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China SiC Coated ICP Etching plate Manufacturer, Supplier, Factory

To frequently enhance the administration program by virtue on the rule of "sincerely, very good faith and high-quality are the base of enterprise development", we widely absorb the essence of related products internationally, and consistently develop new products to fulfill the calls for of customers for SiC Coated ICP Etching plate, SiC ICP Etching Plate, ICP Etching, ICP/PSS Etching Process, PSS Etching Carrier Plate for Semiconductor, With our rules of " organization track record, partner trust and mutual benefit", welcome all of you to function together , improve jointly.
SiC Coated ICP Etching plate, During the development, our company has built a well-known brand. It is well highly acclaimed by our customers. OEM and ODM are accepted. We've been looking forward to customers from all over the world to join us to a wild cooperation.

Hot Products

  • SiC Coated Pancake Susceptor for LPE PE3061S 6'' Wafers

    SiC Coated Pancake Susceptor for LPE PE3061S 6'' Wafers

    SiC Coated Pancake Susceptor for LPE PE3061S 6'' wafers is one of the core components used in 6'' wafers epitaxial wafer processing. VeTek Semiconductor is currently a leading manufacturer and supplier of SiC Coated Pancake Susceptor for LPE PE3061S 6'' wafers in China. The SiC Coated Pancake Susceptor it provides has excellent characteristics such as high corrosion resistance, good thermal conductivity, and good uniformity. Looking forward to your inquiry.
  • TaC Coating Heater

    TaC Coating Heater

    VeTek Semiconductor TaC Coating Heater has an extremely high melting point (about 3880°C). The high melting point enables it to operate at extremely high temperatures, especially in the growth of gallium nitride (GaN) epitaxial layers in the metal organic chemical vapor deposition (MOCVD) process. VeTek Semiconductor is committed to providing customers with customized product solutions. We look forward to hearing from you.
  • Fine Grain High Purity Isotropic Graphite

    Fine Grain High Purity Isotropic Graphite

    Fine Grain High Purity Isotropic Graphite is a necessary material for high-end applications such as semiconductors and photovoltaics, and has broad market prospects. With technological advances, VeTek Semiconductor has the manufacturing and supply capabilities for large quantities of Fine Grain High Purity Isotropic Graphite. We welcome your inquiries at any time.
  • Tantalum Carbide Guide Ring

    Tantalum Carbide Guide Ring

    VeTek Semiconductor is a professional manufacturer and leader of Tantalum Carbide Guide Ring products in China. Our Tantalum Carbide (TaC) Guide Ring is a high-performance ring component made of tantalum carbide, which is commonly used in semiconductor processing equipment, especially in high-temperature and highly corrosive environments such as CVD, PVD, etching and diffusion. VeTek Semiconductor is committed to providing advanced technology and product solutions for the semiconductor industry, and welcomes your further inquiries.
  • 7N High-Purity CVD SiC raw material

    7N High-Purity CVD SiC raw material

    The quality of the initial source material is the primary factor limiting wafer yield in the production of SiC single crystals. VETEK's 7N High-Purity CVD SiC Bulk offers a high-density polycrystalline alternative to traditional powders, specifically engineered for Physical Vapor Transport (PVT). By utilizing a bulk CVD form, we eliminate common growth defects and significantly improve furnace throughput. Looking forward to your inquiry.
  • Silicon Carbide Carrier Plate For LED Etching

    Silicon Carbide Carrier Plate For LED Etching

    Veteksemicon Silicon Carbide Carrier Plate For LED Etching, specifically designed for LED chip manufacturing, is a core consumable in the etching process. Made from precision-sintered high-purity silicon carbide, it offers exceptional chemical resistance and high-temperature dimensional stability, effectively resisting corrosion from strong acids, bases, and plasma. Its low contamination properties ensure high yields for LED epitaxial wafers, while its durability, far exceeding that of traditional materials, helps customers reduce overall operating costs, making it a reliable choice for improving etching process efficiency and consistency.

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