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China End Effector Manufacturer, Supplier, Factory

We are also specializing in improving the things management and QC method in order that we could retain terrific edge inside the fiercely-competitive small business for End Effector, LED Epitaxial Susceptor, CVD SiC coating, GaN on SiC Epitaxy, CVD TaC coating, We are now looking forward to even greater cooperation with overseas customers based on mutual benefits. If you are interested in any of our products, please feel free to contact us for more details.
End Effector, Our advanced equipment, excellent quality management, research and development ability make our price down. The price we offering may not be the lowest, but we guarantee it is absolutely competitive! Welcome to contact us immediately for future business relationship and mutual success!

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  • Tantalum Carbide Ring

    Tantalum Carbide Ring

    As an advanced manufacturer and producer of Tantalum Carbide Ring products in China, VeTek Semiconductor Tantalum Carbide Ring has extremely high hardness, wear resistance, high temperature resistance and chemical stability, and is widely used in the semiconductor manufacturing field. Especially in CVD, PVD, ion implantation process, etching process, and wafer processing and transportation, it is an indispensable product for semiconductor processing and manufacturing. Looking forward to your further consultation.
  • Tantalum Carbide Coated Tube for Crystal Growth

    Tantalum Carbide Coated Tube for Crystal Growth

    Tantalum Carbide Coated Tube for Crystal Growth is mainly used in SiC crystal growth process. VeTek Semiconductor has been supplying Tantalum Carbide Coated Tube for Crystal Growth for many years and has been working in the field of TaC coating for many years. Our products have a high purity and high temperature resistance. We look forward to becoming your long-term partner in China. Feel free to inquire us.
  • MOCVD LED Epi Susceptor

    MOCVD LED Epi Susceptor

    VeTek Semiconductor is a professional manufacturer of MOCVD LED Epi Susceptor in China. our MOCVD LED Epi Susceptor is designed for demanding epitaxial equipment applications. Its high thermal conductivity, chemical stability and durability are key factors to ensure a stable epitaxial growth process and semiconductor film production.
  • Glassy Carbon Crucible

    Glassy Carbon Crucible

    As a leading Chinese manufacturer of Glassy Carbon products, Veteksemicon's Glassy Carbon Crucibles are widely used in the semiconductor manufacturing field due to their excellent ultra-high purity, zero porosity, anti-permeation and excellent chemical corrosion resistance, and have won high praise from European and American customers. Welcome to your inquiry.
  • Silicon Carbide Coating Wafer Holder

    Silicon Carbide Coating Wafer Holder

    The Silicon Carbide Coating Wafer Holder by Veteksemicon is engineered for precision and performance in advanced semiconductor processes such as MOCVD, LPCVD, and high-temperature annealing. With a uniform CVD SiC coating, this wafer holder ensures exceptional thermal conductivity, chemical inertness, and mechanical strength — essential for contamination-free, high-yield wafer processing.
  • Graphite Heating Unit

    Graphite Heating Unit

    VeTek Semiconductor Graphite Heating Unit is a high-performance industrial heating solution made of high-purity graphite material, which can provide precise and efficient heating effect. Graphite Heating Unit is widely used in semiconductor, electronics, ceramics and other fields. Welcome your further inquiry.

  • Welcome customers to visit Veteksemicon's SiC Coating/ TaC Coating and Epitaxy Process Factory

    On September 5, VeTek Semiconductor's customers visited the SiC Coating and TaC Coating factories and reached further agreements on the latest Epitaxial Process solutions.

  • The Problems in the Etching Process

    Etching technology in semiconductor manufacturing often encounters problems such as loading effect, micro-groove effect and charging effect, which affect product quality. Improvement solutions include optimizing plasma density, adjusting reaction gas composition, improving vacuum system efficiency, designing reasonable lithography layout, and selecting appropriate etching mask materials and process conditions.

  • What is tantalum carbide(TaC)？

    Tantalum Carbide (TaC) is a high-performance ceramic material known for its extremely high hardness, high melting point and excellent chemical stability. It is widely used in semiconductor, aerospace and other industries requiring extreme heat, wear and corrosion resistance. This article will analyze in detail the structure, physical properties, and specific uses of the finished product in semiconductor manufacturing.

  • What is the difference between silicon carbide (SiC) and gallium nitride (GaN) applications? - VeTek Semiconductor

    SiC and GaN are wide bandgap semiconductors with advantages over silicon, such as higher breakdown voltages, faster switching speeds, and superior efficiency. SiC is better for high-voltage, high-power applications due to its higher thermal conductivity, while GaN excels in high-frequency applications thanks to its superior electron mobility.

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    This article mainly discusses the respective process advantages and differences of Molecular Beam Epitaxy process and Metal-organic chemical vapour deposition technologies.

  • Uses of solid silicon carbide

    Solid silicon carbide (SiC) has become one of the key materials in semiconductor manufacturing due to its unique physical properties. The following is an analysis of its advantages and practical value based on its physical properties and its specific applications in semiconductor equipment (such as wafer carriers, shower heads, etching focus rings, etc.).

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