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    SiC Coated Graphite Susceptor for MOCVD

    VeTek Semiconductor is a leading manufacturer and supplier of SiC Coated Graphite Susceptor for MOCVD in China, specializing in SiC coating applications and epitaxial semiconductor products for the semiconductor industry. Our MOCVD SiC coated graphite susceptors offer competitive quality and pricing, serving markets across Europe and America. We are committed to becoming your long-term, trusted partner in advancing semiconductor manufacturing.
  • SiC Coated Top Plate for LPE PE2061S

    SiC Coated Top Plate for LPE PE2061S

    VeTek Semiconductor has been deeply engaged in SiC coating products for many years and has become a leading manufacturer and supplier of SiC Coated Top Plate for LPE PE2061S in China. The SiC Coated Top Plate for LPE PE2061S we provide is designed for LPE silicon epitaxial reactors and is located on the top together with the barrel base. This SiC Coated Top Plate for LPE PE2061S has excellent characteristics such as high purity, excellent thermal stability and uniformity, which helps to grow high-quality epitaxial layers. No matter what product you need, we look forward to your inquiry.
  • TaC Coated Graphite Susceptor

    TaC Coated Graphite Susceptor

    VeTek Semiconductor’s TaC Coated Graphite Susceptor uses chemical vapor deposition(CVD) method to prepare tantalum carbide coating on the surface of graphite parts. This process is the most mature and has the best coating properties. TaC Coated Graphite Susceptor can extend the service life of graphite components, inhibit the migration of graphite impurities, and ensure the quality of epitaxy.We are looking forward to your inquiry.
  • SiC Coating Collector Bottom

    SiC Coating Collector Bottom

    With our expertise in CVD SiC coating manufacturing, VeTek Semiconductor proudly presents Aixtron SiC Coating Collector Bottom,center and top. These SiC Coating Collector Bottom is constructed using high purity graphite and are coated with CVD SiC, ensuring impurity below 5ppm. Feel free to reach out to us for further information and inquiries.
  • Ion Beam Sputter sources grid

    Ion Beam Sputter sources grid

    Ion beam is mainly used for ion etching, ion coating and plasma injection. The role of the Ion Beam Sputter sources grid is to dissect the ions and accelerate them to the required energy. Vetek Semiconductor provides high purity graphite ion beam Ion Beam Sputter sources grid for optical lens ion beam polishing, semiconductor wafer modification, etc. Welcome to inquire about customized products.
  • CVD SiC coating ring

    CVD SiC coating ring

    The CVD SiC coating ring is one of the important parts of the halfmoon parts. Together with other parts, it forms the SiC epitaxial growth reaction chamber. VeTek Semiconductor is a professional CVD SiC coating ring manufacturer and supplier. According to the customer's design requirements, we can provide the corresponding CVD SiC coating ring at the most competitive price. VeTek Semiconductor looks forward to becoming your long-term partner in China.

  • The top 3 quartz material suppliers in the world

    Quartz material is one of the essential materials for high-tech industries such as semiconductors and photovoltaics. This blog introduces the world's top three quartz material suppliers Sibelco, TQC and Momentive and their products.

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    In the semiconductor manufacturing industry, as device size continues to shrink, the deposition technology of thin film materials has posed unprecedented challenges. Atomic Layer Deposition (ALD), as a thin film deposition technology that can achieve precise control at the atomic level, has become an indispensable part of semiconductor manufacturing. This article aims to introduce the process flow and principles of ALD to help understand its important role in advanced chip manufacturing.

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    With the growing demand for SiC materials in power electronics, optoelectronics and other fields, the development of SiC single crystal growth technology will become a key area of ​​scientific and technological innovation. As the core of SiC single crystal growth equipment, thermal field design will continue to receive extensive attention and in-depth research.

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    Silicon carbide (SiC)'s Key growth methods include PVT, TSSG, and HTCVD, each with distinct advantages and challenges. Carbon-based thermal field materials like insulation systems, crucibles, TaC coatings, and porous graphite enhance crystal growth by providing stability, thermal conductivity, and purity, essential for SiC's precise fabrication and application.

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    As a leading manufacturer in the SiC industry, Sanan Optoelectronics' related dynamics have received widespread attention in the industry. Recently, Sanan Optoelectronics disclosed a series of latest developments, involving 8-inch transformation, new substrate factory production, establishment of new companies, government subsidies and other aspects.

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