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Aluminum Nitride (AlN) Wafers
  • Aluminum Nitride (AlN) WafersAluminum Nitride (AlN) Wafers

Aluminum Nitride (AlN) Wafers

VeTek Semiconductor supplies high-quality Aluminum Nitride (AlN) single-crystal wafers and substrates for next-generation ultra-wide-bandgap semiconductor devices. With an ultra-wide bandgap of approximately 6.2 eV, outstanding thermal conductivity, exceptional electrical insulation, and excellent lattice and thermal-expansion match with GaN, AlN wafers are ideal for high-power RF devices, high-voltage power electronics, and deep-ultraviolet (DUV) optoelectronics.


1. Key Features & Advantages

Ultra-wide bandgap ≈ 6.2 eV — highest among mainstream semiconductor materials

High thermal conductivity ≈ 320 W/m·K for efficient heat dissipation

Excellent electrical insulation (>10¹³ Ω·cm) and high breakdown field (12–15 MV/cm)

Good lattice and thermal-expansion match with GaN — ideal for GaN-on-AlN heterostructures

Low dislocation density options with tight HR-XRD rocking-curve control

Al-face CMP (Ra ≤ 0.5 nm) and N-face MP for epi-ready surfaces

Multiple sizes and quality grades (P / R / D) to match production and research requirements

2. Typical Applications

High-power RF devices for radar and 6G communications

High-voltage power electronics for grid, data centers, and electric vehicles

Deep-ultraviolet (UVC) LEDs and laser diodes

GaN-on-AlN epitaxial growth and advanced heterostructure devices

High-temperature, high-frequency, and harsh-environment semiconductor components

3. Available Sizes & Quality Grades

VeTek offers AlN wafers in the following standard formats. Custom sizes and specifications can be discussed upon request.

10 × 10 mm square substrates

1-inch (25.4 mm) wafers

2-inch (50.8 mm) wafers

Quality grades: P-grade (Product), R-grade (Research), D-grade (Experimental), differentiated mainly by HR-XRD rocking-curve FWHM and overall crystal quality.

4. Key Technical Specifications

Common parameters across sizes (typical values; grade-dependent where noted):

Parameter

P-Grade

R-Grade

D-Grade

Orientation

(0001) ± 0.5°

Thickness

450 μm ± 25 μm

HR-XRD FWHM (002)

≤ 100 arcsec

≤ 200 arcsec

≤ 300 arcsec

HR-XRD FWHM (102)

≤ 80 arcsec

≤ 150 arcsec

≤ 250 arcsec

Surface Polish

Al-face CMP, N-face MP

Surface Roughness Ra

Al ≤ 0.5 nm; N ≤ 1.2 μm

Scratches / Chipping (naked eye)

None

Edge Exclusion

1 mm

Packaging

Single-wafer box

Size-specific geometric tolerances:

• 10×10 mm: Side length 10 mm ± 0.5 mm; TTV ≤ 15 μm; Bow ≤ 15 μm

• 1-inch: Diameter 25.4 mm ± 0.5 mm; Usable area ≥ 90%; TTV ≤ 20 μm; Bow ≤ 20 μm; Primary flat (10-10) ± 5°, length 8 mm ± 1 mm

• 2-inch: Diameter 50.8 mm ± 0.5 mm; Usable area ≥ 90%; TTV ≤ 30 μm; Bow ≤ 30 μm; Primary flat length 16 mm ± 2 mm

5. Why Choose VeTek AlN Wafers?

As a specialized supplier of advanced semiconductor materials and components, VeTek Semiconductor provides:

High-quality AlN single-crystal wafers with controlled crystal quality and epi-ready surfaces

Multiple size and grade options to support both device production and research programs

Complementary wafer and substrate solutions under the VeTek semiconductor materials portfolio

Technical support for material selection and process matching

Our AlN wafers help customers accelerate development of high-power RF, high-voltage power, and deep-UV optoelectronic devices that demand the unique combination of ultra-wide bandgap, high thermal conductivity, and GaN compatibility offered by aluminum nitride.


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