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China MOCVD Epitaxy system Manufacturer, Supplier, Factory

abide by the contract, conforms on the market requirement, joins from the market competition by its good quality likewise as provides more comprehensive and superb support for customers to let them become large winner. The pursue of the company, is definitely the clients' pleasure for MOCVD Epitaxy system, Sapphire Substrate for LED, Aixtron Equipment, Veeco Equipment, MOCVD Reactor, We warmly welcome buddies from all walks of everyday living to hunt mutual cooperation and build a more brilliant and splendid tomorrow.
MOCVD Epitaxy system, We also provide OEM service that caters to your specific needs and requirements. With a strong team of experienced engineers in hose design and development, we value every opportunity to provide best products for our customers.

Hot Products

  • Tantalum Carbide Coated Porous Graphite

    Tantalum Carbide Coated Porous Graphite

    Tantalum Carbide Coated Porous Graphite is an indispensable product in the semiconductor processing process, especially in the SIC crystal growth process. After continuous R&D investment and technology upgrades, VeTek Semiconductor's TaC Coated Porous Graphite product quality has won high praise from European and American customers. Welcome to your further consultation.
  • SiC Crystal Growth Porous Graphite

    SiC Crystal Growth Porous Graphite

    As a China leading SiC Crystal Growth Porous Graphite manufacturer , VeTek Semiconductor has been focusing on various Porous Graphite products for many years, such as Porous graphite crucible, High Purity Porous Graphite's investment and R&D, our Porous Graphite products have won high praise from European and American customers. Looking forward to your contact.
  • Silicon Carbide Cantilever Paddle

    Silicon Carbide Cantilever Paddle

    VeTek Semiconductor's Silicon Carbide Cantilever Paddle is an important component in the semiconductor manufacturing process, especially suitable for diffusion furnaces or LPCVD furnaces in high-temperature processes such as diffusion and RTP. Our Silicon Carbide Cantilever Paddle is carefully designed and manufactured with excellent high-temperature resistance and mechanical strength, and can safely and reliably transport wafers to the process tube under harsh process conditions for various high-temperature processes such as diffusion and RTP. We look forward to becoming your long-term partner in China.Feel free to inquire us.
  • SiC Block

    SiC Block

    Veteksemicon’s SiC Block is designed for high-efficiency grinding and thinning of silicon and sapphire wafers. With excellent thermal conductivity (≥120 W/m·K), high thermal shock resistance, and superior wear resistance (Mohs ≥9), our blocks improve process stability and reduce tool change frequency. Available in sizes from 120mm to 480mm, with customized options and fast delivery to meet diverse production needs.
  • CVD SiC Coated Skirt

    CVD SiC Coated Skirt

    VeTek Semiconductor is a leading manufacturer and leader of CVD SiC Coated Skirt in China. Our main CVD SiC coating products include CVD SiC coated Skirt, CVD SiC Coating Ring. Looking forward to your contact.
  • EPI Susceptor Parts

    EPI Susceptor Parts

    In the core process of silicon carbide epitaxial growth, Veteksemicon understands that susceptor performance directly determines the quality and production efficiency of the epitaxial layer. Our high-purity EPI susceptors, designed specifically for the SiC field, utilize a special graphite substrate and a dense CVD SiC coating. With their superior thermal stability, excellent corrosion resistance, and extremely low particle generation rate, they ensure unparalleled thickness and doping uniformity for customers even in harsh high-temperature process environments. Choosing Veteksemicon means choosing the cornerstone of reliability and performance for your advanced semiconductor manufacturing processes.

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