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China Epitaxial growth chamber Manufacturer, Supplier, Factory

owing to fantastic assistance, a variety of high quality goods, aggressive rates and efficient delivery, we love a very good popularity among our customers. We are an energetic firm with wide market for Epitaxial growth chamber, SiC coated epitaxial reactor chamber, SiC chamber coating, Epitaxy reactor, SiC epitaxy equipment, We've been looking forward to receiving your enquiries quickly.
Epitaxial growth chamber, Our company sets up several departments, including production department, sales department, quality control department and sevice center,etc. only for accomplish the good-quality product to meet customer's demand, all of our products have been strictly inspected before shipment. We always think about the question on the side of the customers,because you win,we win!

Hot Products

  • AMAT Cover Top Quartz 8 inch PCII

    AMAT Cover Top Quartz 8 inch PCII

    The AMAT Cover Top Quartz 8" PCII (0200-00218) is a high-purity quartz component designed for Applied Materials Endura PVD chambers, delivering excellent contamination control, plasma stability, and extended service life. Engineered for 200mm semiconductor processes, it serves as a critical protective and insulating element in the chamber top region, helping improve yield and process consistency. Vetek Semiconductor offers precision-manufactured, OEM-compatible quartz parts with reliable performance and global supply capability. We welcome your inquiry.
  • Tantalum Carbide (TaC) Coated Porous Graphite for SiC Crystal Growth

    Tantalum Carbide (TaC) Coated Porous Graphite for SiC Crystal Growth

    VeTek Semiconductor Tantalum Carbide Coated Porous Graphite is the latest innovation in Silicon Carbide (SiC) crystal growth technology. Engineered for high-performance thermal fields, this advanced composite material provides a superior solution for vapor phase management and defect control in the PVT (Physical Vapor Transport) process.
  • Single wafer epi graphite susceptor

    Single wafer epi graphite susceptor

    Veteksemicon Single wafer epi graphite susceptor is designed for high-performance silicon carbide (SiC), gallium nitride (GaN) and other third generation semiconductor epitaxial process, and is the core bearing component of high-precision epitaxial sheet in mass production.Welcome your further inquiry.
  • PECVD Graphite Boat

    PECVD Graphite Boat

    Veteksemicon's PECVD graphite boat optimizes solar cell coating processes by spacing silicon wafers effectively and inducing glow discharge for uniform coating deposition. With advanced technology and material choices, Veteksemicon's PECVD graphite boats enhance silicon wafer quality and boost solar energy conversion efficiency.Pls no hesitate to inquiry us.
  • Silicon Carbide Shower Head

    Silicon Carbide Shower Head

    Silicon Carbide Shower Head has excellent high temperature tolerance, chemical stability, thermal conductivity and good gas distribution performance, which can achieve uniform gas distribution and improve film quality. Therefore, it is usually used in high temperature processes such as chemical vapor deposition (CVD) or physical vapor deposition (PVD) processes. Welcome your further consultation to us ,vetek semiconductor.
  • SiC Block

    SiC Block

    Veteksemicon’s SiC Block is designed for high-efficiency grinding and thinning of silicon and sapphire wafers. With excellent thermal conductivity (≥120 W/m·K), high thermal shock resistance, and superior wear resistance (Mohs ≥9), our blocks improve process stability and reduce tool change frequency. Available in sizes from 120mm to 480mm, with customized options and fast delivery to meet diverse production needs.

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