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China Aixtron MOCVD Reactor Manufacturer, Supplier, Factory

Our progress depends on the highly developed products ,great talents and repeatedly strengthened technology forces for Aixtron MOCVD Reactor, SiC Coated Plate Carriers for MOCVD, MOCVD Wafer Carriers for Semiconductor Industry, Silicon Carbide Graphite Substrate MOCVD Susceptor, Semiconductor Wafer Carrier for MOCVD Equipment, We warmly welcome pals from all walks of lifetime to hunt mutual cooperation and generate a far more outstanding and splendid tomorrow.
Aixtron MOCVD Reactor, We aim to build a famous brand which can influence a certain group of people and light up the whole world. We want our staff to realize self-reliance, then achieve financial freedom, lastly obtain time and spiritual freedom. We do not focus on how much fortune we can make, instead we aim to obtain high reputation and be recognized for our products and solutions. As a result, our happiness comes from our clients satisfaction rather than how much money we earn. Ours team will do best in your case always.

Hot Products

  • CVD SiC coating Epitaxy susceptor

    CVD SiC coating Epitaxy susceptor

    VeTek Semiconductor's CVD SiC Coating Epitaxy Susceptor is a precision-engineered tool designed for semiconductor wafer handling and processing. This SiC Coating Epitaxy Susceptor plays a vital role in promoting the growth of thin films, epilayers, and other coatings, and can precisely control temperature and material properties. Welcome your further inquiries.
  • Three-petal Graphite Crucible

    Three-petal Graphite Crucible

    VeTek Semiconductor's Three-petal Graphite Crucible is made of high purity graphite material processed by surface pyrolytic carbon coating, which is used to pull single crystal thermal field. Compared with traditional crucible, the structure of three-lobe design is more convenient to install and disassemble, improve work efficiency, and the impurities below 5ppm can meet the application of semiconductor and photovoltaic industry.
  • Porous SiC Ceramic Plate

    Porous SiC Ceramic Plate

    Our porous SiC ceramic plates are porous ceramic materials made of silicon carbide as the main component and processed by special processes. They are indispensable materials in semiconductor manufacturing, chemical vapor deposition (CVD) and other processes.
  • EDM graphite electrode

    EDM graphite electrode

    EDM graphite electrode has the characteristics of moderate density, smooth surface and low cost, and is suitable for chemical industry, metal smelting, etc. VeTek Semiconductor has strong production capacity and rich export experience in EDM graphite electrode products. You are welcome to inquire at any time.
  • TaC Coated Chuck

    TaC Coated Chuck

    With its high temperature resistance, chemical inertness and excellent performance, VeTek Semiconductor's TaC coated chucks are designed for semiconductor furnaces. We believe that our products can bring you advanced technology and quality product solutions.
  • Silicon Carbide (SiC) Cantilever Paddle

    Silicon Carbide (SiC) Cantilever Paddle

    The role of Silicon Carbide (SiC) Cantilever Paddle in the semiconductor industry is to support and transport wafers. In high-temperature processes such as diffusion and oxidation, SiC cantilever paddle can stably carry wafer boats and wafers without deformation or damage due to high temperature, ensuring the smooth progress of the process. Making diffusion, oxidation and other processes more uniform is crucial to improving the consistency and yield of wafer processing. VeTek Semiconductor uses advanced technology to build SiC cantilever paddle with high-purity silicon carbide to ensure that wafers will not be contaminated. VeTek Semiconductor looks forward to long-term cooperation with you on Silicon Carbide (SiC) Cantilever Paddle products.

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