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China SiC Processing Equipment Manufacturer, Supplier, Factory

We're convinced that with joint initiatives, the business between us will bring us mutual benefits. We can easily guarantee you merchandise good quality and competitive rate for SiC Processing Equipment, SiC Process Tube, Silicon Carbide Process Tube, SiC Tube for Semiconductor, High Temperature SiC Tube, As an expert specialized within this field, we've been committed to solving any problem of high temperature protection for users.
SiC Processing Equipment, We pursue the management tenet of "Quality is superior, Service is supreme, Reputation is first", and will sincerely create and share success with all clients. We welcome you to contact us for more information and look forward to working with you.

Related Products

Hot Products

  • Soft Felt for Furnace Heat Insulation

    Soft Felt for Furnace Heat Insulation

    VeTek Semiconductor is committed to providing high-quality Soft Felt for Furnace Heat Insulation. It is made of carbon fiber or graphite fiber interwoven with each other, and has excellent thermal insulation and high temperature resistance. Whether it is in industrial heating furnaces, high-temperature equipment or other occasions that require thermal insulation, our Soft Felt for Furnace Heat Insulation can meet your needs. VeTek Semiconductor looks forward to establishing a long-term cooperative relationship with you.
  • AMAT 0200-03201 CVD SiC Wafer Lift Pin

    AMAT 0200-03201 CVD SiC Wafer Lift Pin

    This AMAT 0200-03201 Wafer Lift Pin from VeTek starts with high-purity graphite, then we add a dense CVD SiC coating on top. It’s made for 300mm epitaxy systems and Applied Materials EPI reactors. Why graphite and SiC? Graphite handles heat really well. The SiC layer takes on corrosive gases and doesn’t wear out fast. The thin wall design? That’s for cleaner wafer lifting and positioning, fewer particles, and longer part life under high temperatures. We also make similar SiC coated graphite parts for ASM, Aixtron, and LPE systems. Looking forward to your inquiry.
  • Aixtron G5+ ceiling component

    Aixtron G5+ ceiling component

    VeTek Semiconductor has become a supplier of consumables for many MOCVD equipment with its superior processing capabilities. Aixtron G5+ ceiling component is one of our latest products, which is almost the same as the original Aixtron component and has received good feedback from customers. If you need such products, please contact VeTek Semiconductor!
  • Tantalum Carbide Coated Porous Graphite

    Tantalum Carbide Coated Porous Graphite

    Tantalum Carbide Coated Porous Graphite is an indispensable product in the semiconductor processing process, especially in the SIC crystal growth process. After continuous R&D investment and technology upgrades, VeTek Semiconductor's TaC Coated Porous Graphite product quality has won high praise from European and American customers. Welcome to your further consultation.
  • Tantalum Carbide TaC Coated Halfmoon

    Tantalum Carbide TaC Coated Halfmoon

    Halfmoon parts coated with CVD TaC coating,is more durable than SiC coated halfmoon parts.VeTek Semiconductor is the leading manufacturer and supplier in China for Tantalum Carbide TaC Coated Halfmoon, we specialized in R&D and production,can control the quality well and offer a competitive price. You are welcome to visit our factory for further discussion on a long-term cooperation.
  • SiC Coated Pancake Susceptor for LPE PE3061S 6'' Wafers

    SiC Coated Pancake Susceptor for LPE PE3061S 6'' Wafers

    SiC Coated Pancake Susceptor for LPE PE3061S 6'' wafers is one of the core components used in 6'' wafers epitaxial wafer processing. VeTek Semiconductor is currently a leading manufacturer and supplier of SiC Coated Pancake Susceptor for LPE PE3061S 6'' wafers in China. The SiC Coated Pancake Susceptor it provides has excellent characteristics such as high corrosion resistance, good thermal conductivity, and good uniformity. Looking forward to your inquiry.

  • TaC Coating: The Gatekeeper of Yield for 8-inch Silicon Carbide PVT Epitaxy

    8-inch SiC is now in volume production, but wafer yield — not capacity — separates the winners. This guide explains why TaC coating on graphite hot-zone parts decides yield, and how to qualify a supplier.

  • Three SiC single crystal growth technologies

    The main methods for growing SiC single crystals are: physical vapor transport (PVT), high temperature chemical vapor deposition (HTCVD) and high temperature solution growth (HTSG).

  • How Porous Graphite Enhances Silicon Carbide Crystal Growth?

    This blog takes "How Porous Graphite Enhances Silicon Carbide Crystal Growth?" as its theme, and discusses in detail Porous Graphite Key Takeaways, The Role of Silicon Carbide in Semiconductor Technology, Unique Properties of Porous Graphite, How Porous Graphite Optimizes the PVT Process, Innovations in Porous Graphite Materials and other angles.

  • What is the Core Material for SiC Growth ?

    In the preparation of high-quality and high-yield silicon carbide substrates, the core requires precise control of production temperature by good thermal field materials. Currently, the thermal field crucible kits mainly used are high-purity graphite structural components, whose functions are to heat molten carbon powder and silicon powder as well as to maintain heat.

  • ‌VETEK will participate in the 2025 SEMICON Europa exhibition in Munich Germany

    ‌The SEMICON Europa semiconductor exhibition in Munich, Germany, will be held in November in Europe. Hosted by SEMI (Semiconductor Equipment and Materials International), it has become one of the most influential global semiconductor industry equipment exhibitions and is one of the largest and most significant events in Europe

  • Why Is Hyperpure Graphite Rigid Felt Essential for High-Temperature Semiconductor Manufacturing

    As semiconductor manufacturing moves toward increasingly advanced process nodes, material purity and thermal stability have become more critical than ever. Hyperpure graphite rigid felt has emerged as one of the most reliable insulation materials for crystal growth furnaces, epitaxial reactors, silicon carbide production systems, and other high-temperature applications.

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