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China Vitreous Carbon Coated Manufacturer, Supplier, Factory

Our pursuit and corporation intention is to "Always satisfy our client requirements". We continue to develop and style remarkable high-quality items for each our outdated and new shoppers and accomplish a win-win prospect for our customers likewise as us for Vitreous Carbon Coated, Glass-like carbon coated, Parts for silicon single crystal pulling devices, Parts for epitaxial growth, Glassy Carbon Coated, Welcome to setup long-term romantic relationship with us. Best Value Permanently Top quality in China.
Vitreous Carbon Coated, Merchandise have been exported to Asia, Mid-east,European and Germany market. Our company has constantly been able to update the goods performance and safety to meet the markets and strive to be top A on stable quality and sincere service. If you have the honor to do business with our company. we will definitely do our very best to support your business in China.

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  • Focus ring for Etching

    Focus ring for Etching

    Focus ring for Etching is the key component to ensure process accuracy and stability. These components are precisely assembled in a vacuum chamber to achieve uniform machining of nanoscale structures on the wafer surface through precise control of plasma distribution, edge temperature and electric field uniformity.
  • CVD Silicon Carbide(SiC) Coated Graphite Shower Head

    CVD Silicon Carbide(SiC) Coated Graphite Shower Head

    If you’ve ever dealt with uneven gas flow or particle contamination in a deposition chamber, the VETEK CVD SiC Coated Graphite Shower Head is designed to solve that. It starts with high‑purity isostatic graphite for thermal stability and easy machining, then gets a dense CVD Silicon Carbide (SiC) coating that seals the surface, resists corrosive gases (like HCl or NF₃), and prevents outgassing. The result is a gas distribution plate that delivers uniform flow across the wafer, handles high‑temperature epitaxy, and lasts far longer than bare graphite or quartz – making it a trusted component for CVD, PECVD, MOCVD, silicon epitaxy, and SiC epitaxy processes. We also offer custom hole patterns and sizes, because no two reactors are exactly the same.
  • Halfmoon for LPE Reaction Chamber

    Halfmoon for LPE Reaction Chamber

    The Halfmoon is a graphite component used inside LPE SiC reactors, mainly installed around the chamber hot zone. Although it does not directly contact the wafer, it still plays a role in gas flow stability and reactor operation during epitaxial growth.To handle high temperature and reactive process conditions, the component is usually protected with CVD SiC coating, while TaC coating is also available for some applications. VETEK also supplies graphite felt insulation and other coated graphite parts for SiC epitaxy systems.
  • Tantalum Carbide Ring

    Tantalum Carbide Ring

    As an advanced manufacturer and producer of Tantalum Carbide Ring products in China, VeTek Semiconductor Tantalum Carbide Ring has extremely high hardness, wear resistance, high temperature resistance and chemical stability, and is widely used in the semiconductor manufacturing field. Especially in CVD, PVD, ion implantation process, etching process, and wafer processing and transportation, it is an indispensable product for semiconductor processing and manufacturing. Looking forward to your further consultation.
  • CVD TaC Coating Crucible

    CVD TaC Coating Crucible

    VeTek Semiconductor is a professional manufacturer and leader of CVD TaC Coating Crucible products in China. CVD TaC Coating Crucible is based on tantalum carbon (TaC) coating. The tantalum carbon coating is evenly covered on the surface of the crucible through chemical vapor deposition (CVD) process to enhance its heat resistance and corrosion resistance. It is a material tool specially used in high temperature extreme environments. Welcome your further consultation.
  • PAN-Based Carbon Fiber Soft Felt

    PAN-Based Carbon Fiber Soft Felt

    VETEK have developed our carbon fiber soft felt using a combination of precision carding and air-jet technology. we can guarantee a highly uniform fiber structure throughout the material. It’s built to withstand the intense heat of industrial furnaces while remaining incredibly lightweight. By such low thermal mass and a flexible texture, it’s easy to install and fits snugly into furnace corners, helping maximize energy efficiency in every cycle.
  • Related Blog
  • Reviews

  • What is High-purity porous graphite?

    What is High-purity porous graphite ? - Vetek , This blog mainly introduces the specific working principle of High-purity porous graphite for SiC single crystal growth by PVT method.

  • From 4-Inch to 8-Inch: A Decade of SiC Semiconductor Growth

    A decade of SiC evolution — from early 4-inch commercialization challenges to today's 8-inch wafer transition. Discover how CVD SiC coatings, Solid SiC, and TaC materials enable reliable semiconductor manufacturing.

  • Why Is a Large Sized Resistance Heating SiC Crystal Growth Furnace the Key to High-Quality Silicon Carbide Wafer Production

    Among the available technologies, the Large sized resistance heating SiC crystal growth furnace has emerged as a critical solution for producing large-diameter, low-defect SiC crystals with improved consistency and efficiency. This article explores how this technology works, its advantages, applications, and why industry leaders trust innovative solutions from Veteksemi.

  • Italy's LPE's 200mm SiC epitaxial technology progress

    This article introduces the latest developments in the newly designed PE1O8 hot-wall CVD reactor of the Italian company LPE and its ability to perform uniform 4H-SiC epitaxy on 200mm SiC.

  • Based on 8-inch silicon carbide single crystal growth furnace technology

    Silicon carbide is one of the ideal materials for making high-temperature, high-frequency, high-power and high-voltage devices. In order to improve production efficiency and reduce costs, the preparation of large-size silicon carbide substrates is an important development direction.

  • Why does 3C-SiC stand out among many SiC polymorphs? - VeTek Semiconductor

    Silicon carbide (SiC) is a high-precision semiconductor material known for its excellent properties like high temperature resistance, corrosion resistance, and high mechanical strength. It has over 200 crystal structures, with 3C-SiC being the only cubic type, offering superior natural sphericity and densification compared to other types. 3C-SiC stands out for its high electron mobility, making it ideal for MOSFETs in power electronics. Additionally, it shows great potential in nanoelectronics, blue LEDs, and sensors.

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Vitreous Carbon Coated Graphite Crucible for E-beam Gun

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