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Customized Graphite Heater For Hot Zone
  • Customized Graphite Heater For Hot ZoneCustomized Graphite Heater For Hot Zone

Customized Graphite Heater For Hot Zone

In semiconductor manufacturing and advanced material processing, the stability and purity of the thermal field directly dictate the core competitiveness of the final product. VETEK is dedicated to the R&D and manufacturing of high-performance graphite heating systems, providing reliable solutions for MOCVD, SiC epitaxy, and various high-temperature vacuum furnaces.

Why Choose VETEK?


  ● Extreme Thermal Uniformity: VETEK heaters undergo precise structural simulation and design to ensure outstanding temperature consistency even in extreme environments up to 2200°C, effectively boosting wafer yield.

  ● High-Purity Material Assurance: We strictly select isostatic high-purity graphite, maintaining ash content at ultra-low levels to eliminate metal ion contamination at high temperatures from the source.

  ● Advanced Coating Technology: Leveraging VETEK’s core strengths, we offer optional SiC (Silicon Carbide) coatings. This significantly enhances oxidation and corrosion resistance, ensuring a longer service life in harsh chemical gas environments.

  ● Precision Customization: Whether it is cylindrical, spiral, or complex disc structures, VETEK provides high-precision machining based on your technical drawings to ensure a perfect fit with your equipment.

  ● Comprehensive Logistics Protection: Recognizing the fragile nature of graphite, VETEK has upgraded its packaging system. Our multi-layer anti-shock reinforcement ensures "zero damage" during international transit, eliminating concerns over production delays.


Core Application Fields

  ● Semiconductor Epitaxy: Core thermal field components for MOCVD equipment (compatible with mainstream models like the K465i).

  ● SiC Crystal Growth: Precision thermal field control for the growth of Silicon Carbide and other wide-bandgap semiconductor materials.

  ● High-Temperature Vacuum Equipment: Widely used in vacuum sintering furnaces, precision brazing, and high-end heat treatment equipment.

  ● Substrates for Advanced Coatings: Ideal base material for CVD SiC, SiN, or SiO coatings.


Technical Specifications

We also support customized materials with higher purity levels for specific operating conditions.


Technical Specification
Reference Value
Bulk Density
≥1.85 g/cm3
Ash Content
≤500 PPM
Shore Hardness
≥45
Specific Resistance
≤12 \muΩ⋅m
Flexural Strength
≥40 MPa
Compressive Strength
≥70 MPa
Max. Grain Size
≤43 \mum
Thermal Expansion Coefficient (CTE)
≤4.4×10−6/∘C
Technical Specification
Reference Value

Veteksemicon Products Shop

Veteksemicon Products Shop

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