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China High Uniformity Susceptor Manufacturer, Supplier, Factory

The key to our success is "Good Solution Top quality, Reasonable Value and Efficient Service" for High Uniformity Susceptor, MOCVD Susceptor, SiC Coated Carrier, Graphite Wafer Holder, LED Epitaxy Tray, Seeing believes! We sincerely welcome the new clients overseas to setup business enterprise interactions and also be expecting to consolidate the relationships while using the long-established prospects.
High Uniformity Susceptor, Thus far, our item associated with may be shown in most foreign nations as well as urban centers, which are sought after simply by targeted traffic. We all highly imagine that now we have the full capacity to present you with contented merchandise. Desire to collect requests of your stuff and produce the long-term co-operation partnership. We very seriously promise:Csame top quality, better price; exact same selling price, higher quality.

Hot Products

  • Silicon Carbide Epitaxy Wafer Carrier

    Silicon Carbide Epitaxy Wafer Carrier

    VeTek Semiconductor is a leading customized Silicon Carbide Epitaxy Wafer Carrier supplier in China.We have been specialized in advanced material more than 20 years.We offer a Silicon Carbide Epitaxy Wafer Carrier for carrying SiC substrate, growing SiC epitaxy layer in SiC epitaxial reactor. This Silicon Carbide Epitaxy Wafer Carrier is an important SiC coated part of halfmoon part, high temperature resistance, oxidation resistance, wear resistance. We welcome you to visit our factory in China.Welcome to consult at any time.
  • LED Epitaxy susceptor

    LED Epitaxy susceptor

    VeTek Semiconductor's LED Epitaxy susceptor is designed for blue and green LED epitaxial manufacturing. It combines silicon carbide coating and SGL graphite, and has high hardness, low roughness, good thermal stability and excellent chemical stability. LED Epitaxy susceptor is one of VeTek Semiconductor's most outstanding products. We look forward to your inquiry.
  • High Purity Quartz Etch Ring

    High Purity Quartz Etch Ring

    Dry plasma etch chambers rely on precise boundary control around the wafer to keep plasma density, gas flow, and electric-field distribution stable. VeTek Semiconductor High Purity Quartz Etch Rings are semiconductor-grade chamber components made from dehydroxylated fused quartz. They define the process zone at the wafer edge, help confine plasma, smooth gas flow, and protect the wafer periphery—supporting more uniform etch rates and cleaner profiles across 2–12 inch silicon, SiC, GaN, and sapphire wafers.
  • CVD SiC Coating Protector

    CVD SiC Coating Protector

    Vetek Semiconductor's CVD SiC Coating Protector used is LPE SiC epitaxy, The term "LPE" usually refers to Low Pressure Epitaxy (LPE) in Low Pressure Chemical Vapor Deposition (LPCVD). In semiconductor manufacturing, LPE is an important process technology for growing single crystal thin films, often used to grow silicon epitaxial layers or other semiconductor epitaxial layers.Pls no hesitate to contact us for more questions.
  • High Purity Quartz Wafer Carrier

    High Purity Quartz Wafer Carrier

    VeTek Semiconductor’s High Purity Quartz Wafer Carriers are precision-engineered semiconductor-grade fixtures for stable wafer handling in high-temperature thermal processing, thin-film deposition, wet processes, and vacuum applications. Manufactured from semiconductor-grade dehydroxylated fused quartz (JGS2 equivalent), these wafer carriers deliver ultra-high purity, excellent thermal shock resistance, chemical inertness, low outgassing, and high flatness—ensuring reliable, contamination-free support for 2–12 inch silicon, SiC, GaN, and sapphire substrates.
  • High Purity Quartz Wafer Boat For TEL

    High Purity Quartz Wafer Boat For TEL

    VETEK High Purity Quartz Wafer Boat for TEL semiconductor equipment is manufactured from semiconductor-grade quartz material and designed for wafer handling in high-temperature processes such as diffusion, oxidation, annealing, and CVD. With excellent thermal stability, chemical resistance, and low contamination characteristics, it provides reliable wafer support for semiconductor manufacturing applications.

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