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China Semiconductor furnace tube Manufacturer, Supplier, Factory

We persist with our business spirit of "Quality, Effectiveness, Innovation and Integrity". We aim to create a lot more value for our consumers with our wealthy resources, sophisticated machinery, experienced workers and outstanding providers for Semiconductor furnace tube, SiC Cantilever Paddle, Silicon Carbide Cantilever Paddle, High Purity SiC Cantilever Paddle, High Purity Silicon Carbide Cantilever Paddle, We also be sure that your selection might be crafted with the optimum quality and dependability. Please sense cost-free to make contact with us for further details.
Semiconductor furnace tube, Our domestic website's generated over 50, 000 purchasing orders every year and quite successful for internet shopping in Japan. We would be happy to have an opportunity to do business with your company. Looking forward to receiving your message !

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    VeTek Semiconductor's Silicon Carbide Cantilever Paddle is an important component in the semiconductor manufacturing process, especially suitable for diffusion furnaces or LPCVD furnaces in high-temperature processes such as diffusion and RTP. Our Silicon Carbide Cantilever Paddle is carefully designed and manufactured with excellent high-temperature resistance and mechanical strength, and can safely and reliably transport wafers to the process tube under harsh process conditions for various high-temperature processes such as diffusion and RTP. We look forward to becoming your long-term partner in China.Feel free to inquire us.
  • SiC coated Satellite cover for MOCVD

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    SiC coated satellite cover for MOCVD plays an irreplaceable role in ensuring high-quality epitaxial growth on wafers due to its extremely high temperature resistance, excellent corrosion resistance and outstanding oxidation resistance.
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  • SiN substrate

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  • How does TaC coating improve the service life of graphite components? - VeTek Semiconductor

    Tantalum carbide (TaC) coating can significantly extend the life of graphite parts by improving high temperature resistance, corrosion resistance, mechanical properties and thermal management capabilities. Its high purity characteristics reduce impurity contamination, improve crystal growth quality, and enhance energy efficiency. It is suitable for semiconductor manufacturing and crystal growth applications in high-temperature, highly corrosive environments.

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    CVD TAC coating is a process for forming a dense and durable coating on a substrate (graphite). This method involves depositing TaC onto the substrate surface at high temperatures, resulting in a tantalum carbide (TaC) coating with excellent thermal stability and chemical resistance.

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