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Sticking for the belief of "Creating items of top of the range and creating buddies with people today from all over the world", we normally put the interest of shoppers in the first place for TaC Coating carrier, CVD TaC Coating carrier, CVD TaC Coating, TaC Coating, EPI susceptor, Welcome worldwide prospects to get in touch with us for company and long-term cooperation. We'll be your reliable partner and supplier.
TaC Coating carrier, Our continual availability of high grade products in combination with our excellent pre-sale and after-sales service ensures strong competitiveness in an increasingly globalized market. welcome new and old customers from all walks of life to contact us for future business relationships and mutual success!

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    VeTek Semiconductor's Silicon Carbide Cantilever Paddle is an important component in the semiconductor manufacturing process, especially suitable for diffusion furnaces or LPCVD furnaces in high-temperature processes such as diffusion and RTP. Our Silicon Carbide Cantilever Paddle is carefully designed and manufactured with excellent high-temperature resistance and mechanical strength, and can safely and reliably transport wafers to the process tube under harsh process conditions for various high-temperature processes such as diffusion and RTP. We look forward to becoming your long-term partner in China.Feel free to inquire us.
  • Tantalum Carbide TaC Coated Halfmoon

    Tantalum Carbide TaC Coated Halfmoon

    Halfmoon parts coated with CVD TaC coating,is more durable than SiC coated halfmoon parts.VeTek Semiconductor is the leading manufacturer and supplier in China for Tantalum Carbide TaC Coated Halfmoon, we specialized in R&D and production,can control the quality well and offer a competitive price. You are welcome to visit our factory for further discussion on a long-term cooperation.
  • SiC Crystal Growth New Technology

    SiC Crystal Growth New Technology

    Vetek Semiconductor's ultra-high purity silicon carbide (SiC) formed by chemical vapor deposition (CVD) is recommanded to be used as a source material for growing silicon carbide crystals by physical vapor transport (PVT). In SiC Crystal Growth New Technology, the source material is loaded into a crucible and sublimated onto a seed crystal. Use the high purity CVD-SiC blocks to be as a source for growing SiC crystals. Welcome to establish a partnership with us.
  • SiC Coating graphite MOCVD heater

    SiC Coating graphite MOCVD heater

    VeTeK Semiconductor produces SiC Coating graphite MOCVD heater, which is a key component of the MOCVD process. Based on a high-purity graphite substrate, the surface is coated with a high-purity SiC coating to provide excellent high-temperature stability and corrosion resistance. With high quality and highly customized product services, VeTeK Semiconductor's SiC Coating graphite MOCVD heater is an ideal choice to ensure MOCVD process stability and thin film deposition quality. VeTeK Semiconductor looks forward to becoming your partner.
  • Wafer Handling Robotic Arm

    Wafer Handling Robotic Arm

    Vetek Semiconductor thermal spraying technology plays a vital role in the application of wafer handling robotic arms, especially in semiconductor manufacturing environments that require high precision and high cleanliness. This technology significantly improves the durability, reliability and work efficiency of the equipment by coating special materials on the surface of the wafer handling robotic arm. Welcome to inquiry us.
  • TaC Coating Crucible

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    As a professional TaC Coating Crucible Supplier and Manufacturer in China, VeTek Semiconductor's TaC Coating Crucible plays an irreplaceable role in the Single crystal growth process of semiconductors with its excellent thermal conductivity, outstanding chemical stability and enhanced corrosion resistance. Welcome your further inquiries.

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    Graphite materials have a wide range of application scenarios. Among them, Isotropic Graphite and Siliconized Graphite are the two main different types of graphite materials, and their characteristics, application scenarios and advantages are significantly different. This blog will conduct a comparative analysis from three aspects: structural characteristics, application scenarios and product advantages.

  • Porous Tantalum Carbide: A new generation of materials for SiC crystal growth

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