China CVD SiC equipment Manufacturer, Supplier, Factory

VeTek Semiconductor's Silicon Carbide Cantilever Paddle is an important component in the semiconductor manufacturing process, especially suitable for diffusion furnaces or LPCVD furnaces in high-temperature processes such as diffusion and RTP. Our Silicon Carbide Cantilever Paddle is carefully designed and manufactured with excellent high-temperature resistance and mechanical strength, and can safely and reliably transport wafers to the process tube under harsh process conditions for various high-temperature processes such as diffusion and RTP. We look forward to becoming your long-term partner in China.Feel free to inquire us.

As a leading Chinese manufacturer and supplier of Silicon Carbide Coating products, Veteksemicon's SiC Coated Wafer Carrier for Etching plays an irreplaceable core role in the etching process with its excellent high temperature stability, outstanding corrosion resistance and high thermal conductivity.

VeTek Semiconductor is a leading manufacturer and leader of CVD SiC Coated Skirt in China. Our main CVD SiC coating products include CVD SiC coated Skirt, CVD SiC Coating Ring. Looking forward to your contact.

SiC wafer boat has high requirement in material purity.Vetek Semiconductor supply SiC purity ＞99.96% recrystallized SiC to this product.VeTek Semiconductor is a professional manufacturer and supplier in China for silicon carbide wafer boat for horizontal furnace, with years of experience in R&D and production, can control the quality well and offer a competitive price. You can rest assured to buy the silicon carbide wafer boat for horizontal furnace from us.

If you’ve ever dealt with uneven gas flow or particle contamination in a deposition chamber, the VETEK CVD SiC Coated Graphite Shower Head is designed to solve that. It starts with high‑purity isostatic graphite for thermal stability and easy machining, then gets a dense CVD Silicon Carbide (SiC) coating that seals the surface, resists corrosive gases (like HCl or NF₃), and prevents outgassing. The result is a gas distribution plate that delivers uniform flow across the wafer, handles high‑temperature epitaxy, and lasts far longer than bare graphite or quartz – making it a trusted component for CVD, PECVD, MOCVD, silicon epitaxy, and SiC epitaxy processes. We also offer custom hole patterns and sizes, because no two reactors are exactly the same.

In the critical steps of wafer cleaning, etching, and wet etching, high-purity quartz bath is more than just a container; it's the first line of defense for process success. Metal ion contamination, thermal shock cracking, chemical attack, and particle residue are hidden causes of yield fluctuations. Veteksemi is deeply rooted in semiconductor-grade quartz. Every quartz bath we manufacture is designed to provide uncompromising reliability and cleanliness for your cutting-edge processes.