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China Epitaxial deposition Manufacturer, Supplier, Factory

Often customer-oriented, and it's our ultimate target to become not only probably the most reputable, trustable and honest provider, but also the partner for our customers for Epitaxial deposition, TaC coated graphite guide ring, Wafer processing, Plasma etching, CVD TaC coating, If possible, make sure you send your necessities with a detailed list including the style/item and quantity you require. We'll then mail our greatest selling prices to you.
Epitaxial deposition, Our products and solutions are exported worldwide. Our customers are always satisfied with our reliable quality, customer-oriented services and competitive prices. Our mission is "to continue to earn your loyalty by dedicating our efforts to the constant improvement of our solutions and services in order to ensure the satisfaction of our end-users, customers, employees, suppliers and the worldwide communities in which we cooperate".

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  • Quartz crucible

    Quartz crucible

    VeTek Semiconductor is a leading quartz crucible supplier and manufacturer in China. the quartz crucibles we produce are mainly used in the semiconductor and photovoltaic fields. They have the properties of cleanliness and high temperature resistance. And our quartz crucible for semiconductor support the production processes of silicon rod pulling, loading and unloading of polysilicon raw materials in the semiconductor silicon wafer production process, and are key consumables for silicon wafer production. VeTek Semiconductor looks forward to becoming your long-term partner in China.
  • SiC Edge Ring

    SiC Edge Ring

    Veteksemicon High-purity SiC edge rings, specially designed for semiconductor etching equipment, feature outstanding corrosion resistance and thermal stability, significantly enhancing wafer yield
  • Ion Beam Sputter sources grid

    Ion Beam Sputter sources grid

    Ion beam is mainly used for ion etching, ion coating and plasma injection. The role of the Ion Beam Sputter sources grid is to dissect the ions and accelerate them to the required energy. Vetek Semiconductor provides high purity graphite ion beam Ion Beam Sputter sources grid for optical lens ion beam polishing, semiconductor wafer modification, etc. Welcome to inquire about customized products.
  • Solid SiC Gas Shower Head

    Solid SiC Gas Shower Head

    Solid SiC Gas Shower Head plays a major role in making the gas uniform in the CVD process, thereby ensuring uniform heating of the substrate. VeTek Semiconductor has been deeply involved in the field of solid SiC devices for many years and is able to provide customers with customized Solid SiC Gas Shower Heads. No matter what your requirements are, we look forward to your inquiry.
  • High purity graphite ring

    High purity graphite ring

    High purity graphite ring is suitable for GaN epitaxial growth processes. Their excellent stability and superior performance have made them widely used. VeTek Semiconductor produces and manufactures world-leading High purity graphite ring to help the GaN epitaxy industry continue to progress. VeTekSemi looks forward to becoming your partner in China.
  • LPE SiC EPI Halfmoon

    LPE SiC EPI Halfmoon

    LPE SiC Epi Halfmoon is a special design for horizonational epitaxy furnace, a revolutionary product designed to elevate LPE reactor SiC epitaxy processes. This cutting-edge solution boasts several key features that ensure superior performance and efficiency throughout your manufacturing operations.Vetek Semiconductor is professional at manufacturing LPE SiC Epi halfmoon in 6 inch,8inch.Looking forward to setting up long term cooperation with you.

  • Semiconductor process: Chemical Vapor Deposition (CVD)

    Chemical vapor deposition (CVD) in semiconductor manufacturing is used to deposit thin film materials in the chamber, including SiO2, SiN, etc., and commonly used types include PECVD and LPCVD. By adjusting the temperature, pressure and reaction gas type, CVD achieves high purity, uniformity and good film coverage to meet different process requirements.

  • Application of carbon-based thermal field materials in silicon carbide crystal growth

    Silicon carbide (SiC)'s Key growth methods include PVT, TSSG, and HTCVD, each with distinct advantages and challenges. Carbon-based thermal field materials like insulation systems, crucibles, TaC coatings, and porous graphite enhance crystal growth by providing stability, thermal conductivity, and purity, essential for SiC's precise fabrication and application.

  • What is the difference between CVD TaC and sintered TaC?

    This article first introduces the molecular structure and physical properties of TaC, and focuses on the differences and applications of sintered tantalum carbide and CVD tantalum carbide, as well as VeTek Semiconductor's popular TaC coating products.

  • Intelligent Cutting Technology for Cubic Silicon Carbide Wafers

    Smart cut is an advanced semiconductor manufacturing process based on ion implantation and wafer stripping, specifically designed for the production of ultra-thin and highly uniform 3C-SiC (cubic silicon carbide) wafers. It can transfer ultra-thin crystal materials from one substrate to another, thereby breaking the original physical limitations and changing the entire substrate industry.

  • what is glassy carbon？ - Veteksemicon

    Glassy carbon is a non-graphitized carbon that combines the properties of glass and ceramics. It has many properties such as high temperature resistance, corrosion resistance, good electrical conductivity, etc. This blog analyzes the research history and future development trend of glassy carbon, which is worth reading.

  • Veteksemicon shines at the 2025 Shanghai SEMICON International Exhibition

    Veteksemicon shines at 2025 Shanghai SEMICON International Exhibition, leading the future of semiconductor industry with innovative technologies

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