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China MOCVD reactor Manufacturer, Supplier, Factory

We follow our enterprise spirit of "Quality, Efficiency, Innovation and Integrity". We aim to create much more worth for our buyers with our abundant resources, highly developed machinery, experienced workers and great providers for MOCVD reactor, SiC epitaxy, Monocrystalline silicon epitaxy, Silicon-base GaN epitaxy, Deep UV epitaxy, Our enterprise warmly welcome close friends from everywhere in the environment to go to, examine and negotiate organization.
MOCVD reactor, We can meet the various needs of customers at home and abroad. We welcome new and old customers to come to consult & negotiate with us. Your satisfaction is our motivation! Let us work together to write a brilliant new chapter!

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  • TaC Coated Graphite Susceptor

    TaC Coated Graphite Susceptor

    VeTek Semiconductor’s TaC Coated Graphite Susceptor uses chemical vapor deposition(CVD) method to prepare tantalum carbide coating on the surface of graphite parts. This process is the most mature and has the best coating properties. TaC Coated Graphite Susceptor can extend the service life of graphite components, inhibit the migration of graphite impurities, and ensure the quality of epitaxy.We are looking forward to your inquiry.
  • Graphite Rotating Susceptor

    Graphite Rotating Susceptor

    High purity graphite rotating susceptor plays an important role in the epitaxial growth of gallium nitride (MOCVD process). VeTek Semiconductor is a leading graphite rotating susceptor manufacturer and supplier in China. We have developed many high-purity graphite products based on high-purity graphite materials, which fully meet the requirements of the semiconductor industry. VeTek Semiconductor looks forward to becoming your partner in Rotating Graphite susceptor.
  • TaC Coating Ring

    TaC Coating Ring

    TaC Coating Ring is a high-performance component designed for use in semiconductor processes, VeTek semiconductor TaC Coating Ring has high thermal stability, resistance to chemical corrosion, and excellent mechanical strength and is specifically used to hold and support SiC wafers during the etching process, where precise control and durability are essential for achieving high-quality wafers. we are looking forward to your further consultation.
  • TaC Coating Chuck

    TaC Coating Chuck

    VeTek Semiconductor's TaC Coating Chuck features a high-quality coating the surface, known for its outstanding high-temperature resistance and chemical inertness, particularly in silicon carbide (SiC) epitaxy(EPI) processes. With its exceptional features and superior performance, our TaC Coating Chuck offers several key advantages.We are committed to providing quality products at competitive prices and look forward to being your long-term partner in China.
  • Advanced Porous Graphite

    Advanced Porous Graphite

    As a professional and powerful manufacturer and supplier, Vetek Semiconductor has always been committed to providing High-purity Advanced Porous Graphite to the market. Relying on our own professional and excellent team, we are able to provide our customers with tailor-made products with competitive prices and efficient solutions.Vetek Semiconductor sincerely look forward to becoming your partner in China.
  • CVD SiC Coated Ceiling

    CVD SiC Coated Ceiling

    VeTek Semiconductor's CVD SiC coated ceiling has excellent properties such as high temperature resistance, corrosion resistance, high hardness, and low thermal expansion coefficient, making it an ideal material choice in semiconductor manufacturing. As a China leading CVD SiC coated ceiling manufacturer and supplier, VeTek semiconductor looks forward to your consultation.

  • What is CVD TAC Coating? - Veteksemi

    CVD TAC coating is a process for forming a dense and durable coating on a substrate (graphite). This method involves depositing TaC onto the substrate surface at high temperatures, resulting in a tantalum carbide (TaC) coating with excellent thermal stability and chemical resistance.

  • What is the Core Material for SiC Growth ?

    In the preparation of high-quality and high-yield silicon carbide substrates, the core requires precise control of production temperature by good thermal field materials. Currently, the thermal field crucible kits mainly used are high-purity graphite structural components, whose functions are to heat molten carbon powder and silicon powder as well as to maintain heat.

  • What is a PECVD graphite boat ?

    The core material of PECVD graphite boat is high-purity isotropic graphite material (purity is usually ≥99.999%), which has excellent electrical conductivity, thermal conductivity and density. Compared with ordinary graphite boats, PECVD graphite boats have many physical and chemical property advantages and are mainly used in the semiconductor and photovoltaic industries, especially in PECVD and CVD processes.

  • Silicon(Si) epitaxy preparation technology

    Single crystal materials alone cannot meet the needs of the growing production of various semiconductor devices. At the end of 1959, a thin layer of single crystal material growth technology - epitaxial growth was developed.

  • What Exactly is the Third Generation Semiconductor?

    When you see the third-generation semiconductors, you will surely wonder what the first and second generations were. The "generation" here is classified based on the materials used in semiconductor manufacturing.

  • What’s the difference between Silicon Carbide and Tantalum Carbide Coatings?

    This article analyzes the product characteristics and application scenarios of tantalum carbide coating and silicon carbide coating from multiple perspectives.

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