VeTek Semiconductor supplies high-quality Aluminum Nitride (AlN) single-crystal wafers and substrates for next-generation ultra-wide-bandgap semiconductor devices. With an ultra-wide bandgap of approximately 6.2 eV, outstanding thermal conductivity, exceptional electrical insulation, and excellent lattice and thermal-expansion match with GaN, AlN wafers are ideal for high-power RF devices, high-voltage power electronics, and deep-ultraviolet (DUV) optoelectronics.
•Ultra-wide bandgap ≈ 6.2 eV — highest among mainstream semiconductor materials
•High thermal conductivity ≈ 320 W/m·K for efficient heat dissipation
•Excellent electrical insulation (>10¹³ Ω·cm) and high breakdown field (12–15 MV/cm)
•Good lattice and thermal-expansion match with GaN — ideal for GaN-on-AlN heterostructures
•Low dislocation density options with tight HR-XRD rocking-curve control
•Al-face CMP (Ra ≤ 0.5 nm) and N-face MP for epi-ready surfaces
•Multiple sizes and quality grades (P / R / D) to match production and research requirements
2. Typical Applications
•High-power RF devices for radar and 6G communications
•High-voltage power electronics for grid, data centers, and electric vehicles
•Deep-ultraviolet (UVC) LEDs and laser diodes
•GaN-on-AlN epitaxial growth and advanced heterostructure devices
•High-temperature, high-frequency, and harsh-environment semiconductor components
3. Available Sizes & Quality Grades
VeTek offers AlN wafers in the following standard formats. Custom sizes and specifications can be discussed upon request.
•10 × 10 mm square substrates
•1-inch (25.4 mm) wafers
•2-inch (50.8 mm) wafers
Quality grades: P-grade (Product), R-grade (Research), D-grade (Experimental), differentiated mainly by HR-XRD rocking-curve FWHM and overall crystal quality.
4. Key Technical Specifications
Common parameters across sizes (typical values; grade-dependent where noted):
Parameter
P-Grade
R-Grade
D-Grade
Orientation
(0001) ± 0.5°
Thickness
450 μm ± 25 μm
HR-XRD FWHM (002)
≤ 100 arcsec
≤ 200 arcsec
≤ 300 arcsec
HR-XRD FWHM (102)
≤ 80 arcsec
≤ 150 arcsec
≤ 250 arcsec
Surface Polish
Al-face CMP, N-face MP
Surface Roughness Ra
Al ≤ 0.5 nm; N ≤ 1.2 μm
Scratches / Chipping (naked eye)
None
Edge Exclusion
1 mm
Packaging
Single-wafer box
Size-specific geometric tolerances:
• 10×10 mm: Side length 10 mm ± 0.5 mm; TTV ≤ 15 μm; Bow ≤ 15 μm
• 1-inch: Diameter 25.4 mm ± 0.5 mm; Usable area ≥ 90%; TTV ≤ 20 μm; Bow ≤ 20 μm; Primary flat (10-10) ± 5°, length 8 mm ± 1 mm
• 2-inch: Diameter 50.8 mm ± 0.5 mm; Usable area ≥ 90%; TTV ≤ 30 μm; Bow ≤ 30 μm; Primary flat length 16 mm ± 2 mm
5. Why Choose VeTek AlN Wafers?
As a specialized supplier of advanced semiconductor materials and components, VeTek Semiconductor provides:
•High-quality AlN single-crystal wafers with controlled crystal quality and epi-ready surfaces
•Multiple size and grade options to support both device production and research programs
•Complementary wafer and substrate solutions under the VeTek semiconductor materials portfolio
•Technical support for material selection and process matching
Our AlN wafers help customers accelerate development of high-power RF, high-voltage power, and deep-UV optoelectronic devices that demand the unique combination of ultra-wide bandgap, high thermal conductivity, and GaN compatibility offered by aluminum nitride.
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