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China CVD SiC Process Manufacturer, Supplier, Factory

In the past few years, our company absorbed and digested advanced technologies both at home and abroad. Meanwhile, our company staffs a team of experts devoted to the development of CVD SiC Process, SiC Coated Barrel, Silicon Epitaxy, Barrel Type Susceptor, Epi Wafer Susceptor, We, with great passion and faithfulness, are prepared to present you with best companies and striding forward along with you to create a dazzling upcoming.
CVD SiC Process, Since always, we adhering to the "open and fair, share to get, the pursuit of excellence, and creation of value"values, adhere to the"integrity and efficient, trade-oriented, best way , best valve" business philosophy. Together with our all over the world have branches and partners to develop new business areas, maximum common values. We sincerely welcome and together we share in global resources, opening up new career together with the chapter.

Hot Products

  • Semiconductor quartz screen

    Semiconductor quartz screen

    Veteksemicon Semiconductor Quartz Screen is a vital component in Metal-Organic Chemical Vapor Deposition (MOCVD) systems, playing a crucial role in optimizing thin film growth processes. This product detail page highlights Veteksemicon's high-purity quartz screens, designed to enhance the uniformity, purity, and maintenance efficiency of MOCVD equipment.
  • Tantalum Carbide Coating Ring

    Tantalum Carbide Coating Ring

    VeTek semiconductor Tantalum Carbide Coating Ring is a indispensable component in the semiconductor industry, specifically in the etching of SiC wafers. Its combination of a graphite base and TaC coating ensures superior performance in high-temperature and chemically aggressive environments. With its enhanced thermal stability, corrosion resistance, and mechanical strength, the Tantalum Carbide Coated Ring helps semiconductor manufacturers achieve precision, reliability, and high-quality results in their production processes.
  • Tantalum Carbide Coated Porous Graphite

    Tantalum Carbide Coated Porous Graphite

    Tantalum Carbide Coated Porous Graphite is an indispensable product in the semiconductor processing process, especially in the SIC crystal growth process. After continuous R&D investment and technology upgrades, VeTek Semiconductor's TaC Coated Porous Graphite product quality has won high praise from European and American customers. Welcome to your further consultation.
  • CVD TaC Coating Carrier

    CVD TaC Coating Carrier

    CVD TaC Coating carrier is mainly designed for the epitaxial process of semiconductor manufacturing. CVD TaC Coating carrier’s Ultra-high melting point, excellent corrosion resistance, and outstanding thermal stability determine the indispensability of this product in semiconductor epitaxial process. Welcome your further inquiry.
  • SiC Ceramics Membrane

    SiC Ceramics Membrane

    Veteksemicon SiC ceramics membranes are a type of inorganic membrane and belong to solid membrane materials in membrane separation technology. SiC membranes are fired at a temperature above 2000℃. The surface of the particles is smooth and round. There are no closed pores or channels in the support layer and each layer. They are usually composed of three layers with different pore sizes.
  • EDM graphite electrode

    EDM graphite electrode

    EDM graphite electrode has the characteristics of moderate density, smooth surface and low cost, and is suitable for chemical industry, metal smelting, etc. VeTek Semiconductor has strong production capacity and rich export experience in EDM graphite electrode products. You are welcome to inquire at any time.

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