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China MOCVD reactor Manufacturer, Supplier, Factory

We follow our enterprise spirit of "Quality, Efficiency, Innovation and Integrity". We aim to create much more worth for our buyers with our abundant resources, highly developed machinery, experienced workers and great providers for MOCVD reactor, SiC epitaxy, Monocrystalline silicon epitaxy, Silicon-base GaN epitaxy, Deep UV epitaxy, Our enterprise warmly welcome close friends from everywhere in the environment to go to, examine and negotiate organization.
MOCVD reactor, We can meet the various needs of customers at home and abroad. We welcome new and old customers to come to consult & negotiate with us. Your satisfaction is our motivation! Let us work together to write a brilliant new chapter!

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    High-purity Quartz Bath

    In the critical steps of wafer cleaning, etching, and wet etching, high-purity quartz bath is more than just a container; it's the first line of defense for process success. Metal ion contamination, thermal shock cracking, chemical attack, and particle residue are hidden causes of yield fluctuations. Veteksemi is deeply rooted in semiconductor-grade quartz. Every quartz bath we manufacture is designed to provide uncompromising reliability and cleanliness for your cutting-edge processes.
  • Epi wafer holder

    Epi wafer holder

    VeTek Semiconductor is a professional Epi Wafer Holder manufacturer and factory in China. Epi Wafer Holder is a wafer holder for the epitaxy process in semiconductor processing. It is a key tool to stabilize the wafer and ensure uniform growth of the epitaxial layer. It is widely used in epitaxy equipment such as MOCVD and LPCVD. It is an irreplaceable device in the epitaxy process. Welcome your further consultation.
  • TaC Coating Guide Rings

    TaC Coating Guide Rings

    As a leading manufacturer of TaC Coating Guide Rings products in China, VeTek Semiconductor TaC coated guide rings are important components in MOCVD equipment, ensuring accurate and stable gas delivery during epitaxial growth, and are an indispensable material in semiconductor epitaxial growth. Welcome to consult us.
  • TaC Coated Graphite Guide Ring

    TaC Coated Graphite Guide Ring

    Our TaC-coated graphite guide rings are precision core components for semiconductor wafer manufacturing. They feature a high-purity graphite substrate coated with a wear-resistant and chemically inert tantalum carbide (TaC) coating. Designed for demanding processes such as epitaxial deposition and plasma etching, they ensure precise wafer alignment and stability, effectively control contamination, and significantly extend component life. Veteksemicon offers customization services to perfectly match your equipment and process requirements.
  • SiC Coating Collector Top

    SiC Coating Collector Top

    Welcome to VeTek Semiconductor, your trusted manufacturer of CVD SiC coatings. We take pride in offering Aixtron SiC Coating Collector Top, which are expertly engineered using high purity graphite and feature a state-of-the-art CVD SiC coating with impurity below 5ppm. Please don't hesitate to reach out to us with any questions or inquiries
  • TaC Coating Chuck

    TaC Coating Chuck

    VeTek Semiconductor's TaC Coating Chuck features a high-quality coating the surface, known for its outstanding high-temperature resistance and chemical inertness, particularly in silicon carbide (SiC) epitaxy(EPI) processes. With its exceptional features and superior performance, our TaC Coating Chuck offers several key advantages.We are committed to providing quality products at competitive prices and look forward to being your long-term partner in China.

  • What is Tantalum Carbide TaC Coating? - Veteksemicon

    This article introduces the product characteristics of TaC coating, the specific process of preparing TaC coating products using CVD technology, introduces Veteksemicon's most popular TaC coating, and briefly analyzes the reasons for choosing Veteksemicon.

  • Characteristics of silicon epitaxy

    High purity: The silicon epitaxial layer grown by chemical vapor deposition (CVD) has extremely high purity, better surface flatness and lower defect density than traditional wafers.

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  • ‌Optimization of Defects and Purity in SiC Crystals by TaC Coating

    The TaC coating almost completely eliminates the carbon encapsulation phenomenon by isolating the direct contact between the graphite crucible and the SiC melt, significantly reducing the defect density of microtubes

  • Based on 8-inch silicon carbide single crystal growth furnace technology

    Silicon carbide is one of the ideal materials for making high-temperature, high-frequency, high-power and high-voltage devices. In order to improve production efficiency and reduce costs, the preparation of large-size silicon carbide substrates is an important development direction.

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Aixtron MOCVD ReactorMOCVD ReactorMOCVD Reactor SusceptorsSiC-Coated MOCVD Reactor PartSusceptors for MOCVD Reactors

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