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China MOCVD Epitaxy Manufacturer, Supplier, Factory

No matter new customer or old customer, We believe in long term and trusted relationship for MOCVD Epitaxy, Inlet Rings, MOCVD Inlet Seal Ring, Sapphire Substrate for LED, LED Epitaxy, Prospects first! Whatever you require, we should do our utmost to help you. We warmly welcome clients from all around the globe to cooperate with us for mutual enhancement.
MOCVD Epitaxy, Our company is working by the operation principle of "integrity-based, cooperation created, people oriented, win-win cooperation". We hope we can have a friendly relationship with businessman from all over the world.

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  • MOCVD Epitaxial Susceptor for 4

    MOCVD Epitaxial Susceptor for 4" Wafer

    MOCVD Epitaxial Susceptor for 4" Wafer is designed to grow 4" epitaxial layer.VeTek Semiconductor is a professional manufacturer and supplier, who is dedicated to providing high-quality MOCVD Epitaxial Susceptor for 4" Wafer. With tailored graphite material and SiC coating process. We are able to deliver expert and efficient solutions to our clients.You are welcome to communicate with us.
  • TaC Coated ring

    TaC Coated ring

    As a leading manufacturer and supplier of TaC Coated ring products in China, VeTek Semiconductor has been focusing on the R&D and production of various TaC coating products. As the main customers of TaC Coating products, European and American manufacturers have given high praise to our coating products. Welcome to your further consultation.
  • CVD SiC coated wafer susceptor

    CVD SiC coated wafer susceptor

    Veteksemicon’s CVD SiC coated wafer susceptor is a cutting-edge solution for semiconductor epitaxial processes, offering ultra-high purity (≤100ppb, ICP-E10 certified) and exceptional thermal/chemical stability for contamination-resistant growth of GaN, SiC, and silicon-based epi-layers. Engineered with precision CVD technology, it supports 6”/8”/12” wafers, ensures minimal thermal stress, and withstands extreme temperatures up to 1600°C.
  • Hot Zone graphite heater

    Hot Zone graphite heater

    Veteksemicon Hot Zone graphite heater is designed to handle the extreme conditions in high temperature furnaces and maintain excellent performance and stability in complex processes such as chemical vapor deposition (CVD), epitaxial growth and high temperature annealing. Veteksemicon always focuses on producing and providing high-quality Hot Zone graphite heaters. We sincerely invite you to contact us.
  • Solid SiC Gas Shower Head

    Solid SiC Gas Shower Head

    Solid SiC Gas Shower Head plays a major role in making the gas uniform in the CVD process, thereby ensuring uniform heating of the substrate. VeTek Semiconductor has been deeply involved in the field of solid SiC devices for many years and is able to provide customers with customized Solid SiC Gas Shower Heads. No matter what your requirements are, we look forward to your inquiry.
  • SiC Crystal Growth Porous Graphite

    SiC Crystal Growth Porous Graphite

    As a China leading SiC Crystal Growth Porous Graphite manufacturer , VeTek Semiconductor has been focusing on various Porous Graphite products for many years, such as Porous graphite crucible, High Purity Porous Graphite's investment and R&D, our Porous Graphite products have won high praise from European and American customers. Looking forward to your contact.

  • What’s the specific application of TaC coated parts in the semiconductor field?

    Tantalum carbide (TaC) coatings are widely used in the semiconductor field, mainly for epitaxial growth reactor components, single crystal growth key components, high-temperature industrial components, MOCVD system heaters and wafer carriers.Its excellent high temperature resistance and corrosion resistance can improve equipment durability, yield and crystal quality, reduce energy consumption and improve stability.

  • What are the differences between MBE and MOCVD technologies?

    This article mainly discusses the respective process advantages and differences of Molecular Beam Epitaxy process and Metal-organic chemical vapour deposition technologies.

  • What is the temperature gradient of the thermal field of a single crystal furnace?

    The article explains the temperature gradient in a single-crystal furnace. It covers the static and dynamic heat fields during crystal growth, the solid-liquid interface, and the temperature gradient's role in solidification.

  • How Porous Graphite Enhances Silicon Carbide Crystal Growth?

    This blog takes "How Porous Graphite Enhances Silicon Carbide Crystal Growth?" as its theme, and discusses in detail Porous Graphite Key Takeaways, The Role of Silicon Carbide in Semiconductor Technology, Unique Properties of Porous Graphite, How Porous Graphite Optimizes the PVT Process, Innovations in Porous Graphite Materials and other angles.

  • How to prepare CVD TaC coating? - Veteksemicon

    This article introduces the product characteristics of CVD TaC coating, the process of preparing CVD TaC coating using the CVD method, and the basic method for surface morphology detection of the prepared CVD TaC coating.

  • Based on 8-inch silicon carbide single crystal growth furnace technology

    Silicon carbide is one of the ideal materials for making high-temperature, high-frequency, high-power and high-voltage devices. In order to improve production efficiency and reduce costs, the preparation of large-size silicon carbide substrates is an important development direction.

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