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That has a sound business credit history, outstanding after-sales service and modern producing facilities, we have earned an superb popularity amid our buyers across the planet for semiconductor process, TaC Coated Ring, TaC Coating Ring supplier, TaC Coating Ring, Tantalum Carbide Coated Ring, We invites both you and your company to prosper together with us and share a brilliant long run in worldwide market place.
semiconductor process, Our merchandise have enjoyed a great reputation for their good quality, competitive prices and prompt shipment in international market. Presently, we are sincerely looking forward to cooperating with more overseas customers based on mutual benefits.

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  • SiC Wafer Boat

    SiC Wafer Boat

    The SiC wafer boat is used to carry the wafer,mainly for the oxidation and diffusion process, to ensure that the temperature can be evenly distributed on the wafer surface. The high temperature stability and high thermal conductivity of SiC materials ensure efficient and reliable semiconductor processing. Vetek semiconductor is committed to providing quality products at competitive prices.
  • TaC Coating Heater

    TaC Coating Heater

    VeTek Semiconductor TaC Coating Heater has an extremely high melting point (about 3880°C). The high melting point enables it to operate at extremely high temperatures, especially in the growth of gallium nitride (GaN) epitaxial layers in the metal organic chemical vapor deposition (MOCVD) process. VeTek Semiconductor is committed to providing customers with customized product solutions. We look forward to hearing from you.
  • SiC Coated Pancake Susceptor for LPE PE3061S 6'' Wafers

    SiC Coated Pancake Susceptor for LPE PE3061S 6'' Wafers

    SiC Coated Pancake Susceptor for LPE PE3061S 6'' wafers is one of the core components used in 6'' wafers epitaxial wafer processing. VeTek Semiconductor is currently a leading manufacturer and supplier of SiC Coated Pancake Susceptor for LPE PE3061S 6'' wafers in China. The SiC Coated Pancake Susceptor it provides has excellent characteristics such as high corrosion resistance, good thermal conductivity, and good uniformity. Looking forward to your inquiry.
  • Isostatic Graphite Crucible

    Isostatic Graphite Crucible

    As a leading supplier of customized graphite crucibles in China, VeTek Semiconductor mainly provides Isostatic Graphite Crucible, SiC Coated Graphite Crucible Deflector, Glassy Carbon Coated Graphite Crucible, etc. Our graphite crucibles are made of high-purity graphite raw materials and manufactured through precision technology, with excellent high temperature resistance, corrosion resistance and thermal conductivity. Welcome to consult us.
  • LPE SiC EPI Halfmoon

    LPE SiC EPI Halfmoon

    LPE SiC Epi Halfmoon is a special design for horizonational epitaxy furnace, a revolutionary product designed to elevate LPE reactor SiC epitaxy processes. This cutting-edge solution boasts several key features that ensure superior performance and efficiency throughout your manufacturing operations.Vetek Semiconductor is professional at manufacturing LPE SiC Epi halfmoon in 6 inch,8inch.Looking forward to setting up long term cooperation with you.
  • High Purity SiC Cantilever Paddle

    High Purity SiC Cantilever Paddle

    VeTek Semiconductor is a leading manufacturer and supplier of High Purity SiC Cantilever Paddle product in China. High Purity SiC Cantilever Paddles are commonly used in semiconductor diffusion furnaces as wafer transfer or loading platforms.

  • What is an EPI Epitaxial Furnace? - VeTek Semiconductor

    The working principle of the epitaxial furnace is to deposit semiconductor materials on a substrate under high temperature and high pressure. Silicon epitaxial growth is to grow a layer of crystal with the same crystal orientation as the substrate and different thickness on a silicon single crystal substrate with a certain crystal orientation. This article mainly introduces the silicon epitaxial growth methods: vapor phase epitaxy and liquid phase epitaxy.

  • Silicon(Si) epitaxy preparation technology

    Single crystal materials alone cannot meet the needs of the growing production of various semiconductor devices. At the end of 1959, a thin layer of single crystal material growth technology - epitaxial growth was developed.

  • CVD Technology Innovation Behind the Nobel Prize

    This blog discusses the specific applications of artificial intelligence in the field of CVD from two aspects: The Significance and Challenges of Chemical Vapor Deposition (CVD) Technology in Physics and CVD Technology and Machine Learning.

  • What is the difference between CVD TaC and sintered TaC?

    This article first introduces the molecular structure and physical properties of TaC, and focuses on the differences and applications of sintered tantalum carbide and CVD tantalum carbide, as well as VeTek Semiconductor's popular TaC coating products.

  • What is SiC-coated graphite susceptor ?

    This blog takes "What is SiC-coated graphite susceptor?" as its theme, and discusses it from the perspectives of Epitaxial layer and its equipment, Importance of SiC coated graphite susceptor in CVD equipment, SiC Coating technology, Market competition and Vetek Semiconductor’s technological innovation.

  • Semiconductor process: Chemical Vapor Deposition (CVD)

    Chemical vapor deposition (CVD) in semiconductor manufacturing is used to deposit thin film materials in the chamber, including SiO2, SiN, etc., and commonly used types include PECVD and LPCVD. By adjusting the temperature, pressure and reaction gas type, CVD achieves high purity, uniformity and good film coverage to meet different process requirements.

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