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    Vertical furnace SiC coated ring is a component specially designed for Vertical furnace. VeTek Semiconductor can do the best for you in terms of both materials and manufacturing processes. As a leading manufacturer and supplier of Vertical furnace SiC coated ring in China, VeTek Semiconductor is confident that we can provide you with the best products and services.
  • Solid SiC Etching Focusing Ring

    Solid SiC Etching Focusing Ring

    Solid SiC Etching Focusing Ring is one of the core components of wafer etching process, which plays a role in fixing wafer, focusing plasma and improving wafer etching uniformity. As the leading SiC Focusing Ring manufacturer in China, VeTek Semiconductor has advanced technology and mature process, and manufactures Solid SiC Etching Focusing Ring that fully meets the needs of end customers according to customer requirements. We look forward to your inquiry and becoming each other's long-term partners.
  • EPI susceptor

    EPI susceptor

    The EPI susceptor is designed for the demanding epitaxial equipment applications. Its high-purity silicon carbide (SiC) coated graphite structure offers excellent heat resistance, uniform thermal uniformity for consistent epitaxial layer thickness and resistance, and long-lasting chemical resistance. We look forward to cooperating with you.
  • Contiguous Wafer Boat

    Contiguous Wafer Boat

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  • CVD SiC Coating Nozzle

    CVD SiC Coating Nozzle

    CVD SiC Coating Nozzles are crucial components used in the LPE SiC epitaxy process for depositing silicon carbide materials during semiconductor manufacturing. These nozzles are typically made of high-temperature and chemically stable silicon carbide material to ensure stability in harsh processing environments. Designed for uniform deposition, they play a key role in controlling the quality and uniformity of epitaxial layers grown in semiconductor applications. Welcome your further inquiry.
  • Rapid Thermal Annealing Susceptor

    Rapid Thermal Annealing Susceptor

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  • A complete explanation of the chip manufacturing process (1/2): from wafer to packaging and testing

    The semiconductor manufacturing process involves eight steps: wafer processing, oxidation, lithography, etching, thin film deposition, interconnection, testing, and packaging. Silicon from sand is processed into wafers, oxidized, patterned, and etched for high-precision circuits.

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  • What is semiconductor epitaxy process?

    It is ideal to build integrated circuits or semiconductor devices on a perfect crystalline base layer. The epitaxy (epi) process in semiconductor manufacturing aims to deposit a fine single-crystalline layer, usually about 0.5 to 20 microns, on a single-crystalline substrate. The epitaxy process is an important step in the manufacture of semiconductor devices, especially in silicon wafer manufacturing.

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    Solid silicon carbide (SiC) has become one of the key materials in semiconductor manufacturing due to its unique physical properties. The following is an analysis of its advantages and practical value based on its physical properties and its specific applications in semiconductor equipment (such as wafer carriers, shower heads, etching focus rings, etc.).

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