excellent process capabilities, the Semiconductor Susceptor Block SiC Coated reduces the frequency of replacement and maintenance, thus improving production efficiency. We look forward to the opportunity to collaborate with you.Welcome to consult at any time.
  • SiC coated sealing ring for Epitaxy

    SiC coated sealing ring for Epitaxy

    Our SiC coated sealing ring for Epitaxy is a high-performance sealing component based on graphite or carbon-carbon composites coated with high-purity silicon carbide (SiC) by chemical vapor deposition (CVD), which combines the thermal stability of graphite with the extreme environmental resistance of SiC, and is designed for semiconductor epitaxial equipment (e.g., MOCVD, MBE).
  • CVD TAC Coating

    CVD TAC Coating

    VeTek Semiconductor is china leading CVD TAC Coating products manufacturer. For many years, we have been focusing on various CVD TAC Coating products like CVD TaC coating cover, CVD TaC Coating Ring. VeTek Semiconductor supports customized product services and satisfactory product prices, and looks forward to your further consultation.
  • Ion Beam Sputter sources grid

    Ion Beam Sputter sources grid

    Ion beam is mainly used for ion etching, ion coating and plasma injection. The role of the Ion Beam Sputter sources grid is to dissect the ions and accelerate them to the required energy. Vetek Semiconductor provides high purity graphite ion beam Ion Beam Sputter sources grid for optical lens ion beam polishing, semiconductor wafer modification, etc. Welcome to inquire about customized products.
  • LPE SI EPI Susceptor Set

    LPE SI EPI Susceptor Set

    Flat susceptor and barrel susceptor are the main shape of epi susceptors.VeTek Semiconductor is a leading LPE Si Epi Susceptor Set manufacturer and innovator in China.We have been specialized in SiC coating and TaC coating for many years.We offer a LPE Si Epi Susceptor Set designed specifically for LPE PE2061S 4" wafers. The matching degree of graphite material and SiC coating is good, the uniformity is excellent, and the life is long, which can improve the yield of epitaxial layer growth during the LPE (Liquid Phase Epitaxy) process.We welcome you to visit our factory in China.
  • Carbon Carbon Composite PECVD Pallet

    Carbon Carbon Composite PECVD Pallet

    VeTek Semiconductor has been focusing on the research and development and production of carbon-based materials for many years. Our Carbon Carbon Composite PECVD Pallet is made of high-density carbon fiber, which has excellent high temperature resistance, good mechanical properties and excellent chemical stability, and plays an irreplaceable role in the photovoltaic PECVD process. We look forward to your inquiry and establishing a long-term strategic partnership with you to jointly promote technological progress and industrial development.

  • What is Silicon Carbide Ceramic?

    Silicon carbide ceramics, commonly known as SiC ceramics, are a versatile material with unique properties and a wide range of applications in various industries. The following is a detailed discussion of its material composition, physical properties, specific applications and advantages in semiconductor coating processes, and common problems encountered during processing.

  • A complete explanation of the chip manufacturing process (1/2): from wafer to packaging and testing

    The semiconductor manufacturing process involves eight steps: wafer processing, oxidation, lithography, etching, thin film deposition, interconnection, testing, and packaging. Silicon from sand is processed into wafers, oxidized, patterned, and etched for high-precision circuits.

  • What is High-purity porous graphite?

    What is High-purity porous graphite ? - Vetek , This blog mainly introduces the specific working principle of High-purity porous graphite for SiC single crystal growth by PVT method.

  • How does SiC coating improve the oxidation resistance of carbon felt？

    The article describes the excellent physical properties of Carbon felt, the specific reasons for choosing SiC coating, and the method and principle of SiC coating on carbon felt. It also specifically analyzes the use of D8 ADVANCE X-ray diffractometer (XRD) to analyze the phase composition of SiC coating carbon felt.

  • Thermal Field Design for SiC Single Crystal Growth

    With the growing demand for SiC materials in power electronics, optoelectronics and other fields, the development of SiC single crystal growth technology will become a key area of ​​scientific and technological innovation. As the core of SiC single crystal growth equipment, thermal field design will continue to receive extensive attention and in-depth research.

  • What is the difference between epitaxy and ALD?

    The main difference between epitaxy and atomic layer deposition (ALD) lies in their film growth mechanisms and operating conditions. Epitaxy refers to the process of growing a crystalline thin film on a crystalline substrate with a specific orientation relationship, maintaining the same or similar crystal structure. In contrast, ALD is a deposition technique that involves exposing a substrate to different chemical precursors in sequence to form a thin film one atomic layer at a time.

Related Search

semiconductor wafer processingSemiconductor wafer processing processesVacuum Chuck for Wafer ProcessingWafer Process BoatsWafer processingWafer Processing Boat

Send Inquiry

X
We use cookies to offer you a better browsing experience, analyze site traffic and personalize content. By using this site, you agree to our use of cookies. Privacy Policy
Reject Accept