Web Menu

Product Search

Language

Products

China CVD SiC Process Manufacturer, Supplier, Factory

In the past few years, our company absorbed and digested advanced technologies both at home and abroad. Meanwhile, our company staffs a team of experts devoted to the development of CVD SiC Process, SiC Coated Barrel, Silicon Epitaxy, Barrel Type Susceptor, Epi Wafer Susceptor, We, with great passion and faithfulness, are prepared to present you with best companies and striding forward along with you to create a dazzling upcoming.
CVD SiC Process, Since always, we adhering to the "open and fair, share to get, the pursuit of excellence, and creation of value"values, adhere to the"integrity and efficient, trade-oriented, best way , best valve" business philosophy. Together with our all over the world have branches and partners to develop new business areas, maximum common values. We sincerely welcome and together we share in global resources, opening up new career together with the chapter.

Related Products

Hot Products

  • Porous Tantalum Carbide (TaC) Coated Graphite Ring

    Porous Tantalum Carbide (TaC) Coated Graphite Ring

    The VETEK Porous TaC Coated Graphite Ring is a thermal field component engineered for SiC single crystal growth via the PVT (Physical Vapor Transport) process. It is produced from high-purity porous graphite and coated with tantalum carbide (TaC) using CVD technology. The design targets high-temperature stability, chemical resilience, and controlled thermal field performance. By minimizing contamination and supporting process consistency, this component contributes to reproducible SiC crystal growth outcomes.
  • Isostatic Graphite Crucible

    Isostatic Graphite Crucible

    As a leading supplier of customized graphite crucibles in China, VeTek Semiconductor mainly provides Isostatic Graphite Crucible, SiC Coated Graphite Crucible Deflector, Glassy Carbon Coated Graphite Crucible, etc. Our graphite crucibles are made of high-purity graphite raw materials and manufactured through precision technology, with excellent high temperature resistance, corrosion resistance and thermal conductivity. Welcome to consult us.
  • CVD SiC Pancake Susceptor

    CVD SiC Pancake Susceptor

    As a leading manufacturer and innovator of CVD SiC Pancake Susceptor products in China. VeTek Semiconductor CVD SiC Pancake Susceptor, as a disc-shaped component designed for semiconductor equipment, is a key element to support thin semiconductor wafers during high-temperature epitaxial deposition. VeTek Semiconductor is committed to providing high-quality SiC Pancake Susceptor products and becoming your long-term partner in China at competitive prices.
  • Porous Graphite

    Porous Graphite

    As a core consumable in the semiconductor manufacturing process, Porous Graphite plays an irreplaceable role in multiple links such as crystal growth, doping, and annealing. As a professional manufacturer of Porous Graphite, VeTek Semiconductor is committed to providing high-quality Porous Graphite products at competitive prices, welcome your further inquiry.
  • Silicon Carbide Focus ring

    Silicon Carbide Focus ring

    Veteksemicon focus ring is designed specifically for demanding semiconductor etching equipment, particularly SiC etching applications. Mounted around the electrostatic chuck (ESC), in close proximity to the wafer, its primary function is to optimize the electromagnetic field distribution within the reaction chamber, ensuring uniform and focused plasma action across the entire wafer surface. A high-performance focus ring significantly improves etch rate uniformity and reduces edge effects, directly boosting product yield and production efficiency.
  • Solid SiC Disc-shaped Shower Head

    Solid SiC Disc-shaped Shower Head

    VeTek Semiconductor is a leading semiconductor equipment manufacturer in China and a professional manufacturer and supplier of Solid SiC Disc-shaped Shower Head. Our Disc shape Shower Head is widely used in thin film deposition production such as CVD process to ensure uniform distribution of reaction gas and is one of the core components of CVD furnace.

  • What is Dishing and Erosion in the CMP Process?

    Chemical mechanical polishing (CMP) removes excess material and surface defects through the combined action of chemical reactions and mechanical abrasion. It is a key process for achieving global planarization of the wafer surface and is indispensable for multilayer copper interconnects and low-k dielectric structures. In practical manufacturing

  • What is TaC Coating ? - VeTek Semiconductor

    This article mainly introduces the product types, product characteristics and main functions of TaC Coating in semiconductor processing, and makes a comprehensive analysis and interpretation of TaC Coating products as a whole.

  • The Development History of 3C SiC

    Through continuous technological progress and in-depth mechanism research, 3C-SiC heteroepitaxial technology is expected to play a more important role in the semiconductor industry and promote the development of high-efficiency electronic devices.

  • What measurement equipment are there in the Fab factory? - VeTek semiconductor

    There are many types of measurement equipment in the Fab factory. Common equipment includes lithography process measurement equipment, etching process measurement equipment, thin film deposition process measurement equipment, doping process measurement equipment, CMP process measurement equipment, wafer particle detection equipment and other measurement equipment.

  • The Problems in the Etching Process

    Etching technology in semiconductor manufacturing often encounters problems such as loading effect, micro-groove effect and charging effect, which affect product quality. Improvement solutions include optimizing plasma density, adjusting reaction gas composition, improving vacuum system efficiency, designing reasonable lithography layout, and selecting appropriate etching mask materials and process conditions.

  • How to achieve high quality crystal growth? - SiC crystal growth furnace

    With the theme of "How to achieve high quality crystal growth? - SiC crystal growth furnace", this blog conducts a detailed analysis from four dimensions: the basic principle of silicon carbide crystal growth furnace, the structure of the silicon carbide crystal growth furnace, technical difficulties of silicon carbide crystal growth furnace, and raw materials for growing high-quality SiC crystals.

Send Inquiry

X
We use cookies to offer you a better browsing experience, analyze site traffic and personalize content. By using this site, you agree to our use of cookies. Privacy Policy
RejectAccept