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China Epi Susceptor based Graphite Manufacturer, Supplier, Factory

No matter new customer or outdated client, We believe in extensive phrase and trusted relationship for Epi Susceptor based Graphite, CVD SiC coating Epi susceptor, SiC Coating Epitaxy susceptor, MOCVD LED Epi Susceptor, Wafer processing, We recognize your enquiry and it can be our honor to work with each mate globally.
Epi Susceptor based Graphite, Our company offers the full range from pre-sales to after-sales service, from product development to audit the use of maintenance, based on strong technical strength, superior product performance, reasonable prices and perfect service, we are going to continue to develop, to supply the high-quality merchandise and services, and promote lasting cooperation with our customers, common development and create a better future.

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    VeTek Semiconductor is a professional Epi Wafer Holder manufacturer and factory in China. Epi Wafer Holder is a wafer holder for the epitaxy process in semiconductor processing. It is a key tool to stabilize the wafer and ensure uniform growth of the epitaxial layer. It is widely used in epitaxy equipment such as MOCVD and LPCVD. It is an irreplaceable device in the epitaxy process. Welcome your further consultation.
  • TaC Coating Spare Part

    TaC Coating Spare Part

    TaC Coating is currently mainly used in processes such as silicon carbide single crystal growth (PVT method), epitaxial disk (including silicon carbide epitaxy, LED epitaxy), etc. Combined with the good long-term stability of TaC Coating Plate, Veteksemicon's TaC Coating Plate has become the benchmark for TaC Coating spare parts. We look forward to you becoming our long-term partner.
  • CVD SiC coating rigid felt

    CVD SiC coating rigid felt

    As an important part of the SiC coating halfmoon graphite parts, CVD SiC coating rigid felt plays an important role in heat preservation during the SiC epitaxial growth process. VeTek Semiconductor is a mature CVD SiC coating rigid felt manufacturer and supplier, which can provide customers with suitable and excellent CVD SiC coating rigid felt products. VeTek Semiconductor looks forward to becoming your long-term partner in the epitaxial industry.
  • Quartz Gas Distribution Plate

    Quartz Gas Distribution Plate

    The Quartz Shower Head, also known as a Quartz Gas Distribution Plate, is a critical component used in semiconductor thin-film deposition processes such as CVD(Chemical Vapor Deposition), PECVD (Plasma-Enhanced CVD),and ALD (Atomic Layer Deposition). Made from high-purity fused quartz, this component ensures ultra-low contamination and excellent thermal stability, enabling precise gas delivery and uniform film growth across the wafer surface. Looking forward to your further consultation.
  • TaC Coating Ring

    TaC Coating Ring

    TaC Coating Ring is a high-performance component designed for use in semiconductor processes, VeTek semiconductor TaC Coating Ring has high thermal stability, resistance to chemical corrosion, and excellent mechanical strength and is specifically used to hold and support SiC wafers during the etching process, where precise control and durability are essential for achieving high-quality wafers. we are looking forward to your further consultation.
  • High purity CVD SiC raw material

    High purity CVD SiC raw material

    High purity CVD SiC raw material prepared by CVD is the best source material for silicon carbide crystal growth by physical vapor transport. The density of High purity CVD SiC raw material supplied by VeTek Semiconductor is higher than that of small particles formed by spontaneous combustion of Si and C-containing gases, and it does not require a dedicated sintering furnace and has a nearly constant evaporation rate. It can grow extremely high quality SiC single crystals. Looking forward to your inquiry.

  • The Application of Quartz Components in Semiconductor Equipment

    Quartz products are widely used in the semiconductor manufacturing process due to their high purity, high-temperature resistance, and strong chemical stability.

  • Italy's LPE's 200mm SiC epitaxial technology progress

    This article introduces the latest developments in the newly designed PE1O8 hot-wall CVD reactor of the Italian company LPE and its ability to perform uniform 4H-SiC epitaxy on 200mm SiC.

  • What is Silicon Carbide Crystal Growth?

    This blog takes "What is Silicon Carbide Crystal Growth?" as its theme and provides a detailed analysis from four dimensions: The Principle of Silicon Carbide Crystal Growth, The Crystal Structure of SiC, Physical Vapor Transport Method (PVT) and the Step Flow Growth to Grow Single Crystal.

  • What is the epitaxial process?

    This blog takes "What is the epitaxial process?" as its theme, and provides a detailed analysis from the dimensions of Overview of Epitaxial Processes, Types of Epitaxy, Factors Influencing the Epi Process, Epitaxial Growth Techniques, EPI Growth Modes, and Epitaxy Growth’s Importance.

  • What measurement equipment are there in the Fab factory? - VeTek semiconductor

    There are many types of measurement equipment in the Fab factory. Common equipment includes lithography process measurement equipment, etching process measurement equipment, thin film deposition process measurement equipment, doping process measurement equipment, CMP process measurement equipment, wafer particle detection equipment and other measurement equipment.

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    Hot pressing sintering is the main method for preparing high-performance SiC ceramics. The process of hot pressing sintering includes: selecting high-purity SiC powder, pressing and molding under high temperature and high pressure, and then sintering. SiC ceramics prepared by this method have the advantages of high purity and high density, and are widely used in grinding discs and heat treatment equipment for wafer processing.

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