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We've been convinced that with joint efforts, the enterprise between us will bring us mutual benefits. We are able to assure you product or service quality and aggressive cost for High-performance Semiconductors, Solid SiC, CVD Bulk SiC, Etching Process, Uniform Processing, We adhere towards the tenet of "Services of Standardization, to fulfill Customers' Demands".
High-performance Semiconductors, Our continual availability of high grade products in combination with our excellent pre-sale and after-sales service ensures strong competitiveness in an increasingly globalized market. welcome new and old customers from all walks of life to contact us for future business relationships and mutual success!

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  • Porous Graphite with TaC Coated

    Porous Graphite with TaC Coated

    Porous Graphite with TaC Coated is an advanced semiconductor processing material provided by VeTek Semiconductor. Porous Graphite with TaC Coated combines the advantages of porous graphite and tantalum carbide (TaC) coating, with good thermal conductivity and gas permeability. VeTek Semiconductor is committed to providing quality products at competitive prices.
  • Quartz crucible

    Quartz crucible

    VeTek Semiconductor is a leading quartz crucible supplier and manufacturer in China. the quartz crucibles we produce are mainly used in the semiconductor and photovoltaic fields. They have the properties of cleanliness and high temperature resistance. And our quartz crucible for semiconductor support the production processes of silicon rod pulling, loading and unloading of polysilicon raw materials in the semiconductor silicon wafer production process, and are key consumables for silicon wafer production. VeTek Semiconductor looks forward to becoming your long-term partner in China.
  • GaN Epitaxial Graphite Susceptor for G5

    GaN Epitaxial Graphite Susceptor for G5

    VeTek Semiconductor is a professional manufacturer and supplier, dedicated to providing high-quality GaN Epitaxial Graphite susceptor For G5. we have established long-term and stable partnerships with numerous well-known companies at home and abroad, earning the trust and respect of our customers.
  • SiC Wafer Boat

    SiC Wafer Boat

    The SiC wafer boat is used to carry the wafer,mainly for the oxidation and diffusion process, to ensure that the temperature can be evenly distributed on the wafer surface. The high temperature stability and high thermal conductivity of SiC materials ensure efficient and reliable semiconductor processing. Vetek semiconductor is committed to providing quality products at competitive prices.
  • CVD SiC coating rigid felt

    CVD SiC coating rigid felt

    As an important part of the SiC coating halfmoon graphite parts, CVD SiC coating rigid felt plays an important role in heat preservation during the SiC epitaxial growth process. VeTek Semiconductor is a mature CVD SiC coating rigid felt manufacturer and supplier, which can provide customers with suitable and excellent CVD SiC coating rigid felt products. VeTek Semiconductor looks forward to becoming your long-term partner in the epitaxial industry.
  • Silicon Carbide Ceramic Coating

    Silicon Carbide Ceramic Coating

    As a professional Silicon Carbide Ceramic Coating manufacturer and supplier in China, Vetek Semiconductor's Silicon Carbide Ceramic Coating is widely used on key components of semiconductor manufacturing equipment, especially when CVD and PECVD processes are involved. Welcome your inquiry.

  • What is High-purity porous graphite?

    What is High-purity porous graphite ? - Vetek , This blog mainly introduces the specific working principle of High-purity porous graphite for SiC single crystal growth by PVT method.

  • Why does SiC coated Graphite Susceptor fail? - VeTek Semiconductor

    During the SiC epitaxial growth process, SiC coated graphite suspension failure may occur. This paper conducts a rigorous analysis of the failure phenomenon of SiC coated graphite suspension, which mainly includes two factors: SiC epitaxial gas failure and SiC coating failure.

  • What is an EPI Epitaxial Furnace? - VeTek Semiconductor

    The working principle of the epitaxial furnace is to deposit semiconductor materials on a substrate under high temperature and high pressure. Silicon epitaxial growth is to grow a layer of crystal with the same crystal orientation as the substrate and different thickness on a silicon single crystal substrate with a certain crystal orientation. This article mainly introduces the silicon epitaxial growth methods: vapor phase epitaxy and liquid phase epitaxy.

  • What is the difference between silicon carbide (SiC) and gallium nitride (GaN) applications? - VeTek Semiconductor

    SiC and GaN are wide bandgap semiconductors with advantages over silicon, such as higher breakdown voltages, faster switching speeds, and superior efficiency. SiC is better for high-voltage, high-power applications due to its higher thermal conductivity, while GaN excels in high-frequency applications thanks to its superior electron mobility.

  • CVD Technology Innovation Behind the Nobel Prize

    This blog discusses the specific applications of artificial intelligence in the field of CVD from two aspects: The Significance and Challenges of Chemical Vapor Deposition (CVD) Technology in Physics and CVD Technology and Machine Learning.

  • What is the difference between epitaxy and ALD?

    The main difference between epitaxy and atomic layer deposition (ALD) lies in their film growth mechanisms and operating conditions. Epitaxy refers to the process of growing a crystalline thin film on a crystalline substrate with a specific orientation relationship, maintaining the same or similar crystal structure. In contrast, ALD is a deposition technique that involves exposing a substrate to different chemical precursors in sequence to form a thin film one atomic layer at a time.

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