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China Epitaxial growth Manufacturer, Supplier, Factory

Our growth depends to the superior products ,great talents and repeatedly strengthened technology forces for Epitaxial growth,Vacuum chunk,Porous SiC vacuum chuck,Semiconductor equipment consumables,Lithography and etching, We have been not pleased while using the present achievements but we're trying finest to innovate to satisfy buyer's more personalized needs. No matter where you are from, we're here to wait for your type request, and welcom to visit our manufacturing unit. Choose us, you can satisfy your dependable supplier.
Epitaxial growth, Our company adheres to the spirit of "lower costs, higher quality, and making more benefits for our clients". Employing talents from the same line and adhering to the principle of "honesty, good faith, real thing and sincerity", our company hopes to gain common development with clients from both at home and abroad!

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  • TaC Coated Graphite Susceptor

    TaC Coated Graphite Susceptor

    VeTek Semiconductor’s TaC Coated Graphite Susceptor uses chemical vapor deposition(CVD) method to prepare tantalum carbide coating on the surface of graphite parts. This process is the most mature and has the best coating properties. TaC Coated Graphite Susceptor can extend the service life of graphite components, inhibit the migration of graphite impurities, and ensure the quality of epitaxy.We are looking forward to your inquiry.
  • TaC Coating Plate

    TaC Coating Plate

    Designed with precision and engineered to perfection, Vetek Semiconductor's TaC Coating Plate is specifically tailored for various applications in silicon carbide (SiC) single crystal growth processes.The TaC Coating Plate's precise dimensions and robust construction make it easy to integrate into existing systems, ensuring seamless compatibility and efficient operation. Its reliable performance and high-quality coating contribute to consistent and uniform results in SiC crystal growth applications.We are committed to providing quality products at competitive prices and look forward to being your long-term partner in China.
  • Pull Silicon Single Crystal Jig

    Pull Silicon Single Crystal Jig

    Pull Silicon Single Crystal Jig is designed to ensure the purity of wafers and precise control of hot zones during crystallization, offering sustainable and efficient solutions for the photovoltaic industry.Veteksemicon is looking forward to setting long-term cooperation with you.
  • Vitreous Carbon Coated Graphite Crucible for E-beam Gun

    Vitreous Carbon Coated Graphite Crucible for E-beam Gun

    VeTek Semiconductor is a leading supplier of customized Vitreous Carbon Coated Graphite Crucible for E-beam Gun in China, specializing in advanced materials for many years. Our Vitreous Carbon Coated Graphite Crucible is specifically designed for E-beam Gun, ensuring excellent performance. Made from ultra-pure imported SGL graphite, it offers reliability and durability. Visit our factory in China to explore deep cooperation.
  • Chemical Vapor Deposition Process Solid SiC Edge Ring

    Chemical Vapor Deposition Process Solid SiC Edge Ring

    VeTek Semiconductor has always been committed to the research and development and manufacturing of advanced semiconductor materials. Today, VeTek Semiconductor has made great progress in Chemical Vapor Deposition Process Solid SiC Edge Ring products and is able to provide customers with highly customized solid SiC edge rings. Solid SiC edge rings provide better etching uniformity and precise wafer positioning when used with an electrostatic chuck, ensuring consistent and reliable etching results. Looking forward to your inquiry and becoming each other's long-term partners.
  • TaC Coating Susceptor

    TaC Coating Susceptor

    VeTek Semiconductor presents the TaC Coating Susceptor, With its exceptional TaC coating, this susceptor offers a multitude of advantages that set it apart from conventional solutions.Integrating seamlessly into existing systems, the TaC Coating Susceptor from VeTek Semiconductor guarantees compatibility and efficient operation. Its reliable performance and high-quality TaC coating consistently deliver exceptional results in SiC epitaxy processes.We are committed to providing quality products at competitive prices and look forward to being your long-term partner in China.

  • How to choose MOCVD graphite tray?

    MOCVD graphite trays play an important role in the epitaxial process. This article makes a detailed analysis on the selection of MOCVD graphite trays from the perspectives of material properties and application scenarios.

  • What is CVD TAC Coating? - Veteksemi

    CVD TAC coating is a process for forming a dense and durable coating on a substrate (graphite). This method involves depositing TaC onto the substrate surface at high temperatures, resulting in a tantalum carbide (TaC) coating with excellent thermal stability and chemical resistance.

  • Why does SiC coated Graphite Susceptor fail? - VeTek Semiconductor

    During the SiC epitaxial growth process, SiC coated graphite suspension failure may occur. This paper conducts a rigorous analysis of the failure phenomenon of SiC coated graphite suspension, which mainly includes two factors: SiC epitaxial gas failure and SiC coating failure.

  • Different technical routes of SiC epitaxial growth furnace

    Silicon carbide substrates have many defects and cannot be processed directly. A specific single crystal thin film needs to be grown on them through an epitaxial process to make chip wafers. This thin film is the epitaxial layer. Almost all silicon carbide devices are realized on epitaxial materials. High-quality silicon carbide homogeneous epitaxial materials are the basis for the development of silicon carbide devices. The performance of epitaxial materials directly determines the realization of the performance of silicon carbide devices.

  • How to solve the problem of sintering cracks in silicon carbide ceramics? - VeTek semiconductor

    This article mainly describes the broad application prospects of silicon carbide ceramics. It also focuses on the analysis of the causes of sintering cracks in silicon carbide ceramics and the corresponding solutions.

  • The Problems in the Etching Process

    Etching technology in semiconductor manufacturing often encounters problems such as loading effect, micro-groove effect and charging effect, which affect product quality. Improvement solutions include optimizing plasma density, adjusting reaction gas composition, improving vacuum system efficiency, designing reasonable lithography layout, and selecting appropriate etching mask materials and process conditions.

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