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China SiC coated Vacumm-chuck Manufacturer, Supplier, Factory

The key to our success is "Good Products Good quality, Reasonable Price and Efficient Service" for SiC coated Vacumm-chuck, GaN wafer etching process, Gallium nitride (GaN), Plasma etching (ICP/RIE) process, Etching process, Our Enterprise Core Principle: The prestige initial ;The standard guarantee ;The customer are supreme.
SiC coated Vacumm-chuck, Upon today, now we have customers from all over the world, including USA, Russia, Spain, Italy, Singapore, Malaysia, Thailand, Poland, Iran and Iraq. The mission of our company is to offer the highest quality solutions with best price. We are looking forward to doing business with you!

Hot Products

  • Quartz crucible

    Quartz crucible

    VeTek Semiconductor is a leading quartz crucible supplier and manufacturer in China. the quartz crucibles we produce are mainly used in the semiconductor and photovoltaic fields. They have the properties of cleanliness and high temperature resistance. And our quartz crucible for semiconductor support the production processes of silicon rod pulling, loading and unloading of polysilicon raw materials in the semiconductor silicon wafer production process, and are key consumables for silicon wafer production. VeTek Semiconductor looks forward to becoming your long-term partner in China.
  • Tantalum Carbide Coating Support

    Tantalum Carbide Coating Support

    As a professional Tantalum Carbide Coating Support product manufacturer and factory in China, VeTek Semiconductor Tantalum Carbide Coating Support is usually used for surface coating of structural components or support components in semiconductor equipment, especially for surface protection of key equipment components in semiconductor manufacturing processes such as CVD and PVD. Welcome your further consultation.
  • TaC Coating Guide Rings

    TaC Coating Guide Rings

    As a leading manufacturer of TaC Coating Guide Rings products in China, VeTek Semiconductor TaC coated guide rings are important components in MOCVD equipment, ensuring accurate and stable gas delivery during epitaxial growth, and are an indispensable material in semiconductor epitaxial growth. Welcome to consult us.
  • SiC Coated Graphite Crucible Deflector

    SiC Coated Graphite Crucible Deflector

    The SiC coated graphite crucible deflector is a key component in the single crystal furnace equipment, its task is to guide the molten material from the crucible to the crystal growth zone smoothly, and ensure the quality and shape of the single crystal growth.Vetek semiconductor can provide both graphite and SiC coating material.Welcome to contact us for more details.
  • Large sized resistance heating SiC crystal growth furnace

    Large sized resistance heating SiC crystal growth furnace

    Silicon carbide crystal growth is a core process in the manufacturing of high-performance semiconductor devices. The stability, precision, and compatibility of crystal growth equipment directly determine the quality and yield of silicon carbide ingots. Based on the characteristics of Physical Vapor Transport (PVT) technology, Veteksemi has developed a resistance heating furnace for silicon carbide crystal growth, enabling stable growth of 6-inch, 8-inch, and 12-inch silicon carbide crystals with full compatibility with conductive, semi-insulating, and N-type material systems. Through precise control of temperature, pressure, and power, it effectively reduces crystal defects such as EPD (Etch Pit Density) and BPD (Basal Plane Dislocation), while featuring low energy consumption and a compact design to meet the high standards of industrial large-scale production.
  • Silicon Carbide SiC wafer boat

    Silicon Carbide SiC wafer boat

    Veteksemicon SiC wafer boats are widely used in critical high-temperature processes in semiconductor manufacturing, serving as reliable carriers for oxidation, diffusion, and annealing processes for silicon-based integrated circuits. They also excel in the third-generation semiconductor sector, perfectly suited for demanding processes such as epitaxial growth (EPI) and metal-organic chemical vapor deposition (MOCVD) for SiC and GaN power devices. They also support the high-temperature fabrication of high-efficiency solar cells in the photovoltaic industry. Looking forward to your further consultation.

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