China MOCVD Epitaxy system Manufacturer, Supplier, Factory

Designed to surround the wafer tracking zone, the Solid SiC Focus Ring ensures linear plasma distribution and exact edge-to-center etch profiles.These premium β-SiC components are built by Vetek Semiconductor (Wuyi Tianyao New Material Technology Co., LTD) using proprietary Chemical Vapor Deposition (CVD) technology. By vaporizing raw materials into a dense, binderless matrix, Vetek eliminates the porous micro-gaps common in older materials. Compared to standard quartz or silicon shielding, our CVD SiC components stand up far better to corrosive halogen gases, shielding the wafer in deep sub-7nm logic and dense memory chip manufacturing.Looking forward to your further inquiry.

CVD SiC coating Heating Element plays a core role in heating materials in PVD furnace (Evaporation Deposition). VeTek Semiconductor is a leading CVD SiC coated Heating Element manufacturer in China. We have advanced CVD coating capabilities and can provide you with customized CVD SiC coating products. VeTek Semiconductor looks forward to becoming your partner in SiC coated Heating Element.

VeTek Semiconductor is top manufacturer of CVD SiC coatings in China, offers SiC Coating Set Disc in Aixtron MOCVD Reactors. These SiC Coating Set Disc are crafted using high purity graphite and feature a CVD SiC coating with impurity below 5ppm. Your inquiry is welcomed.

High purity graphite ring is suitable for GaN epitaxial growth processes. Their excellent stability and superior performance have made them widely used. VeTek Semiconductor produces and manufactures world-leading High purity graphite ring to help the GaN epitaxy industry continue to progress. VeTekSemi looks forward to becoming your partner in China.

VeTek Semiconductor is a leading EPI Wafer Lift Pin manufacturer and innovator in China.We have been specialized in SiC coating on surface of graphite for many years. We offer a EPI Wafer Lift Pin for Epi process. With high quality and competitive price,we welcome you to visit our factory in China.

Veteksemicon SiC Coated Epitaxial Reactor chamber is a core component designed for demanding semiconductor epitaxial growth processes. Utilizing advanced chemical vapor deposition (CVD), this product forms a dense, high-purity SiC coating on a high-strength graphite substrate, resulting in superior high-temperature stability and corrosion resistance. It effectively resists the corrosive effects of reactant gases in high-temperature process environments, significantly suppresses particulate contamination, ensures consistent epitaxial material quality and high yield, and substantially extends the maintenance cycle and lifespan of the reaction chamber. It is a key choice for improving the manufacturing efficiency and reliability of wide-bandgap semiconductors such as SiC and GaN.