Products

China Epi-Wafer Manufacturer, Supplier, Factory

Our corporation has been specializing in brand strategy. Customers' gratification is our greatest advertising. We also source OEM company for Epi-Wafer, SiC Coated Barrel, Silicon Epitaxy, CVD SiC Process, Barrel Type Susceptor, And there are quite a few international friends who came for sight seeing, or entrust us to buy other stuff for them. You might be most welcome to arrive to China, to our city also to our factory!
Epi-Wafer, With the effort to keep pace with world's trend, we'll always endeavor to meet customers' demands. If you want develop any other new items, we can customize them to suit your needs. If you feel interest in any of our products and solutions or want develop new merchandise, you should feel free to contact us. We are looking forward to forming successful business relationship with customers all over the world.

Hot Products

  • SiC coated epitaxial reactor chamber

    SiC coated epitaxial reactor chamber

    Veteksemicon SiC Coated Epitaxial Reactor chamber is a core component designed for demanding semiconductor epitaxial growth processes. Utilizing advanced chemical vapor deposition (CVD), this product forms a dense, high-purity SiC coating on a high-strength graphite substrate, resulting in superior high-temperature stability and corrosion resistance. It effectively resists the corrosive effects of reactant gases in high-temperature process environments, significantly suppresses particulate contamination, ensures consistent epitaxial material quality and high yield, and substantially extends the maintenance cycle and lifespan of the reaction chamber. It is a key choice for improving the manufacturing efficiency and reliability of wide-bandgap semiconductors such as SiC and GaN.
  • VEECO MOCVD Susceptor

    VEECO MOCVD Susceptor

    As a leading manufacturer and supplier of VEECO MOCVD Susceptor products in China, VeTek Semiconductor's MOCVD Susceptor represents the pinnacle of innovation and engineering excellence, specially customized to meet the complex requirements of contemporary semiconductor manufacturing processes. Welcome your further inquiries.
  • CVD TaC Coated Graphite Ring

    CVD TaC Coated Graphite Ring

    The CVD TaC Coated Graphite Ring by Veteksemicon is engineered to meet the extreme demands of semiconductor wafer processing. Utilizing Chemical Vapor Deposition (CVD) technology, a dense and uniform Tantalum Carbide (TaC) coating is applied to high-purity graphite substrates, achieving exceptional hardness, wear resistance, and chemical inertness. In semiconductor fabrication, the CVD TaC Coated Graphite Ring is widely used in MOCVD, etching, diffusion, and epitaxial growth chambers, serving as a key structural or sealing component for wafer carriers, susceptors, and shielding assemblies. Looking forward to your further consultation.
  • Tantalum Carbide Coated Planetary Rotation Disk

    Tantalum Carbide Coated Planetary Rotation Disk

    VeTek Semiconductor is a leading manufacturer and supplier of Tantalum Carbide Coated Planetary Rotation Disk in China, focusing on TaC coating technology for many years. Our products have high purity and excellent high temperature resistance, which are widely recognized by semiconductor manufacturers. VeTek Semiconductor Tantalum Carbide Coated Planetary Rotation Disk has become the backbone of the wafer epitaxy industry. We look forward to establishing a long-term partnership with you to jointly promote technological progress and production optimization.
  • High purity quartz diffusion Tube

    High purity quartz diffusion Tube

    In process of Semiconductor oxidation and difffusion, high purity quartz diffusion tube is widely used. As a leading manufacturer and supplier of High purity quartz Diffusion Tube in China, VeTek Semiconductor can provide you with high-quality products. Looking forward to your inquiry.
  • Porous Tantalum Carbide

    Porous Tantalum Carbide

    VeTek Semiconductor is a professional manufacturer and leader of Porous Tantalum Carbide products in China. Porous Tantalum Carbide is usually manufactured by chemical vapor deposition (CVD) method, ensuring precise control of its pore size and distribution, and is a material tool dedicated to high temperature extreme environments. Welcome your further consultation.

Send Inquiry

X
We use cookies to offer you a better browsing experience, analyze site traffic and personalize content. By using this site, you agree to our use of cookies. Privacy Policy
RejectAccept