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China semiconductor diffusion furnace Manufacturer, Supplier, Factory

Our company promises all users of the first-class products and the most satisfying post-sale service. We warmly welcome our regular and new customers to join us for semiconductor diffusion furnace, SiC Diffusion Furnace Tube, SiC Furnace Tube, sic tube furnace, diffusion furnace equipment, we could solve our customer problems asap and do the profit for our customer. For those who need excellent company and top quality , pls choose us , thanks !
semiconductor diffusion furnace, We set a strict quality control system. We have now return and exchange policy, and you can exchange within 7 days after receive the wigs if it is in new station and we service repairing free for our solutions. Please feel free to contact us for further information and we will offer you competitive price list then.

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  • Porous Ceramic Vacuum Chuck

    Porous Ceramic Vacuum Chuck

    Vetek Semiconductor's Porous Ceramic Vacuum Chuck is made of silicon carbide ceramic (SiC) material, which has excellent high temperature resistance, chemical stability and mechanical strength. It is an indispensable core component in the semiconductor process. Welcome your further inquiries.
  • Quartz crucible

    Quartz crucible

    VeTek Semiconductor is a leading quartz crucible supplier and manufacturer in China. the quartz crucibles we produce are mainly used in the semiconductor and photovoltaic fields. They have the properties of cleanliness and high temperature resistance. And our quartz crucible for semiconductor support the production processes of silicon rod pulling, loading and unloading of polysilicon raw materials in the semiconductor silicon wafer production process, and are key consumables for silicon wafer production. VeTek Semiconductor looks forward to becoming your long-term partner in China.
  • SiC Crystal Growth Porous Graphite

    SiC Crystal Growth Porous Graphite

    As a China leading SiC Crystal Growth Porous Graphite manufacturer , VeTek Semiconductor has been focusing on various Porous Graphite products for many years, such as Porous graphite crucible, High Purity Porous Graphite's investment and R&D, our Porous Graphite products have won high praise from European and American customers. Looking forward to your contact.
  • SiC coated Satellite cover for MOCVD

    SiC coated Satellite cover for MOCVD

    SiC coated satellite cover for MOCVD plays an irreplaceable role in ensuring high-quality epitaxial growth on wafers due to its extremely high temperature resistance, excellent corrosion resistance and outstanding oxidation resistance.
  • CVD SiC Pancake Susceptor

    CVD SiC Pancake Susceptor

    As a leading manufacturer and innovator of CVD SiC Pancake Susceptor products in China. VeTek Semiconductor CVD SiC Pancake Susceptor, as a disc-shaped component designed for semiconductor equipment, is a key element to support thin semiconductor wafers during high-temperature epitaxial deposition. VeTek Semiconductor is committed to providing high-quality SiC Pancake Susceptor products and becoming your long-term partner in China at competitive prices.
  • Wafer Carrier Tray

    Wafer Carrier Tray

    Vetek Semiconductor specializes in partnering with its customers to produce custom designs for Wafer Carrier Tray. Wafer Carrier tray can be designed for use in CVD silicon epitaxy, III-V epitaxy, and III-Nitride epitaxy, Silicon carbide epitaxy. Please contact Vetek semiconductor regarding your susceptor requirements.

  • Principles and Technology of Physical Vapor Deposition Coating (1/2) - VeTek Semiconductor

    Vacuum coating includes film material vaporization, vacuum transportation and thin film growth. According to the different film material vaporization methods and transportation processes, vacuum coating can be divided into two categories: PVD and CVD.

  • What’s the specific application of TaC coated parts in the semiconductor field?

    Tantalum carbide (TaC) coatings are widely used in the semiconductor field, mainly for epitaxial growth reactor components, single crystal growth key components, high-temperature industrial components, MOCVD system heaters and wafer carriers.Its excellent high temperature resistance and corrosion resistance can improve equipment durability, yield and crystal quality, reduce energy consumption and improve stability.

  • What is an Electrostatic Chuck (ESC)?

    The electrostatic chuck(ESC), also known as the electrostatic chuck (ESC, e-chuck), is a fixture that uses the principle of electrostatic adsorption to hold and fix the adsorbed material. It is suitable for vacuum and plasma environments.

  • Is Porous Graphite The Key To Faster Charging Batteries

    We’ve all felt that moment of panic. Your phone battery is at 5%, you have minutes to spare, and every second plugged in feels like an eternity. What if the secret to ending this anxiety lies not in a completely new chemistry, but in reimagining a fundamental material within the battery itself? For two decades at the forefront of tech, I’ve seen trends come and go. But the buzz around Porous Graphite feels different. It isn't just an incremental step; it represents a fundamental shift in how we approach energy storage design.

  • Different technical routes of SiC epitaxial growth furnace

    Silicon carbide substrates have many defects and cannot be processed directly. A specific single crystal thin film needs to be grown on them through an epitaxial process to make chip wafers. This thin film is the epitaxial layer. Almost all silicon carbide devices are realized on epitaxial materials. High-quality silicon carbide homogeneous epitaxial materials are the basis for the development of silicon carbide devices. The performance of epitaxial materials directly determines the realization of the performance of silicon carbide devices.

  • What is Silicon Carbide Ceramic?

    Silicon carbide ceramics, commonly known as SiC ceramics, are a versatile material with unique properties and a wide range of applications in various industries. The following is a detailed discussion of its material composition, physical properties, specific applications and advantages in semiconductor coating processes, and common problems encountered during processing.

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