Products

China epitaxial growth process Manufacturer, Supplier, Factory

We emphasize advancement and introduce new products into the market each year for epitaxial growth process, SiC Coated Plate Carriers for MOCVD, MOCVD Wafer Carriers for Semiconductor Industry, Silicon Carbide Graphite Substrate MOCVD Susceptor, Semiconductor Wafer Carrier for MOCVD Equipment, Good quality, timely service and Competitive price, all win us a good fame in xxx field despite the international intense competition.
epitaxial growth process, We are sincerely looking forward to cooperate with customers all over the world. We believe we can satisfy you with our high-quality goods and perfect service . We also warmly welcome customers to visit our company and purchase our solutions.

Hot Products

  • TaC Coating Planetary Susceptor

    TaC Coating Planetary Susceptor

    TaC Coating Planetary Susceptor is an exceptional product for Aixtron epitaxy equipment. VeTek Semiconductor's TaC coating provides excellent high-temperature resistance and chemical inertness. This unique combination ensures reliable performance and long service life, even in demanding environments. VeTek is committed to providing high-quality products and serving as a long-term partner in the Chinese market with competitive pricing.
  • Aixtron G5+ ceiling component

    Aixtron G5+ ceiling component

    VeTek Semiconductor has become a supplier of consumables for many MOCVD equipment with its superior processing capabilities. Aixtron G5+ ceiling component is one of our latest products, which is almost the same as the original Aixtron component and has received good feedback from customers. If you need such products, please contact VeTek Semiconductor!
  • Silicon Carbide (SiC) Cantilever Paddle

    Silicon Carbide (SiC) Cantilever Paddle

    The role of Silicon Carbide (SiC) Cantilever Paddle in the semiconductor industry is to support and transport wafers. In high-temperature processes such as diffusion and oxidation, SiC cantilever paddle can stably carry wafer boats and wafers without deformation or damage due to high temperature, ensuring the smooth progress of the process. Making diffusion, oxidation and other processes more uniform is crucial to improving the consistency and yield of wafer processing. VeTek Semiconductor uses advanced technology to build SiC cantilever paddle with high-purity silicon carbide to ensure that wafers will not be contaminated. VeTek Semiconductor looks forward to long-term cooperation with you on Silicon Carbide (SiC) Cantilever Paddle products.
  • Focus ring for Etching

    Focus ring for Etching

    Focus ring for Etching is the key component to ensure process accuracy and stability. These components are precisely assembled in a vacuum chamber to achieve uniform machining of nanoscale structures on the wafer surface through precise control of plasma distribution, edge temperature and electric field uniformity.
  • Porous Ceramic Vacuum Chuck

    Porous Ceramic Vacuum Chuck

    Vetek Semiconductor's Porous Ceramic Vacuum Chuck is made of silicon carbide ceramic (SiC) material, which has excellent high temperature resistance, chemical stability and mechanical strength. It is an indispensable core component in the semiconductor process. Welcome your further inquiries.
  • TaC Coating Spare Part

    TaC Coating Spare Part

    TaC Coating is currently mainly used in processes such as silicon carbide single crystal growth (PVT method), epitaxial disk (including silicon carbide epitaxy, LED epitaxy), etc. Combined with the good long-term stability of TaC Coating Plate, Veteksemicon's TaC Coating Plate has become the benchmark for TaC Coating spare parts. We look forward to you becoming our long-term partner.

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