Web Menu

Product Search

Language

Products

China sputtering targets Manufacturer, Supplier, Factory

To continually enhance the management technique by virtue of your rule of "sincerely, great faith and high-quality are the base of company development", we widely absorb the essence of similar merchandise internationally, and continuously build new merchandise to meet the demands of customers for sputtering targets, Pyrolytic Graphite Coated, Chemical Vapor Deposition, Semiconductor applications, ion beam grids, We sincerely welcome domestic and international retailers who calls, letters inquiring, or to vegetation to barter, we'll offer you you good quality merchandise along with the most enthusiastic services,We glance ahead towards your go to plus your cooperation.
sputtering targets, With excellent merchandise, high quality service and sincere attitude of service, we ensure customer satisfaction and help customers create value for mutual benefit and create a win-win situation. Welcome customers all over the world to contact us or visit our company. We are going to satisfy you with our expert service!

Related Products

Hot Products

  • Quartz Wafer Boat

    Quartz Wafer Boat

    Vetek Semiconductor Quartz Wafer Boat is designed to exceed industry standards and optimize your production process. Our quartz wafer boats are carefully designed and highly reliable to meet the stringent requirements of the semiconductor industry. We look forward to your consultation.
  • Silicon Cassette Boat

    Silicon Cassette Boat

    The Silicon Cassette Boat from Veteksemicon is a precision-engineered wafer carrier developed specifically for high-temperature semiconductor furnace applications, including oxidation, diffusion, drive-in, and annealing. Fabricated from ultra-high-purity silicon and finished to advanced contamination-control standards, it provides a thermally stable, chemically inert platform that closely matches the properties of silicon wafers themselves. This alignment minimizes thermal stress, reduces slip and defect formation, and ensures exceptionally uniform heat distribution throughout the batch
  • Quartz Gas Distribution Plate

    Quartz Gas Distribution Plate

    The Quartz Shower Head, also known as a Quartz Gas Distribution Plate, is a critical component used in semiconductor thin-film deposition processes such as CVD(Chemical Vapor Deposition), PECVD (Plasma-Enhanced CVD),and ALD (Atomic Layer Deposition). Made from high-purity fused quartz, this component ensures ultra-low contamination and excellent thermal stability, enabling precise gas delivery and uniform film growth across the wafer surface. Looking forward to your further consultation.
  • CVD SiC coating Heating Element

    CVD SiC coating Heating Element

    CVD SiC coating Heating Element plays a core role in heating materials in PVD furnace (Evaporation Deposition). VeTek Semiconductor is a leading CVD SiC coated Heating Element manufacturer in China. We have advanced CVD coating capabilities and can provide you with customized CVD SiC coating products. VeTek Semiconductor looks forward to becoming your partner in SiC coated Heating Element.
  • Silicon Carbide Seed Crystal Bonding Vacuum Hot-Press Furnace

    Silicon Carbide Seed Crystal Bonding Vacuum Hot-Press Furnace

    The SiC seed bonding technology is one of the key processes that affect crystal growth.VETEK has developed a specialized vacuum hot-press furnace for seed bonding based on the characteristics of this process. The furnace can effectively reduce various defects generated during the seed bonding process, thereby improving the yield and the final quality of the crystal ingot.
  • SiC Wafer Boat

    SiC Wafer Boat

    The SiC wafer boat is used to carry the wafer,mainly for the oxidation and diffusion process, to ensure that the temperature can be evenly distributed on the wafer surface. The high temperature stability and high thermal conductivity of SiC materials ensure efficient and reliable semiconductor processing. Vetek semiconductor is committed to providing quality products at competitive prices.

  • Roll up! Two major manufacturers are about to mass produce 8-inch silicon carbide

    As the 8-inch silicon carbide (SiC) process matures, manufacturers are accelerating the shift from 6-inch to 8-inch. Recently, ON Semiconductor and Resonac announced updates on 8-inch SiC production.

  • Application of TaC-Coated Graphite Parts in Single Crystal Furnaces

    In the growth of SiC and AlN single crystals using the physical vapor transport (PVT) method, crucial components such as the crucible, seed holder, and guide ring play a vital role. As depicted in Figure 2 [1], during the PVT process, the seed crystal is positioned in the lower temperature region, while the SiC raw material is exposed to higher temperatures (above 2400 ℃).

  • What is SiC Ceramic?

    SiC ceramic is a ceramic material produced by the reaction of silicon (Si) and carbon (C) elements, featuring extremely high hardness, heat resistance and chemical stability

  • How to solve the problem of sintering cracks in silicon carbide ceramics? - VeTek semiconductor

    This article mainly describes the broad application prospects of silicon carbide ceramics. It also focuses on the analysis of the causes of sintering cracks in silicon carbide ceramics and the corresponding solutions.

  • What is a PECVD graphite boat ?

    The core material of PECVD graphite boat is high-purity isotropic graphite material (purity is usually ≥99.999%), which has excellent electrical conductivity, thermal conductivity and density. Compared with ordinary graphite boats, PECVD graphite boats have many physical and chemical property advantages and are mainly used in the semiconductor and photovoltaic industries, especially in PECVD and CVD processes.

  • What is semiconductor epitaxy process?

    It is ideal to build integrated circuits or semiconductor devices on a perfect crystalline base layer. The epitaxy (epi) process in semiconductor manufacturing aims to deposit a fine single-crystalline layer, usually about 0.5 to 20 microns, on a single-crystalline substrate. The epitaxy process is an important step in the manufacture of semiconductor devices, especially in silicon wafer manufacturing.

Send Inquiry

X
We use cookies to offer you a better browsing experience, analyze site traffic and personalize content. By using this site, you agree to our use of cookies.Privacy Policy
RejectAccept