Web Menu

Product Search

Language

Products

China LPE reactor Manufacturer, Supplier, Factory

We know that we only thrive if we can guarantee our combined rate competiveness and good quality advantageous at the same time for LPE reactor, SiC Coated Graphite Barrel Susceptor, SiC Coated Barrel Susceptor, CVD SiC Coated Barrel Susceptor, CVD SiC Coating, Many years of work experience, we have realized the importance of providing good quality products and the best before-sales and after-sales services.
LPE reactor, Customer satisfaction is our goal. We're looking forward to cooperating with you and providing our best services in your case. We warmly welcome you to contact us and remember to feel free to contact us. Browse our online showroom to see what we can do for yourself. And then E-mail us your specifications or inquiries today.

Related Products

Hot Products

  • SiC Coated Graphite Crucible Deflector

    SiC Coated Graphite Crucible Deflector

    The SiC coated graphite crucible deflector is a key component in the single crystal furnace equipment, its task is to guide the molten material from the crucible to the crystal growth zone smoothly, and ensure the quality and shape of the single crystal growth.Vetek semiconductor can provide both graphite and SiC coating material.Welcome to contact us for more details.
  • CVD TaC Coating Crucible

    CVD TaC Coating Crucible

    VeTek Semiconductor is a professional manufacturer and leader of CVD TaC Coating Crucible products in China. CVD TaC Coating Crucible is based on tantalum carbon (TaC) coating. The tantalum carbon coating is evenly covered on the surface of the crucible through chemical vapor deposition (CVD) process to enhance its heat resistance and corrosion resistance. It is a material tool specially used in high temperature extreme environments. Welcome your further consultation.
  • TaC Coating Guide Ring

    TaC Coating Guide Ring

    VeTek Semiconductor's TaC Coating Guide Ring is created by applying tantalum carbide coating onto graphite parts using a highly advanced technique called chemical vapor deposition (CVD). This method is well-established and offers exceptional coating properties. By utilizing the TaC Coating Guide Ring, the lifespan of graphite components can be significantly extended, the movement of graphite impurities can be suppressed, and the SiC and AIN single crystal quality can be reliably maintained. Welcome to inquiry us.
  • Silicon On Insulator Wafer

    Silicon On Insulator Wafer

    VeTek Semiconductor is a professional Chinese manufacturer of Silicon On Insulator Wafer. the Silicon On Insulator Wafer is an important semiconductor substrate material, and its excellent product characteristics make it play a key role in high-performance, low-power, high-integration and RF applications. Looking forward to your consultation.
  • SiC Ceramics Wafer Boat

    SiC Ceramics Wafer Boat

    VeTek semiconductor is a leading SiC Ceramics Wafer Boat supplier, manufacturer and factory in China. Our SiC Ceramics Wafer Boat is a vital component in advanced wafer handling processes, catering to the photovoltaic, electronics, and semiconductor industries. Looking forward to your consultation.
  • Pyrolytic Graphite Coated Graphite Elements

    Pyrolytic Graphite Coated Graphite Elements

    VeTek Semiconductor is a leading supplier of customized Pyrolytic Graphite Coated Graphite Elements in China. The Pyrolytic Graphite Coated Graphite Elements we provide have a dense surface structure, high purity and good high temperature resistance. VeTek Semiconductor is committed to establishing long-term strategic partnerships with customers to promote technological innovation and industrial development.

  • What is the epitaxial process?

    This blog takes "What is the epitaxial process?" as its theme, and provides a detailed analysis from the dimensions of Overview of Epitaxial Processes, Types of Epitaxy, Factors Influencing the Epi Process, Epitaxial Growth Techniques, EPI Growth Modes, and Epitaxy Growth’s Importance.

  • The Problems in the Etching Process

    Etching technology in semiconductor manufacturing often encounters problems such as loading effect, micro-groove effect and charging effect, which affect product quality. Improvement solutions include optimizing plasma density, adjusting reaction gas composition, improving vacuum system efficiency, designing reasonable lithography layout, and selecting appropriate etching mask materials and process conditions.

  • What is a PECVD graphite boat ?

    The core material of PECVD graphite boat is high-purity isotropic graphite material (purity is usually ≥99.999%), which has excellent electrical conductivity, thermal conductivity and density. Compared with ordinary graphite boats, PECVD graphite boats have many physical and chemical property advantages and are mainly used in the semiconductor and photovoltaic industries, especially in PECVD and CVD processes.

  • What is the difference between CVD TaC and sintered TaC?

    This article first introduces the molecular structure and physical properties of TaC, and focuses on the differences and applications of sintered tantalum carbide and CVD tantalum carbide, as well as VeTek Semiconductor's popular TaC coating products.

  • What is The Third-generation Semiconductor Industry?

    Semiconductor materials can be classified into three generations in chronological order. The first generation consists of common elemental materials such as germanium and silicon, which are characterized by convenient switching and are generally used in integrated circuits. The second-generation compound semiconductors such as gallium arsenide and indium phosphide are mainly used in luminescent and communication materials.

  • What is the difference between epitaxy and ALD?

    The main difference between epitaxy and atomic layer deposition (ALD) lies in their film growth mechanisms and operating conditions. Epitaxy refers to the process of growing a crystalline thin film on a crystalline substrate with a specific orientation relationship, maintaining the same or similar crystal structure. In contrast, ALD is a deposition technique that involves exposing a substrate to different chemical precursors in sequence to form a thin film one atomic layer at a time.

Related Search

8 Inch Halfmoon Part for LPE ReactorHalfmoon Part for LPE Reactor

Send Inquiry

X
We use cookies to offer you a better browsing experience, analyze site traffic and personalize content. By using this site, you agree to our use of cookies. Privacy Policy
Reject Accept